Patents by Inventor Naoki Taneda

Naoki Taneda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240090864
    Abstract: A radiographic imaging support system that supports positioning of a radiographing site of a subject with respect to a radiographic imaging apparatus, includes a hardware processor that acquires image information based on an optical image obtained by capturing an image of the radiographing site with an optical camera, generates first target position information regarding a target position of the radiographing site, and outputs the generated first target position information. The first target position information includes information corresponding to a size of the radiographing site.
    Type: Application
    Filed: September 11, 2023
    Publication date: March 21, 2024
    Inventors: Tatsuya TAKAGI, Atsushi TANEDA, Kenichi YANAGISAWA, Naoki HAYASHI
  • Patent number: 7883789
    Abstract: A substrate with a transparent conductive oxide film (especially a substrate with a transparent conductive oxide film useful as a substrate for a thin-film silicon-based solar cell) being excellent in mass production efficiency and being characterized by having a low resistance, a high transparency and a good light scattering performance over a full wavelength region (300 nm to 3 ?m) of solar ray, a process for its production, and a photoelectric conversion element (especially, solar cell) employing the substrate, are presented. A substrate with a transparent conductive oxide film, comprising a substrate and a transparent conductive oxide layer formed on the substrate and constituted by a plurality of ridges and a plurality of flat portions, wherein the surfaces of the ridges and the flat portions, have many continuous micron-size protrusions.
    Type: Grant
    Filed: December 5, 2007
    Date of Patent: February 8, 2011
    Assignee: Asahi Glass Company, Limited
    Inventors: Kazuo Sato, Junichi Sato, legal representative, Naoki Taneda, Makoto Fukawa, Nobutaka Aomine, Mika Kambe, Yukio Yoshikawa
  • Publication number: 20080152868
    Abstract: A substrate with a transparent conductive oxide film (especially a substrate with a transparent conductive oxide film useful as a substrate for a thin-film silicon-based solar cell) being excellent in mass production efficiency and being characterized by having a low resistance, a high transparency and a good light scattering performance over a full wavelength region (300 nm to 3 ?m) of solar ray, a process for its production, and a photoelectric conversion element (especially, solar cell) employing the substrate, are presented. A substrate with a transparent conductive oxide film, comprising a substrate and a transparent conductive oxide layer formed on the substrate and constituted by a plurality of ridges and a plurality of flat portions, wherein the surfaces of the ridges and the flat portions, have many continuous micron-size protrusions.
    Type: Application
    Filed: December 5, 2007
    Publication date: June 26, 2008
    Applicant: ASAHI GLASS COMPANY LIMITED
    Inventors: Kazuo Sato, Naoki Taneda, Makoto Fukawa, Nobutaka Aomine, Mika Kambe
  • Patent number: 7364808
    Abstract: A substrate with a transparent conductive oxide film (especially a substrate with a transparent conductive oxide film useful as a substrate for a thin-film silicon-based solar cell) being excellent in mass production efficiency and being characterized by having a low resistance, a high transparency and a good light scattering performance over a full wavelength region (300 nm to 3 ?m) of solar ray, a process for its production, and a photoelectric-conversion element (especially, solar cell) employing the substrate, are presented. A substrate with a transparent conductive oxide film, comprising a substrate and a transparent conductive oxide layer formed on the substrate and constituted by a plurality of ridges and a plurality of flat portions, wherein the surfaces of the ridges and the flat portions, have many continuous micron-size protrusions.
    Type: Grant
    Filed: April 3, 2006
    Date of Patent: April 29, 2008
    Assignee: Asahi Glass Company, Limited
    Inventors: Kazuo Sato, Naoki Taneda, Makoto Fukawa, Nobutaka Aomine, Mika Kambe
  • Patent number: 7179527
    Abstract: A substrate with a transparent conductive oxide film (especially a substrate with a transparent conductive oxide film useful as a substrate for a thin-film silicon-based solar cell) being excellent in mass production efficiency and being characterized by having a low resistance, a high transparency and a good light scattering performance over a full wavelength region (300 nm to 3 ?m) of solar ray, a process for its production, and a photoelectric conversion element (especially, solar cell) employing the substrate, are presented. A substrate with a transparent conductive oxide film, comprising a substrate and a transparent conductive oxide layer formed on the substrate and constituted by a plurality of ridges is and a plurality of flat portions, wherein the surfaces of the ridges and the flat portions, have many continuous micron-size protrusions.
    Type: Grant
    Filed: April 19, 2004
    Date of Patent: February 20, 2007
    Assignee: Asahi Glass Company, Limited
    Inventors: Kazuo Sato, Naoki Taneda, Makoto Fukawa, Nobutaka Aomine, Mika Kambe
  • Publication number: 20060169317
    Abstract: A substrate with a transparent conductive oxide film (especially a substrate with a transparent conductive oxide film useful as a substrate for a thin-film silicon-based solar cell) being excellent in mass production efficiency and being characterized by having a low resistance, a high transparency and a good light scattering performance over a full wavelength region (300 nm to 3 ?m) of solar ray, a process for its production, and a photoelectric-conversion element (especially, solar cell) employing the substrate, are presented. A substrate with a transparent conductive oxide film, comprising a substrate and a transparent conductive oxide layer formed on the substrate and constituted by a plurality of ridges and a plurality of flat portions, wherein the surfaces of the ridges and the flat portions, have many continuous micron-size protrusions.
    Type: Application
    Filed: April 3, 2006
    Publication date: August 3, 2006
    Applicant: ASAHI GLASS COMPANY LIMITED
    Inventors: Kazuo Sato, Naoki Taneda, Makoto Fukawa, Nobutaka Aomine, Mika Kambe
  • Publication number: 20060065299
    Abstract: A transparent conductive substrate for solar cells having high haze ratio and little variation of the haze ratio over the entire substrate, and excellent in light transmittance, and the production process of the substrate are provided. A transparent conductive substrate for solar cells comprising a substrate and a TiO2 layer, a SiO2 layer and a SnO2 layer formed on the substrate in this order from the side of the substrate, wherein the thickness of the SnO2 layer is from 0.5 to 0.9 ?m and the illuminant C haze ratio is from 20 to 60%.
    Type: Application
    Filed: November 14, 2005
    Publication date: March 30, 2006
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Makoto Fukawa, Naoki Taneda, Kazuo Sato
  • Publication number: 20050000564
    Abstract: A substrate with a transparent conductive oxide film (especially a substrate with a transparent conductive oxide film useful as a substrate for a thin-film silicon-based solar cell) being excellent in mass production efficiency and being characterized by having a low resistance, a high transparency and a good light scattering performance over a full wavelength region (300 nm to 3 ?m) of solar ray, a process for its production, and a photoelectric conversion element (especially, solar cell) employing the substrate, are presented. A substrate with a transparent conductive oxide film, comprising a substrate and a transparent conductive oxide layer formed on the substrate and constituted by a plurality of ridges is and a plurality of flat portions, wherein the surfaces of the ridges and the flat portions, have many continuous micron-size protrusions.
    Type: Application
    Filed: April 19, 2004
    Publication date: January 6, 2005
    Applicant: ASAHI GLASS COMPANY LIMITED
    Inventors: Kazuo Sato, Naoki Taneda, Makoto Fukawa, Nobutaka Aomine, Mika Kambe
  • Patent number: 5248637
    Abstract: Highly heat resistant glass fiber which comprises from 0.1 to 2.0 wt % of Al.sub.2 O.sub.3, from 0.1 to 2.0 wt % of TiO.sub.2, from 96 to 99.8 wt % of SiO.sub.2 and not more than 0.03 wt % of the sum of alkali metal oxides and alkaline earth metal oxides.
    Type: Grant
    Filed: April 24, 1992
    Date of Patent: September 28, 1993
    Assignee: Asahi Glass Company Ltd.
    Inventors: Naoki Taneda, Kouichi Numata, Takashi Mukaiyama
  • Patent number: 4838914
    Abstract: A process for producing silica glass fibers comprising:a step of preparing a silica glass fiber spinning solution by adding a polymerization regulator to a silica sol solution obtained by the hydrolysis and condensation of a silicon alkoxide in the presence of an acid catalyst;a step of spinning the spinning solution into gel fibers by extruding the spinning solution from nozzles;a step of applying an oiling agent containing substantially no water or lower alcohol to the gel fibers;a step of forming a fiber cake by winding the oiled gel fibers on a tube or bobbin;a step of aging the gel fibers constituting the fiber cake;a step of sintering the gel fibers unwound from the fiber cake after the aging step, to form silica glass fibers.
    Type: Grant
    Filed: December 15, 1987
    Date of Patent: June 13, 1989
    Assignee: Asahi Glass Company Ltd.
    Inventors: Hironori Ohta, Toshiyasu Kawaguchi, Takashi Mukaiyama, Katsuhiko Matsuzaki, Junichi Ebisawa, Naoki Taneda, Daikichi Arai, Noriyuki Yoshihara, Yoshikazu Yamada, Koushiro Kunii