Patents by Inventor Naoki Sasahara

Naoki Sasahara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photosensitive resin composition, photosensitive element comprising the same, process for producing resist pattern, and process for producing printed wiring board
    Publication number: 20070172756
    Abstract: A photosensitive resin composition comprising (A) a binder polymer, (B) a photopolymerizing compound with at least one polymerizable ethylenic unsaturated group in the molecule and (C) a photopolymerization initiator, wherein component (B) contains a compound represented by the following general formula (2). (wherein the three R1 groups each independently represent hydrogen or methyl, the three X groups each independently represent C2-6 alkylene and i, j and k each independently represent an integer of 1-14.
    Type: Application
    Filed: September 3, 2004
    Publication date: July 26, 2007
    Inventors: Chikara Ishikawa, Mitsuaki Watanabe, Naoki Sasahara
  • Image forming apparatus using system and office supply information server
    Publication number: 20060168005
    Abstract: An image forming apparatus using system including at least one image forming apparatus having a touch panel and an office supply information server that is connected to the image forming apparatuses via a network is provided. The image forming apparatus includes: a part for sending order information to the office supply information server; and a part for receiving information from the office supply information server, the office supply information server includes: a server information sending part for sending information to the image forming apparatus; and a client information receiving part for receiving information input from the touch panel of the image forming apparatus, and the image forming apparatus orders an office supply from the office supply information server.
    Type: Application
    Filed: June 3, 2004
    Publication date: July 27, 2006
    Inventors: Kohji Kanbara, Shinkichi Hashimoto, Toshiyasu Takahashi, Tetsufumi Haraguchi, Yoshio Tominaga, Naoki Sasahara
  • Permanent resist, permanent resist-laminated substrate and process for producing the same
    Patent number: 6905810
    Abstract: A permanent resist obtained by at least photoexposure and alkali development of a photosensitive resin composition, the permanent resist containing a metal carboxylate group, or a carboxyl group (a carboxyl anhydride group is also included among a carboxyl group according to the invention) and a metal carboxylate group, wherein an alkaline earth metal carboxylate group constitutes at least 30 mole percent of the total of a carboxyl group and a metal carboxylate group.
    Type: Grant
    Filed: June 6, 2003
    Date of Patent: June 14, 2005
    Assignee: Hitachi Medical Co., Ltd.
    Inventors: Tetsuya Yoshida, Naoki Sasahara, Katsunori Tsuchiya, Akio Nakano
  • PERMANENT RESIST, PERMANENT RESIST-LAMINATED SUBSTRATE AND PROCESS FOR PRODUCING THE SAME
    Publication number: 20040253540
    Abstract: A permanent resist obtained by at least photoexposure and alkali development of a photosensitive resin composition, the permanent resist containing a metal carboxylate group, or a carboxyl group (a carboxyl anhydride group is also included among a carboxyl group according to the invention) and a metal carboxylate group, wherein an alkaline earth metal carboxylate group constitutes at least 30 mole percent of the total of a carboxyl group and a metal carboxylate group.
    Type: Application
    Filed: June 6, 2003
    Publication date: December 16, 2004
    Applicant: Hitachi Chemical Co., Ltd.
    Inventors: Tetsuya Yoshida, Naoki Sasahara, Katsunori Tsuchiya, Akio Nakano