Patents by Inventor Naoki Takeyama
Naoki Takeyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6656660Abstract: A resist composition comprising (a) at least two kinds of polymers which become alkali-soluble by the action of an acid, (b) as a photoacid generator, a combination of an alkylsulfonyl diazomethane compound and a triarylsulfonium arylsulfonate compound or a diaryliodonium arylsulfonate compound, and (c) a solvent is excellent as a chemically amplified resist composition to give excellent pattern shape and very fine line-and-space, particularly when exposed to lights having a wavelength of 300 nm or less.Type: GrantFiled: January 27, 2000Date of Patent: December 2, 2003Assignee: Sumitomo Chemical Company, LimitedInventors: Fumiyoshi Urano, Hirotoshi Fujie, Naoki Takeyama, Koji Ichikawa
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Patent number: 6329119Abstract: A negative type resist composition is provided, which provides excellent resolution, satisfactory profile and outstanding process stability: is suitable for exposure using deep ultra violet ray; and comprises alkali soluble resin, acid generator, crosslinking agent, and a basic compound represented by the following formula (I) wherein, A represents bivalent aliphatic hydrocarbon residue which may be optionally interrupted by imino group, sulfide group, or disulfide group, X represents nitrogen atom or C(NH2), and R1 and R2 independently represent hydrogen or alkyl.Type: GrantFiled: April 28, 2000Date of Patent: December 11, 2001Assignee: Sumitomo Chemical Company, LimitedInventors: Masumi Suetsugu, Takehiro Kusumoto, Naoki Takeyama, Masanori Shinada
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Patent number: 6280902Abstract: A positive working photoresist composition is provided which comprises a resin which is converted to alkali-soluble from alkali-insoluble or alkali slightly soluble by the action of an acid; an acid generator; and a nitrogen-containing cyclic compound represented by the following formula (I): wherein X represents CH2 or C(═O), two of R1, R2, R3 and R4 represent a lower alkyl and the rest two represent hydrogen; gives a good profile with a smooth pattern side even on a substrate having a high reflection; and has a wide focus margin and a good sensitivity and resolution.Type: GrantFiled: June 1, 2000Date of Patent: August 28, 2001Assignee: Sumitomo Chemical Company, LimitedInventors: Yuko Yako, Naoki Takeyama
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Patent number: 6156476Abstract: The present invention provides a positive photoresist composition comprising an alkali-soluble resin containing a copolymer of p-vinylphenol or a derivative thereof and styrene, a dissolution inhibitor and a photo-induced acid precursor. This positive photoresist composition exhibits excellent sensitivity and resolution while maintaining excellence in other properties such as heat resistance, film thickness retention, adhesion and profile, in far ultraviolet ray lithography.Type: GrantFiled: January 10, 1994Date of Patent: December 5, 2000Assignee: Sumitomo Chemical Company, LimitedInventors: Naoki Takeyama, Hiromi Ueki, Yuji Ueda, Takehiro Kusumoto, Yuko Nakano
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Patent number: 5985511Abstract: A positive photoresist composition having excellent various performances (e.g. resolution, resistance to time delay effect, profile), small PEB dependence as well as excellent sensitivity, film retention and coatability, which comprises a polyvinylphenol resin whose phenolic hydroxyl group is partially protected; a sulfonate of a N-hydroxyimide compound as an acid generator; an amine compound; and an electron donor having a redox potential of not more than 1.7 eV is provided.Type: GrantFiled: December 12, 1996Date of Patent: November 16, 1999Assignee: Sumitomo Chemical Company, LimitedInventors: Yuko Yako, Naoki Takeyama, Kenji Takahashi
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Patent number: 5965748Abstract: N-(10-camphorsulfonyloxy)-succinimide represented by the formula (I): ##STR1## is provided, which can be produced by reacting N-hydroxysuccinimide with 10-camphorsulfonic acid, a salt thereof or a halide thereof. Using the compound as an acid generating agent, a resist composition can be obtained by including an alkali-soluble resin having a protective group removable by the action of an acid; and the resist composition is excellent in heat resistance, ratio of residual film thickness after developing, uniformity of film thickness, profile, photospeed and resolution and is improved in the time delay effect and attachment of pattern.Type: GrantFiled: April 3, 1998Date of Patent: October 12, 1999Assignee: Sumitomo Chemical Company, LimitedInventors: Akira Kamabuchi, Naoki Takeyama, Jun Tomioka, Haruyoshi Osaki
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Patent number: 5876895Abstract: A photosenstive resin composition for color filter having excellent resolution, heat resistance and transparency, etc., characterized in that it contains a novolak resin having the recurring units such as those represented by the general formula (I): ##STR1## ?wherein R.sub.1 to R.sub.5 represent hydrogen, alkyl, etc., and R.sub.6 and R.sub.7 represent hydrogen, alkyl, etc., provided that ##STR2## is coordinated at the o- or p-position in relation to the --OH group! and having a molecular weight of about 1,000-50,000, a solvent and a dye or pigment.Type: GrantFiled: May 24, 1996Date of Patent: March 2, 1999Assignee: Sumitomo Chemical Company, LimitedInventors: Yoshiki Hishiro, Naoki Takeyama, Shigeki Yamamoto
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Patent number: 5846688Abstract: A positive-working photoresist composition which exhibits a high sensitivity and a high resolution in addition to excellent characteristics such as heat resistance, film retention ratio, coatability and profile;which comprises an alkali-soluble resin comprising a polyvinylphenol resin which is polyvinylphenol and/or its partially hydrogenated product in which the phenolic hydroxyl groups are partially alkyletherified and partially protected;and a sulfonate of a N-hydroxyimide compound as an acid generator.Type: GrantFiled: May 10, 1996Date of Patent: December 8, 1998Assignee: Sumitomo Chemical Company, LimitedInventors: Nobuhito Fukui, Yuji Ueda, Naoki Takeyama, Takehiro Kusumoto, Yuko Yako, Shigeki Yamamoto
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Patent number: 5800966Abstract: This invention provides a positive photoresist composition comprising an alkali-soluble resin, a dissolution inhibitor and a photo-induced acid precursor, wherein said alkali-soluble resin is obtainable through a condensation reaction of a compound represented by the general formula (I): ##STR1## wherein R.sub.1 to R.sub.9 each represent hydrogen atom, halogen atom, alkyl group, alkenyl group, --OH group or the like, provided that at least one of R.sub.1 to R.sub.9 is --OH group and at least two hydrogen atoms are attached to the o- or p-position of the --OH group, and an aldehyde. This positive photoresist composition is excellent in performances such as resolution, profile, sensitivity, etc.Type: GrantFiled: April 9, 1993Date of Patent: September 1, 1998Assignee: Sumitomo Chemical Company, LimitedInventors: Yuji Ueda, Naoki Takeyama, Hiromi Ueki, Takehiro Kusumoto
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Patent number: 5731110Abstract: An azo dye for use in color filters soluble in alkaline aqueous solutions and organic solvents and having in one molecule at least one sulfonamido group of which one hydrogen atom is substituted; and a method for producing a color filter having a plurality of color filter elements which comprises the steps of a) coating a substrate with an organic solvent solution of a photoresist composition containing said azo dye and drying the coat to form an adhering layer, b) exposing a specific part of said layer to radiation ray, c) developing the exposed or unexposed region with alkali to form a colored pattern, and d) repeating the steps a)-c) on every dye of different color present in said composition.Type: GrantFiled: August 29, 1996Date of Patent: March 24, 1998Assignee: Sumitomo Chemical Company, LimitedInventors: Yoshiki Hishiro, Naoki Takeyama, Shigeki Yamamoto
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Patent number: 5686585Abstract: An azo dye for use in color filters soluble in alkaline aqueous solutions and organic solvents and having in one molecule at least one sulfonamido group of which one hydrogen atom is substituted; and a method for producing a color filter having a plurality of color filter elements which comprises the steps of a) coating a substrate with an organic solvent solution of a photoresist composition containing said azo dye and drying the coat to form an adhering layer, b) exposing a specific part of said layer to radiation ray, c) developing the exposed or unexposed region with alkali to form a colored pattern, and d) repeating the steps a)-c) on every dye of different color present in said composition.Type: GrantFiled: November 18, 1994Date of Patent: November 11, 1997Assignee: Sumitomo Chemical Company, LimitedInventors: Yoshiki Hishiro, Naoki Takeyama, Shigeki Yamamoto
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Patent number: 5614594Abstract: A curable resin composition used as an overcoat film of a color filter for a color liquid crystal display device contains polyglycidyl methacrylate and a curing agent comprising a carboxylic anhydride and a bisphenol S, a halogen- or (halo)alkyl-substituted derivative thereof, or a diaminophenol. The cured composition is used as an overcoat film with good heat resistance on a color filter of a liquid crystal display device.Type: GrantFiled: May 30, 1995Date of Patent: March 25, 1997Assignee: Sumitomo Chemical Company, LimitedInventors: Susumu Miyazaki, Shigeaki Chika, Kouichi Satou, Naoki Takeyama, Shigeki Yamamoto
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Patent number: 5585218Abstract: A negative or positive photoresist composition which comprises an alkali soluble resin containing at least one resin selected from the group consisting of a partially alkyletherified polyvinylphenol and a partially alkyletherified hydrogenated polyvinylphenol, a photo-induced acid precursor containing at least a kind of sulfonic acid ester of N-hydroxyimide compounds and crosslinking agent or dissolution inhibitor, and this photoresist composition is excellent in various properties such as heat resistance, film thickness retention, coating property, profile and the like, and further exhibits high sensitivity and high resolution when far ultraviolet rays including excimer laser is used as the light source. It also hardly cause a scam during the developing process.Type: GrantFiled: May 25, 1994Date of Patent: December 17, 1996Assignee: Sumitomo Chemical Company, LimitedInventors: Yuko Nakano, Naoki Takeyama, Yuji Ueda, Takehiro Kusumoto, Hiromi Oka
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Patent number: 5478680Abstract: A color filter having the thickness of 3 .mu.m or smaller and, on a substrate, having color filter elements which have different colors each other and are made from a resist compositions comprising an alkali soluble resin and dyes having a specific color within the wave length range from 400 nm to 700 nm, wherein each of the color filter elements has the minimum light transmittance of 25% or smaller, and the color filter is excellent in various properties such as resolution, color tone, color reproductivity and color depth and it has a small thickness.Type: GrantFiled: June 21, 1994Date of Patent: December 26, 1995Assignee: Sumitomo Chemical Company, LimitedInventors: Yoshiki Hishiro, Naoki Takeyama, Shigeki Yamamoto
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Patent number: 5420331Abstract: This invention provides a process for producing a cyclic carbonate compound represented by the following formula (5): ##STR1## or the like which is useful as a dissolution inhibitor for use in a chemically amplified positive photoresist, as well as a positive photoresist composition comprising said cyclic carbonate compound, an alkali-soluble resin and a photo-induced acid precursor. This composition gives a positive photoresist excellent in performances such as resolution, profile, sensitivity, etc.Type: GrantFiled: April 5, 1994Date of Patent: May 30, 1995Assignee: Sumitomo Chemical Company, LimitedInventors: Yuji Ueda, Naoki Takeyama, Hiromi Ueki, Takehiro Kusumoto
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Patent number: 5397679Abstract: This invention provides a process for producing a cyclic carbonate compound represented by the following formula (5): ##STR1## or the like which is useful as a dissolution inhibitor for use in a chemically amplified positive photoresist, as well as a positive photoresist composition comprising said cyclic carbonate compound, an alkali-soluble resin and a photo-induced acid precursor. This composition gives a positive photoresist excellent in performances such as resolution, profile, sensitivity, etc.Type: GrantFiled: April 9, 1993Date of Patent: March 14, 1995Assignee: Sumitomo Chemical Company, LimitedInventors: Yuji Ueda, Naoki Takeyama, Hiromi Ueki, Takehiro Kusumoto
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Patent number: 5395727Abstract: A novolak resin made from a carbonyl compound and a specific phenol compound, which resin has good properties, in particular, as a base resin of a photoresist.Type: GrantFiled: November 29, 1993Date of Patent: March 7, 1995Assignee: Sumitomo Chemical Company, LimitedInventors: Yasunori Uetani, Haruyoshi Osaki, Naoki Takeyama, Yuji Ueda, Hiromi Ueki, Takehiro Kusumoto
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Patent number: 5362598Abstract: A photoresist composition which comprises a compound of the general formula: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are the same or different and represent a hydrogen atom, a hydroxyl group, --OCOR.sub.4, --O--R.sub.5, --OSi(R.sub.6).sub.3, a halogen atom, an optionally substituted alkyl group, an optionally substituted alkenyl group, an optionally substituted phenyl group or an optionally substituted aralkyl group; R.sub.4, R.sub.5 and R.sub.6 represent an optionally substituted lower alkyl group or an optionally substituted phenyl group; X and Y are the same or different and represent --CN, --COOR.sub.7, --CONR.sub.8 R.sub.9, ##STR2## R.sub.7 represents an alkyl group; R.sub.8 and R.sub.9 are the same or different and represent a hydrogen atom, an optionally substituted alkyl or phenyl group; R.sub.Type: GrantFiled: October 6, 1993Date of Patent: November 8, 1994Assignee: Sumitomo Chemical Co., Ltd.Inventors: Naoki Takeyama, Yasunori Uetani, Hirotoshi Nakanishi, Ryotaro Hanawa
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Patent number: 5304456Abstract: A negative photoresist composition containing an alkali-soluble resin which is obtainable through a condensation reaction of an aldehyde with a phenol compound containing a compound of the general formula: ##STR1## wherein R.sup.1 to R.sup.9 are independently a hydrogen atom, an alkyl group, an alkenyl group, an alkylcarbonyl group, a halogen atom or a hydroxyl group, provided that at least one of R.sup.1 to R.sup.9 is a hydroxyl group and, at the ortho- or para-position to the hydroxyl group, at least two hydrogen atoms are present; a cross linking agent; and a photo-acid generator, and a negative photoresist composition comprising an alkali-soluble resin, a cross linking agent and a photo-acid generator having a trifluoromethanesulfonic acid ester group, which can increase resolution and contrast of a photoresist pattern.Type: GrantFiled: January 29, 1992Date of Patent: April 19, 1994Assignee: Sumitomo Chemical Company, LimitedInventors: Yuji Ueda, Hiromi Ueki, Naoki Takeyama, Takehiro Kusumoto
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Patent number: RE40964Abstract: A negative type resist composition is provided, which provides excellent resolution, satisfactory profile and outstanding process stability; is suitable for exposure using deep ultra violet ray; and comprises alkali soluble resin, acid generator, crosslinking agent, and a basic compound represented by the following formula (I) wherein, A represents sulfide group, disulfide group or bivalent aliphatic hydrocarbon residue which may be optionally interrupted by imino group, sulfide group, or disulfide group, X represents nitrogen atom or C(NH2), and R1 and R2 independently represent hydrogen or alkyl.Type: GrantFiled: September 17, 2003Date of Patent: November 10, 2009Assignee: Sumitomo Chemical Company, LimitedInventors: Masumi Suetsugu, Takehiro Kusumoto, Naoki Takeyama, Masanori Shinada