Patents by Inventor Naoki Kitatochi

Naoki Kitatochi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20120133304
    Abstract: A discharge lamp device comprising a high pressure discharge lamp having a discharge space and a pair of main electrodes in an interior of said discharge space, a starting assistance light source adapted to radiate UV radiation towards said discharge space, and a power supply device to light the high pressure discharge lamp and the starting assistance light source, wherein said starting assistance light source contains at least a rare gas for starting and carbon monoxide (CO) as a light emitting substance, and said power supply device is adapted to generate a high starting voltage at a time lighting of said high pressure discharge lamp is started and afterwards switch to a voltage for steady-state lighting, such that said starting assistance light source radiates by means of said high starting voltage but does not radiate by means of said voltage for steady-state lighting.
    Type: Application
    Filed: October 3, 2011
    Publication date: May 31, 2012
    Applicant: USHIO DENKI KABUSHIKI KAISHA
    Inventors: Naoki KITATOCHI, Toshiya UKAI, Toshiyuki OKAMOTO, Takashi YAMASHITA
  • Patent number: 6741627
    Abstract: The invention provides a two-stage laser mode of photolithographic molecular fluorine laser system for matching the center wavelength of an oscillation-stage laser to the center wavelength of an amplification-stage laser, thereby oscillating a laser beam having a low spectral purity and a narrow linewidth. The laser system is of the two-stage mode comprising an oscillation-stage laser 10 and an amplification-stage mode 20. The center wavelength of a laser beam emitted out of the oscillation-stage laser 10 is compared with and substantially matched to the center wavelength of a laser beam emitted out of the amplification-stage laser 20 when the latter is oscillated by itself.
    Type: Grant
    Filed: December 27, 2002
    Date of Patent: May 25, 2004
    Assignees: Ushio Denki Kabushiki Kaisya, Gigaphoton Inc.
    Inventors: Naoki Kitatochi, Tatsuya Ariga, Osamu Wakabayashi
  • Publication number: 20030161373
    Abstract: The invention provides a two-stage laser mode of photolithographic molecular fluorine laser system for matching the center wavelength of an oscillation-stage laser to the center wavelength of an amplification-stage laser, thereby oscillating a laser beam having a low spectral purity and a narrow linewidth. The laser system is of the two-stage mode comprising an oscillation-stage laser 10 and an amplification-stage mode 20. The center wavelength of a laser beam emitted out of the oscillation-stage laser 10 is compared with and substantially matched to the center wavelength of a laser beam emitted out of the amplification-stage laser 20 when the latter is oscillated by itself.
    Type: Application
    Filed: December 27, 2002
    Publication date: August 28, 2003
    Inventors: Naoki Kitatochi, Tatsuya Ariga, Osamu Wakabayashi
  • Patent number: 6414784
    Abstract: To prevent beam fluctuation produced when a nonlinear optical crystal is maintained at a high temperature, a beam passage component is provided at the beam entrance and exit sides of the nonlinear optical crystal beam of the crystal support device, and the temperature at the end of the beam passage component away from the crystal is controlled to within a range of difference from ambient temperature at which the beam will be stable.
    Type: Grant
    Filed: March 30, 2000
    Date of Patent: July 2, 2002
    Assignee: Kabushiki Kaisya Ushiosougougizyutsukenkyusyo
    Inventors: Yasu Oosako, Kyouichi Deki, Toshio Yokota, Naoki Kitatochi