Patents by Inventor Naoki UKAE

Naoki UKAE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate processing apparatus and method of manufacturing semiconductor device
    Patent number: 10755962
    Abstract: A stable and highly reliable device for detecting damage or contact failures of respective parts is provided. The device includes a processing chamber for processing a substrate; a heater for heating the substrate; a substrate support accommodating the heater and installed inside the processing chamber; a shaft for supporting the substrate support; a wire inserted through the shaft; a supporting unit for holding the wire; and a temperature detector connected to the supporting unit.
    Type: Grant
    Filed: March 1, 2016
    Date of Patent: August 25, 2020
    Assignee: KOKUSAI ELECTRIC CORPORATION
    Inventors: Kazuya Nabeta, Naoki Ukae, Mitsunori Takeshita
  • SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
    Publication number: 20160201196
    Abstract: A stable and highly reliable device for detecting damage or contact failures of respective parts is provided. The device includes a processing chamber for processing a substrate; a heater for heating the substrate; a substrate support accommodating the heater and installed inside the processing chamber; a shaft for supporting the substrate support; a wire inserted through the shaft; a supporting unit for holding the wire; and a temperature detector connected to the supporting unit.
    Type: Application
    Filed: March 1, 2016
    Publication date: July 14, 2016
    Applicant: HITACHI KOKUSAI ELECTRIC INC
    Inventors: Kazuya NABETA, Naoki UKAE, Mitsunori TAKESHITA
  • Substrate processing apparatus and method of manufacturing semiconductor device
    Patent number: 9305820
    Abstract: A stable and highly reliable device for detecting damage or contact failures of respective parts is provided. The device includes a processing chamber for processing a substrate; a heater for heating the substrate; a substrate support accommodating the heater and installed inside the processing chamber; a shaft for supporting the substrate support; a wire inserted through the shaft; a supporting unit for holding the wire; and a temperature detector connected to the supporting unit.
    Type: Grant
    Filed: December 10, 2010
    Date of Patent: April 5, 2016
    Assignee: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Kazuya Nabeta, Naoki Ukae, Mitsunori Takeshita
  • SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
    Publication number: 20110139070
    Abstract: A stable and highly reliable device for detecting damage or contact failures of respective parts is provided. The device includes a processing chamber for processing a substrate; a heater for heating the substrate; a substrate support accommodating the heater and installed inside the processing chamber; a shaft for supporting the substrate support; a wire inserted through the shaft; a supporting unit for holding the wire; and a temperature detector connected to the supporting unit.
    Type: Application
    Filed: December 10, 2010
    Publication date: June 16, 2011
    Applicant: HITACHI-KOKUSAI ELECTRIC INC.
    Inventors: Kazuya NABETA, Naoki UKAE, Mitsunori TAKESHITA