Abstract: A plasma processing apparatus is for performing plasma processing in a depressurizable inner space. The apparatus includes a chamber having therein an inner space, a supporting table provided in the inner space and configured to support a substrate to be mounted thereon, one or more first members included in the chamber or separate from the chamber and partially exposed to a depressurized environment including the inner space, and one or more second members included in the chamber or separate from the chamber, each being in contact with a corresponding one of said one or more first members, and partially disposed in an atmospheric pressure environment. The apparatus further includes one or more feeders each of which is configured to supply a coolant to a cavity formed in a corresponding one of said one or more second members.

Abstract: A plasma processing apparatus includes a processing chamber that performs a plasma processing using plasma; a placing table provided in the processing chamber and including a substrate placing portion and a focus ring placing portion, the focus ring placing portion surrounding the substrate placing portion; a focus ring disposed on the focus ring placing portion; a first electrode and a second electrode both disposed inside the focus ring placing portion; a DC power source configured to apply a first DC voltage to the first electrode and apply a second DC voltage to the second electrode; and a controller configured to control the DC power source such that respective polarities of the first DC voltage and the second DC voltage are independently and periodically switched.

Abstract: A plasma processing apparatus is for performing plasma processing in a depressurizable inner space. The apparatus includes a chamber having therein an inner space, a supporting table provided in the inner space and configured to support a substrate to be mounted thereon, one or more first members included in the chamber or separate from the chamber and partially exposed to a depressurized environment including the inner space, and one or more second members included in the chamber or separate from the chamber, each being in contact with a corresponding one of said one or more first members, and partially disposed in an atmospheric pressure environment. The apparatus further includes one or more feeders each of which is configured to supply a coolant to a cavity formed in a corresponding one of said one or more second members.

Abstract: There is provision of a plasma processing apparatus including a processing vessel, a first member provided in the processing vessel, and a second member provided outside the first member. In at least one of the first member and the second member, a gas flow passage is formed, and the gas flow passage is configured to cause a gas to flow into a gap between the first member and the second member.

Abstract: There is provision of a plasma processing apparatus including a processing vessel, a first member provided in the processing vessel, and a second member provided outside the first member. In at least one of the first member and the second member, a gas flow passage is formed, and the gas flow passage is configured to cause a gas to flow into a gap between the first member and the second member.

Abstract: A plasma processing apparatus includes a processing chamber that performs a plasma processing using plasma; a placing table provided in the processing chamber and including a substrate placing portion and a focus ring placing portion, the focus ring placing portion surrounding the substrate placing portion; a focus ring disposed on the focus ring placing portion; a first electrode and a second electrode both disposed inside the focus ring placing portion; a DC power source configured to apply a first DC voltage to the first electrode and apply a second DC voltage to the second electrode; and a controller configured to control the DC power source such that respective polarities of the first DC voltage and the second DC voltage are independently and periodically switched.

Abstract: Disclosed is a plasma processing apparatus including: a placing table including a focus ring placed thereon and an electrode provided therein so as to face the focus ring; and a voltage application unit that applies, to the electrode, voltages having different polarities in cycles or a voltage having a large absolute value in steps, during a plasma processing period.

Abstract: A plasma processing apparatus is for performing plasma processing in a depressurizable inner space. The apparatus includes a chamber having therein an inner space, a supporting table provided in the inner space and configured to support a substrate to be mounted thereon, one or more first members included in the chamber or separate from the chamber and partially exposed to a depressurized environment including the inner space, and one or more second members included in the chamber or separate from the chamber, each being in contact with a corresponding one of said one or more first members, and partially disposed in an atmospheric pressure environment. The apparatus further includes one or more feeders each of which is configured to supply a coolant to a cavity formed in a corresponding one of said one or more second members.

Abstract: Disclosed is a plasma processing apparatus including: a placing table including a focus ring placed thereon and an electrode provided therein so as to face the focus ring; and a voltage application unit that applies, to the electrode, voltages having different polarities in cycles or a voltage having a large absolute value in steps, during a plasma processing period.

Abstract: An image forming apparatus includes a developing apparatus including a housing having a supply opening to receive developer supplied by a pump unit, a developing device screw disposed in a discharge path of the housing to supply and discharge the developer through a discharge opening to an image bearing member, and a developer bearing portion having a magnetic body that generates a magnetic force and is configured to bear the developer with a carrying force working in a substantially perpendicular direction to the magnetic force. In addition, a developer accommodation portion within the housing accommodates the developer supplied from a supply opening and has no opening other than the supply opening and the discharge opening, with the developer accommodation portion having a space volume capable of suppressing a spouting force caused by an inner pressure increase due to operation of the pump unit.

Abstract: A developer conveying apparatus for conveying a developer that develops an electrostatic latent image includes a rotation unit which rotates around a rotation shaft extending in an axial direction and parallel to a developer conveying direction, a first developer conveying portion which is provided in the rotation unit and which has an opening configured to convey the developer in a first axial direction of the rotation shaft, and a second developer conveying portion which is provided in the rotation unit and which has an opening configured to convey the developer in a second axial direction opposite to the first axial direction. A distance from the rotation shaft to the opening in the first developer conveying portion is different than a distance from the rotation shaft to the opening in the second developer conveying portion.

Abstract: A developing apparatus includes: a supply path configured to supply a developer; a discharge path configured to discharge the developer supplied from the supply path and perform developing; a developer holding portion configured to exert a predetermined force for holding the developer at the discharge path; and a developer accommodation portion accommodating the developer which is supplied from the supply path, and having a space volume so that the developer does not spout out from the discharge path on which the predetermined force is exerted by the developer holding portion according to an increase in an internal pressure of the developer accommodation portion when the developer is supplied from the supply path in a state where a predetermined amount of the developer is accommodated.

Abstract: A developer conveying apparatus for conveying a developer that develops an electrostatic latent image includes a rotation unit which rotates around rotation shaft pallalel to a developer conveying direction, a first developer conveying portion which is provided in the rotation unit and which conveys the developer in an axial direction of the rotation shaft, and a second developer conveying portion which is provided in the rotation unit at a position where a distance from the rotation shaft is different from that of the first developer conveying portion, and which conveys the developer in a direction opposite to that of the first developer conveying portion.