Patents by Inventor Naoki Ichiki

Naoki Ichiki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Metal polishing composition
    Publication number: 20040244300
    Abstract: An object of the present invention is to provide a metal polishing composition which can polish a metal such as Cu and Ta at a high speed, has a higher efficiency of washing for a hydrophobic low dielectric constant film, and is excellent stability without precipitation of a polishing particle during storage (excellent in stability for storing). The object is achieved by a metal polishing composition comprising an anionic surfactant having 2 or more anionic functional groups in a molecule, a polishing abrasive, an inorganic salt, and water.
    Type: Application
    Filed: May 27, 2004
    Publication date: December 9, 2004
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Naoki Ichiki, Yasuo Matsumi, Masayuki Takashima, Nobuyuki Katsuda
  • Cleaning agent for semiconductor device & method of fabricating semiconductor device
    Patent number: 6730239
    Abstract: A cleaning agent for a semiconductor device contains a hydroxide, water and a compound expressed in the following general formula (I) and/or the following general formula (II): HO—((EO)x—(PO)y)z—H  (I) R—[(EO)x—(PO)y)z—H]m  (II) Thus provided is a cleaning agent for a semiconductor device, which is so improved as not to disconnect a wire or an embedded conductive layer.
    Type: Grant
    Filed: October 4, 2000
    Date of Patent: May 4, 2004
    Assignees: Renesas Technology Corp., Sumitomo Chemical Company, Limited
    Inventors: Itaru Kanno, Naoki Yokoi, Hiroshi Morita, Naoki Ichiki, Hideaki Nezu, Masayuki Takashima
  • Remover composition
    Patent number: 6656895
    Abstract: A remover composition comprising (a) 100 parts by weight of a composition obtained by adding a cyclic urea compound to water, water-soluble organic solvent, or a mixture of water and water-soluble organic solvent so that the concentration of the cyclic urea compound is from 1 to 90% by weight, wherein the cyclic urea compound is represented by the following general formula (I): wherein, R1 and R2each independently represent alkyl group which may be substituted, hydrogen atom, hydroxyl group, or carboxyl group, Z represents oxygen atom or sulfur atom, (b) 0.1 to 150 parts by weight of an organic amine, and (c) 0.001 to 100 parts by weight of a salt of an amine with an acid.
    Type: Grant
    Filed: December 21, 2001
    Date of Patent: December 2, 2003
    Assignee: Sumitomo Chemical Company, Limited
    Inventor: Naoki Ichiki
  • Remover composition
    Publication number: 20020130298
    Abstract: A remover composition comprising
    Type: Application
    Filed: December 21, 2001
    Publication date: September 19, 2002
    Inventor: Naoki Ichiki
  • Remover composition
    Patent number: 6423480
    Abstract: A remover composition obtained by adding 1 to 90% by weight of a cyclic urea compound represented by the following general formula (I): wherein, each of R1 and R2 independently represents a hydrogen atom, hydroxyl group, carboxyl group or alkyl group which may be substituted, and Z represents an oxygen atom or sulfur atom.
    Type: Grant
    Filed: December 22, 2000
    Date of Patent: July 23, 2002
    Assignee: Sumitomo Chemical Company, Limited
    Inventor: Naoki Ichiki
  • Remover composition
    Publication number: 20010021488
    Abstract: A remover composition obtained by adding 1 to 90% by weight of a cyclic urea compound represented by the following general formula (I): 1
    Type: Application
    Filed: December 22, 2000
    Publication date: September 13, 2001
    Inventor: Naoki Ichiki