Patents by Inventor Naoki Serata

Naoki Serata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8278481
    Abstract: The present invention provides a method for effectively preventing the precipitation related to manganese acetate in the pipe for sending a polymerization inhibitor and the like, and the polymerization of (meth)acrylic acid. A first method of the present invention for producing (meth)acrylic acid, characterized in comprising steps of: producing a (meth)acrylic acid-containing gas by catalytic vapor phase oxidation reaction; and obtaining a (meth)acrylic acid-containing fluid by providing the (meth)acrylic acid-containing gas into a condensation column or an absorption column; wherein manganese acetate is used as a polymerization inhibitor; manganese acetate is dissolved into a (meth)acrylic acid aqueous solution containing not more than 10% by mass of (meth)acrylic acid, and the like, to obtain a manganese acetate aqueous solution; and the manganese acetate aqueous solution is provided into the condensation column or the absorption column.
    Type: Grant
    Filed: May 15, 2008
    Date of Patent: October 2, 2012
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Kazuhiko Sakamoto, Naoki Serata, Toyofumi Sakai
  • Publication number: 20100130778
    Abstract: The present invention provides a method for effectively preventing the precipitation related to manganese acetate in the pipe for sending a polymerization inhibitor and the like, and the polymerization of (meth)acrylic acid. A first method of the present invention for producing (meth)acrylic acid, characterized in comprising steps of: producing a (meth)acrylic acid-containing gas by catalytic vapor phase oxidation reaction; and obtaining a (meth)acrylic acid-containing fluid by providing the (meth)acrylic acid-containing gas into a condensation column or an absorption column; wherein manganese acetate is used as a polymerization inhibitor; manganese acetate is dissolved into a (meth)acrylic acid aqueous solution containing not more than 10% by mass of (meth)acrylic acid, and the like, to obtain a manganese acetate aqueous solution; and the manganese acetate aqueous solution is provided into the condensation column or the absorption column.
    Type: Application
    Filed: May 15, 2008
    Publication date: May 27, 2010
    Inventors: Kazuhiko Sakamoto, Naoki Serata, Toyofumi Sakai
  • Patent number: 7511172
    Abstract: A method for producing acrylic acid by absorbing acrylic acid at a high ratio and obtaining an acrylic acid-containing solution of high concentration is provided. This method comprises a step of circulating part of a discharged gas from an absorption step of acrylic acid to the reactor and discarding the remainder to the out side of system while the gas is cooled before circulation to the reactor. By the method, the acrylic acid-containing solution of high concentration is obtained due to decrease of an acrylic acid loss.
    Type: Grant
    Filed: July 23, 2007
    Date of Patent: March 31, 2009
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Harunori Hirao, Kouji Ueno, Naoki Serata, Takeshi Yokogoshiya
  • Patent number: 7368602
    Abstract: There is provided a process for producing (meth)acrylic acid including an absorption step of bringing a (meth)acrylic acid-containing gas obtained by a gas phase catalytic oxidation method into an absorption tower and allowing the gas to contact with an absorbent, in which absorption step a crude (meth)acrylic acid solution is withdrawn from a withdrawal outlet positioned between a supply point for the (meth)acrylic acid-containing gas and a supply point for the absorbent on the absorption tower, and then supplied to a next step. The process for producing (meth)acrylic acid makes it possible to suppress the formation of Michael adducts, thereby obtaining a (meth)acrylic acid containing solution in high yield and in high concentration.
    Type: Grant
    Filed: January 19, 2007
    Date of Patent: May 6, 2008
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Toyofumi Sakai, Naoki Serata
  • Patent number: 7332626
    Abstract: A method for producing acrylic acid by absorbing acrylic acid at a high ratio and obtaining an acrylic acid-containing solution of high concentration is provided. This method comprises a step of circulating part of a discharged gas from an absorption step of acrylic acid to the reactor and discarding the remainder to the out side of system while the gas is cooled before circulation to the reactor. By the method, the acrylic acid-containing solution of high concentration is obtained due to decrease of an acrylic acid loss.
    Type: Grant
    Filed: June 2, 2004
    Date of Patent: February 19, 2008
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Harunori Hirao, Kouji Ueno, Naoki Serata, Takeshi Yokogoshiya
  • Patent number: 7321060
    Abstract: A method for the production of acrylic acid of high concentration by absorbing acrylic acid with high absorption ratio of acrylic acid is provided. In a method for producing acrylic acid by a procedure comprising a step of catalytic gas phase oxidation reaction and a step of absorbing the acrylic acid-containing gas, while a low boiling substance-containing solution is introduced into the absorption column via a portion different from the top of the column.
    Type: Grant
    Filed: June 2, 2004
    Date of Patent: January 22, 2008
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Naoki Serata, Kouji Ueno, Harunori Hirao, Takeshi Yokogoshiya
  • Publication number: 20070270611
    Abstract: A method for producing acrylic acid by absorbing acrylic acid at a high ratio and obtaining an acrylic acid-containing solution of high concentration is provided. This method comprises a step of circulating part of a discharged gas from an absorption step of acrylic acid to the reactor and discarding the remainder to the out side of system while the gas is cooled before circulation to the reactor. By the method, the acrylic acid-containing solution of high concentration is obtained due to decrease of an acrylic acid loss.
    Type: Application
    Filed: July 23, 2007
    Publication date: November 22, 2007
    Inventors: Harunori Hirao, Kouji Ueno, Naoki Serata, Takeshi Yokogoshiya
  • Publication number: 20070173667
    Abstract: There is provided a process for producing (meth)acrylic acid including an absorption step of bringing a (meth)acrylic acid-containing gas obtained by a gas phase catalytic oxidation method into an absorption tower and allowing the gas to contact with an absorbent, in which absorption step a crude (meth)acrylic acid solution is withdrawn from a withdrawal outlet positioned between a supply point for the (meth)acrylic acid-containing gas and a supply point for the absorbent on the absorption tower, and then supplied to a next step. The process for producing (meth)acrylic acid makes it possible to suppress the formation of Michael adducts, thereby obtaining a (meth)acrylic acid containing solution in high yield and in high concentration.
    Type: Application
    Filed: January 19, 2007
    Publication date: July 26, 2007
    Inventors: Toyofumi Sakai, Naoki Serata
  • Patent number: 7183428
    Abstract: A method for producing acrylic acid by using an acrylic acid-containing solution of high concentration without azeotropic distillation is provided. This method of producing acrylic acid comprises introducing an acrylic acid-containing gas obtained by catalytic gas phase oxidation reaction into an absorption column and supplying the acrylic acid-containing solution to crystallization step thereby separating the solution into acrylic acid and residual mother liquid, and distilling at least part of the residual mother liquid and circulating the distillate obtained by the distillation to the absorption column.
    Type: Grant
    Filed: June 2, 2004
    Date of Patent: February 27, 2007
    Assignee: Nippon Shokubai Co., Inc.
    Inventors: Kouji Ueno, Harunori Hirao, Naoki Serata, Takeshi Yokogoshiya
  • Patent number: 7151194
    Abstract: A method for producing acrylic acid from an acrylic acid-containing solution of high concentration without performing azeotropic distillation is provided. This method of producing acrylic acid comprises steps of absorbing acrylic acid-containing gas, distilling the acrylic acid-containing solution without using an azeotropic solvent thereby obtaining crude acrylic acid as a column bottom stream and/or a column side stream, and supplying the crude acrylic acid to a crystallizing step and melt crystallizing the crude acrylic acid thereby obtaining purified acrylic acid.
    Type: Grant
    Filed: June 2, 2004
    Date of Patent: December 19, 2006
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Kouji Ueno, Harunori Hirao, Naoki Serata, Takeshi Yokogoshiya
  • Patent number: 6900346
    Abstract: A method for the decomposition of a Michael type adduct, characterized by causing a Michael type adduct to react in the presence of an N-oxyl compound thereby decomposing the Michael type adduct into acrylic acid and/or the acrylic ester and/or the alcohol and a method for the production of acrylic acid and/or the acrylic ester, characterized by comprising a step of recovering a Michael type adduct formed in the process for the production of acrylic acid or acrylic ester and a step of decomposing the recovered Michael type adduct by the method of decomposition mentioned above. This invention, therefore, allows promotion of efficient utilization of the raw materials.
    Type: Grant
    Filed: June 27, 2002
    Date of Patent: May 31, 2005
    Assignee: Nippon Shokubai Co., Inc.
    Inventors: Fumio Shibusawa, Naoki Serata, Kazuhiko Sakamoto
  • Patent number: 6870066
    Abstract: A method for the decomposition of a Michael type adduct of an acrylic acid and/or an acrylic ester represented by the following formula [I] or [II] is disclosed, wherein decomposing the Michael type adduct in the presence of at least one copper salt and at least one metal salt selected from the group consisting of an alkali metal salt and an alkaline earth metal salt into an acrylic acid and/or an acrylic ester and/or an alcohol. CH2?CHCOO(—X—COO)n—R1??[I] R2—O(—X—COO)m—R3??[II] (wherein n and m denote an integer in the range of 1-5, R1, R2, and R3 independently denote a hydrogen atom or an alkyl group, and —X— denotes —CH2CH2— or —CH(CH3)—, and —X— may be identical or different when n is 2 or more).
    Type: Grant
    Filed: March 10, 2003
    Date of Patent: March 22, 2005
    Assignee: Nippon Shokubai Co., LTD
    Inventors: Fumio Shibusawa, Naoki Serata, Kazuhiko Sakamoto
  • Publication number: 20040249199
    Abstract: A method for producing acrylic acid by using an acrylic acid-containing solution of high concentration without azeotropic distillation is provided. This method of producing acrylic acid comprises introducing an acrylic acid-containing gas obtained by catalytic gas phase oxidation reaction into an absorption column and supplying the acrylic acid-containing solution to crystallization step thereby separating the solution into acrylic acid and residual mother liquid, and distilling at least part of the residual mother liquid and circulating the distillate obtained by the distillation to the absorption column.
    Type: Application
    Filed: June 2, 2004
    Publication date: December 9, 2004
    Inventors: Kouji Ueno, Harunori Hirao, Naoki Serata, Takeshi Yokogoshiya
  • Publication number: 20040249201
    Abstract: A method for producing acrylic acid from an acrylic acid-containing solution of high concentration without performing azeotropic distillation is provided. This method of producing acrylic acid comprises steps of absorbing acrylic acid-containing gas, distilling the acrylic acid-containing solution without using an azeotropic solvent thereby obtaining crude acrylic acid as a column bottom stream and/or a column side stream, and supplying the crude acrylic acid to a crystallizing step and melt crystallizing the crude acrylic acid thereby obtaining purified acrylic acid.
    Type: Application
    Filed: June 2, 2004
    Publication date: December 9, 2004
    Inventors: Kouji Ueno, Harunori Hirao, Naoki Serata, Takeshi Yokogoshiya
  • Publication number: 20040249202
    Abstract: A method for producing acrylic acid by absorbing acrylic acid at a high ratio and obtaining an acrylic acid-containing solution of high concentration is provided. This method comprises a step of circulating part of a discharged gas from an absorption step of acrylic acid to the reactor and discarding the remainder to the out side of system while the gas is cooled before circulation to the reactor. By the method, the acrylic acid-containing solution of high concentration is obtained due to decrease of an acrylic acid loss.
    Type: Application
    Filed: June 2, 2004
    Publication date: December 9, 2004
    Inventors: Harunori Hirao, Kouji Ueno, Naoki Serata, Takeshi Yokogoshiya
  • Publication number: 20040249200
    Abstract: A method for the production of acrylic acid of high concentration by absorbing acrylic acid with high absorption ratio of acrylic acid is provided. In a method for producing acrylic acid by a procedure comprising a step of catalytic gas phase oxidation reaction and a step of absorbing the acrylic acid-containing gas, while a low boiling substance-containing solution is introduced into the absorption column via a portion different from the top of the column.
    Type: Application
    Filed: June 2, 2004
    Publication date: December 9, 2004
    Inventors: Naoki Serata, Kouji Ueno, Harunori Hirao, Takeshi Yokogoshiya
  • Publication number: 20030204106
    Abstract: A method for the decomposition of a Michael type adduct of an acrylic acid and/or an acrylic ester represented by the following formula [I] or [II] is disclosed, wherein decomposing the Michael type adduct in the presence of at least one copper salt and at least one metal salt selected from the group consisting of an alkali metal salt and an alkaline earth metal salt into an acrylic acid and/or an acrylic ester and/or an alcohol.
    Type: Application
    Filed: March 10, 2003
    Publication date: October 30, 2003
    Inventors: Fumio Shibusawa, Naoki Serata, Kazuhiko Sakamoto
  • Publication number: 20030028051
    Abstract: A method for the decomposition of a Michael type adduct, characterized by causing a Michael type adduct to react in the presence of an N-oxyl compound thereby decomposing the Michael type adduct into acrylic acid and/or the acrylic ester and/or the alcohol and a method for the production of acrylic acid and/or the acrylic ester, characterized by comprising a step of recovering a Michael type adduct formed in the process for the production of acrylic acid or acrylic ester and a step of decomposing the recovered Michael type adduct by the method of decomposition mentioned above. This invention, therefore, allows promotion of efficient utilization of the raw materials.
    Type: Application
    Filed: June 27, 2002
    Publication date: February 6, 2003
    Inventors: Fumio Shibusawa, Naoki Serata, Kazuhiko Sakamoto
  • Patent number: 6300513
    Abstract: It intends to prevent the reduction in quantity with time of an oxyl compound in vinyl compounds. The quantity reduction of the N-oxyl compound is suppressed by causing an N-oxyl compound, N-hydroxy-2,2,6,6-tetramethylpiperidine compound and a 2,2,6,6-tetramethylpiperidine compound to co-exist in vinyl compounds.
    Type: Grant
    Filed: December 5, 2000
    Date of Patent: October 9, 2001
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Kazuhiko Sakamoto, Naoki Serata, Kouji Ueno, Sei Nakahara, Masatoshi Ueoka
  • Publication number: 20010005755
    Abstract: It intends to prevent the reduction in quantity with time of an N-oxyl compound in vinyl compounds. The quantity reduction of the N-oxyl compound is suppressed by causing an N-oxyl compound, N-hydroxy-2,2,6,6-tetramethylpiperidine compound and a 2,2,6,6-tetramethylpiperidine compound to co-exist in vinyl compounds.
    Type: Application
    Filed: December 5, 2000
    Publication date: June 28, 2001
    Inventors: Kazuhiko Sakamoto, Naoki Serata, Kouji Ueno, Sei Nakahara, Masatoshi Ueoka