Abstract: Provided is a laminate including: a base material; and an anti-fogging layer provided on at least a part of the base material, in which the anti-fogging layer contains a siloxane binder, silica particles, and a water absorption organic polymer, the anti-fogging layer has a structure in which the silica particles are deposited, an irregular structure due to the silica particles is formed on a surface of the anti-fogging layer, and voids are formed inside the anti-fogging layer, a film density of the anti-fogging layer is in a range of 0.80 g/cm3 to 1.40 g/cm3, and a film thickness of the anti-fogging layer is in a range of more than 1 ?m and 10 ?m or less.

Abstract: Provided are a laminate including a base material, and an anti-fogging layer provided on at least a part of the base material, in which the anti-fogging layer contains a siloxane binder, silica particles, and a water absorption organic polymer, a water absorption amount of the anti-fogging layer is in a range of 1.5 mg/cm2 to 25.0 mg/cm2, a water contact angle of a surface of the anti-fogging layer is in a range of 1° to 20°, and a film thickness of the anti-fogging layer is more than 1 ?m and 10 ?m or less; a method of producing the same; and an anti-fogging coating composition which is suitably used for formation of the anti-fogging layer.

Abstract: Provided are a film-forming composition containing a hydrolysate of a siloxane compound represented by Formula (1), silica particles, a ketone-based solvent, and water, and a manufacturing method of a laminate. In Formula (1), R1, R2, R3, and R4 each independently represent a monovalent organic group having 1 to 6 carbon atoms. represents an integer of 2 to 20.

Abstract: Provided are an antireflection film having high durability and a functional glass including the antireflection film. An antireflection film includes a transparent substrate (10), an antireflection layer (30) provided on one surface side of the transparent substrate (10), and a hard coat layer (20) included between the transparent substrate (10) and the antireflection layer (30), in which the antireflection layer (30) is formed by laminating, from the hard coat layer (20) side, a layer of high refractive index (32) having a refractive index higher than a refractive index of the hard coat layer (20), a silver nano-disk layer (36) formed by dispersing a plurality of silver nano-disks (35) in a binder (33), and a layer of low refractive index (38) having a refractive index lower than the refractive index of the layer of high refractive index (32) in this order.

Abstract: A decorative illumination recording sheet that includes: a resin base; and a white layer that is disposed on the resin base and contains a white pigment and a binder, in which a colorant different from the white pigment is contained, and in a case where an average transmittance in a wavelength range of 400 nm to 700 nm is represented by Tv and an average transmittance in a wavelength range exceeding 700 nm, but not exceeding 800 nm is represented by Tr, Tv and Tr satisfy relationships expressed by the following Formulae (1) and (2), a method of manufacturing the decorative illumination recording sheet, a decorative illumination image sheet, a method of manufacturing the decorative illumination image sheet, and a decorative illumination signboard. 40.0%?Tv<50.0%??(1) 40.0%?Tr<50.

Abstract: To provide a decorative illumination ink jet recording material having a resin base, an ink accepting layer that is disposed as an outermost layer and contains a resin, a layer that contains a metal oxide, and a white layer that contains white particles and a resin, a decorative illumination image, a method of forming the decorative illumination image, and a decorative illumination signboard.

Abstract: A decorative illumination recording sheet that includes: a resin base; and a white layer that is disposed on the resin base and contains a white pigment and a binder, in which a colorant different from the white pigment is contained, and in a case where an average transmittance in a wavelength range of 400 nm to 700 nm is represented by Tv and an average transmittance in a wavelength range exceeding 700 nm, but not exceeding 800 nm is represented by Tr, Tv and Tr satisfy relationships expressed by the following Formulae (1) and (2), a method of manufacturing the decorative illumination recording sheet, a decorative illumination image sheet, a method of manufacturing the decorative illumination image sheet, and a decorative illumination signboard. 40.0%?Tv<50.0%??(1) 40.0%?Tr<50.

Abstract: To provide a decorative illumination ink jet recording material including a resin base, an ink accepting layer that contains at least white particles and is disposed on one surface of the resin base, and a protective layer that contains at least transparent particles and is disposed on the other surface of the resin base, a decorative illumination image, a method of forming the decorative illumination image, and a decorative illumination signboard.

Abstract: To provide a decorative illumination ink jet recording material having a resin base, an ink accepting layer that is disposed as an outermost layer and contains a resin, a layer that contains a metal oxide, and a white layer that contains white particles and a resin, a decorative illumination image, a method of forming the decorative illumination image, and a decorative illumination signboard.

Abstract: Disclosed is a back sheet for solar cells including a supporter and an A layer including at least a nonionic surfactant which has an ethylene glycol chain but does not have a carbon-carbon triple bond on at least one surface side of the supporter, in which the surface resistance value SR on the side provided with the A layer is in a range of 1.0×1010?/? to 5.5×1015?/?, and the improvement of the partial discharge voltage and the adhesiveness to an encapsulating material that encapsulates a solar cell are both achieved and a solar cell module including the back sheet for solar cells.

Abstract: To provide a solar cell back sheet having excellent weather resistance and durability in which high adhesiveness to a sealing material for sealing a solar cell element is maintained for a long period of time even under harsh conditions of a high temperature and a high humidity and a solar cell module including the same. The solar cell back sheet including a supporter; and a coating layer (B) including a polymer having a yield point; and a coating layer (C) on at least one surface side of the supporter in this order, in which the coating layer (C) is in direct contact with a sealing material for a solar cell module to which the solar cell back sheet is applied and a solar cell module including the same.

Abstract: There is provided a method of manufacturing a top contact field-effect transistor including forming a protection layer on an active layer formed in a semiconductor layer forming process, forming a photoresist film on the protection layer and pattern exposing the same in an exposure process, and developing the photoresist film passing through the exposure process using an alkaline developing liquid to form a resist pattern and removing a region exposed by the resist pattern from the protection layer to etch the protection layer in a subsequent development process; a field-effect transistor, and a method of manufacturing a display device.

Abstract: There is provided a method of manufacturing a top contact field-effect transistor including forming a protection layer on an active layer formed in a semiconductor layer forming process, forming a photoresist film on the protection layer and pattern exposing the same in an exposure process, and developing the photoresist film passing through the exposure process using an alkaline developing liquid to form a resist pattern and removing a region exposed by the resist pattern from the protection layer to etch the protection layer in a subsequent development process; a field-effect transistor, and a method of manufacturing a display device.

Abstract: The invention provides a thin film field-effect transistor including, on a substrate, a gate electrode, a gate insulating film, an active layer including an oxide semiconductor, a source electrode, a drain electrode, a resistive layer including an oxide semiconductor and positioned between the active layer and at least one of the source electrode or the drain electrode, the resistive layer having an electric conductivity that is lower than the electric conductivity of the active layer, the electric conductivity of the active layer being from 10?4 Scm?1 to less than 102 Scm?1, the ratio of the electric conductivity of the active layer to the electric conductivity of the resistive layer (electric conductivity of active layer/electric conductivity of resistive layer) being from 101 to 1010, and at least one of the source electrode or the drain electrode including a layer including Ti or a Ti alloy positioned at the side facing the resistive layer.