Patents by Inventor Naoko KURATA

Naoko KURATA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240109459
    Abstract: A seat cushion is formed integrally by a body pad portion, an outer peripheral edge portion, and a connection portion. The outer peripheral edge portion protrudes toward a floor panel from the outer peripheral edge portion in a plan view and contacts a floor panel at its lower face. The connection portion is provided to protrude toward the floor panel at a portion which is separated from a front-side part of the outer peripheral edge portion and a rear-side part of the outer peripheral edge portion, respectively. The connection portion connects the floor panel and the body pad portion. A portion between the front-side part and the rear-side part of the outer peripheral edge portion in a vehicle longitudinal direction is a separation portion where a lower face of the seat cushion faces an upper face of the floor panel with a gap.
    Type: Application
    Filed: February 23, 2023
    Publication date: April 4, 2024
    Applicant: MAZDA MOTOR CORPORATION
    Inventors: Kenji MATSUMOTO, Miho KURATA, Sakayu TERADA, Daisuke YAMADA, Yuki HANAZAWA, Naoko MOTOYOSHI, Aoi FUJIMOTO, Junsuke INOUE, Takashi SUZUKI
  • Patent number: 9059238
    Abstract: Some aspects of the invention include a trench gate structure including a p base layer, an n+ emitter region, a trench, a gate oxide film, and a doped polysilicon gate electrode is provided in an active region. A p-type extension region formed by extending the p base layer to an edge termination structure region can be provided in the circumference of a plurality of trenches. One or more annular outer trenches which are formed at the same time as the plurality of trenches are provided in the p-type extension region. The annular outer trenches can surround all of the trenches. A second gap between the annular outer trench and the outermost trench or between adjacent annular outer trenches is less than a first gap between adjacent trenches.
    Type: Grant
    Filed: February 10, 2014
    Date of Patent: June 16, 2015
    Assignee: FUJI ELECTRIC CO., LTD.
    Inventors: Naoko Kurata, Seiji Momota, Hitoshi Abe
  • Publication number: 20140159107
    Abstract: Some aspects of the invention include a trench gate structure including a p base layer, an n+ emitter region, a trench, a gate oxide film, and a doped polysilicon gate electrode is provided in an active region. A p-type extension region formed by extending the p base layer to an edge termination structure region can be provided in the circumference of a plurality of trenches. One or more annular outer trenches which are formed at the same time as the plurality of trenches are provided in the p-type extension region. The annular outer trenches can surround all of the trenches. A second gap between the annular outer trench and the outermost trench or between adjacent annular outer trenches is less than a first gap between adjacent trenches.
    Type: Application
    Filed: February 10, 2014
    Publication date: June 12, 2014
    Applicant: FUJI ELECTRIC CO., LTD.
    Inventors: Naoko KURATA, Seiji MOMOTA, Hitoshi ABE