Patents by Inventor Naoko Matsui

Naoko Matsui has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12062787
    Abstract: A secondary battery includes a positive electrode, a negative electrode, and an electrolytic solution. The positive electrode includes a lithium-cobalt composite oxide having a layered rock-salt crystal structure. The negative electrode includes graphite. An open circuit potential of the negative electrode measured in a full charge state is from 19 mV to 86 mV. A potential variation of the negative electrode is greater than or equal to 1 mV when the secondary battery is discharged from the full charge state by a capacity corresponding to 1% of a maximum discharge capacity. The maximum discharge capacity is obtained when the secondary battery is discharged with a constant current from the full charge state until the closed circuit voltage reaches 3.00 V, following which the secondary battery is discharged with a constant voltage of the closed circuit voltage of 3.00 V for 24 hours.
    Type: Grant
    Filed: May 4, 2021
    Date of Patent: August 13, 2024
    Assignee: Murata Manufacturing Co., Ltd.
    Inventors: Keitaro Kitada, Futoshi Sato, Takaaki Matsui, Taichi Kogure, Aya Mashiko, Yoshifumi Shimizu, Kazuki Honda, Yuta Hirano, Shinji Hatake, Naoko Yamakawa, Moriaki Okuno, Masahiro Miyamoto
  • Patent number: 10685815
    Abstract: The present invention provides a plasma processing apparatus which reduces damage from plasma generated in a discharge vessel and lengthens the replacement cycle of the discharge vessel. A plasma processing apparatus 1 is provided with a processing chamber 2 partitioning a processing space, a discharge vessel 3 whose one end opens facing inside the processing chamber 2 and the other end is closed, an antenna 4 which is disposed around the discharge vessel 3 and generates an induced electric field to generate plasma in the discharge vessel 3 under reduced pressure, and an electromagnet 9 which is arranged around the discharge vessel 3 and forms a divergent magnetic field in the discharge vessel 3. The discharge vessel 3 has at its closed end portion a protrusion 15 projecting toward the processing chamber 2.
    Type: Grant
    Filed: August 25, 2010
    Date of Patent: June 16, 2020
    Assignee: CANON ANELVA CORPORATION
    Inventors: Ryo Matsuhashi, Hiroshi Akasaka, Yoshimitsu Kodaira, Atsushi Sekiguchi, Naoko Matsui
  • Patent number: 9018115
    Abstract: Provided is a light-emitting glass which is applicable to, e.g., white illuminators including a light-emitting diode as a light source, and which emits light of a warm white color when irradiated with near ultraviolet light and combines long-term weatherability with high heat resistance; a light-emitting device containing same and a process for producing same. The light-emitting glass includes, as the base glass, borosilicate or silicate glass having a separated-phase structure, whereby the base glass is efficiently doped with, for example, transition metal ion clusters which emit light of a warm white color upon irradiation with near ultraviolet light. With this glass, it is possible to attain increases in excitation wavelength and emission wavelength. The glass thus emits, based on a multiple scattering effect, high-intensity light of a warm white color upon irradiation with near ultraviolet light.
    Type: Grant
    Filed: October 22, 2010
    Date of Patent: April 28, 2015
    Assignee: Tokyo University of Science Educational Foundation Administrative Organization
    Inventors: Atsuo Yasumori, Tetsuo Kishi, Naoko Matsui
  • Patent number: 8524094
    Abstract: The object of the present invention is to provide a masking material for dry etching, which is suitable for fine processing of a magnetic film as thin as a few nm such as NiFe or CoFe constituting a TMR film and capable of simplifying the process for producing a TMR element and reducing production costs related to facilities and materials. This object was solved by a masking material for dry etching of a magnetic material by using a mixed gas of carbon monoxide and a nitrogenous compound as etching gas, which comprises a metal (tantalum, tungsten, zirconium or hafnium) with a melting or boiling point increasing upon conversion thereof into a nitride or carbide.
    Type: Grant
    Filed: July 16, 2008
    Date of Patent: September 3, 2013
    Assignees: National Institute for Materials Science, Japan Science and Technology Corporation, Anelva Corporation
    Inventors: Isao Nakatani, Kimiko Mashimo, Naoko Matsui
  • Patent number: 8465990
    Abstract: The present invention provides a manufacturing method of a magneto-resistance effect element, in which the step coverage of a formed film can be enlarged and also the film can be deposited in a low temperature range. In an embodiment of the present invention, an insulating protective layer is formed on a multilayered structure by a plasma CVD apparatus in which a plasma source and a film deposition chamber are separated from each other by a partition wall plate. According to the present method, it is possible to deposit the protective layer without inviting the degradation of a magnetic characteristic and also to perform low temperature film deposition even at a temperature lower than 150° C. Hence, it is possible to deposit the protective layer while leaving resist and also to reduce the number of steps in the manufacturing of the magneto-resistance effect element having a multilayered structure.
    Type: Grant
    Filed: April 14, 2011
    Date of Patent: June 18, 2013
    Assignee: Canon Anelva Corporation
    Inventors: Naoko Matsui, Eiji Ozaki, Hiroshi Akasaka
  • Patent number: 8403536
    Abstract: A light-emitting module includes a substrate, a wiring pattern, and a light-emitting device that generates heat. The substrate includes a metal base and an insulating base that is stacked on the metal base and has a mount surface on the opposite side of the metal base. The insulating base has a plurality of insulating layers stacked on one another. The wiring pattern is provided on the mount surface of the substrate. The light-emitting device is mounted on the mount surface of the substrate and is electrically connected to the wiring pattern.
    Type: Grant
    Filed: October 27, 2009
    Date of Patent: March 26, 2013
    Assignee: Toshiba Lighting & Technology Corporation
    Inventors: Tsuyoshi Oyaizu, Seiko Kawashima, Haruki Takei, Naoko Matsui
  • Publication number: 20120212962
    Abstract: Provided is a light-emitting glass which is applicable to, e.g., white illuminators including a light-emitting diode as a light source, and which emits light of a warm white color when irradiated with near ultraviolet light and combines long-term weatherability with high heat resistance. Also provided are a light-emitting device equipped with the light-emitting glass and a process for producing the light-emitting glass. The light-emitting glass includes, as the base glass, borosilicate or silicate glass having a separated-phase structure, whereby the base glass is efficiently doped with, for example, transition metal ion clusters which emit light of a warm white color upon irradiation with near ultraviolet light. With this glass, it is possible to attain increases in excitation wavelength and emission wavelength. The glass thus emits, based on a multiple scattering effect, high-intensity light of a warm white color upon irradiation with near ultraviolet light.
    Type: Application
    Filed: October 22, 2010
    Publication date: August 23, 2012
    Applicant: Tokyo University of Science Educational Foundation Administrative Organization
    Inventors: Atsuo Yasumori, Tetsuo Kishi, Naoko Matsui
  • Publication number: 20120145671
    Abstract: The present invention provides a plasma processing apparatus which reduces damage from plasma generated in a discharge vessel and lengthen the replacement cycle of the discharge vessel. A plasma processing apparatus 1 is provided with a processing chamber 2 partitioning a processing space, a discharge vessel 3 whose one end opens facing inside the processing chamber 2 and the other end is closed, an antenna 4 which is disposed around the discharge vessel 3 and generates an induced electric field to generate plasma in the discharge vessel 3 under reduced pressure, and an electromagnet 9 which is arranged around the discharge vessel 3 and forms a divergent magnetic field in the discharge vessel 3. The discharge vessel 3 has at is closed end portion a protrusion 15 projecting toward the processing chamber 2.
    Type: Application
    Filed: August 25, 2010
    Publication date: June 14, 2012
    Applicant: CANON ANELVA CORPORATION
    Inventors: Ryo Matsuhashi, Hiroshi Akasaka, Yoshimitsu Kodaira, Atsushi Sekiguchi, Naoko Matsui
  • Patent number: 8197099
    Abstract: The invention provides an electronic component mounting module capable of increasing the adhesion between the board and the heat radiating member, improving the thermal conductivity, and effectively radiating heat generated from the LEDs being an electronic component. The LEDs are mounted on the surface of the ceramics board, and the rear surface 1b side of the board is disposed at the heat radiating member. A metallic fine particle layer having high thermal conductivity and flexibility is made to intervene between the board and the heat radiating member.
    Type: Grant
    Filed: November 25, 2009
    Date of Patent: June 12, 2012
    Assignee: Toshiba Lighting & Technology Corporation
    Inventors: Tsuyoshi Oyaizu, Seiko Kawashima, Haruki Takei, Naoko Matsui
  • Publication number: 20110256642
    Abstract: The present invention provides a manufacturing method of a magneto-resistance effect element, in which the step coverage of a formed film can be enlarged and also the film can be deposited in a low temperature range. In an embodiment of the present invention, an insulating protective layer is formed on a multilayered structure by a plasma CVD apparatus in which a plasma source and a film deposition chamber are separated from each other by a partition wall plate. According to the present method, it is possible to deposit the protective layer without inviting the degradation of a magnetic characteristic and also to perform low temperature film deposition even at a temperature lower than 150° C. Hence, it is possible to deposit the protective layer while leaving resist and also to reduce the number of steps in the manufacturing of the magneto-resistance effect element having a multilayered structure.
    Type: Application
    Filed: April 14, 2011
    Publication date: October 20, 2011
    Applicant: CANON ANELVA CORPORATION
    Inventors: Naoko Matsui, Eiji Ozaki, Hiroshi Akasaka
  • Publication number: 20100310902
    Abstract: In a method of manufacturing a magneto-resistance element having a multi-layer film including magnetic layers, TaOx generated on the surface of the Ta mask is prevented from peeling off when etching is performed on the multi-layer film using an etching gas containing oxygen atoms. When a Ta mask which is used at the time of dry etching performed on the multi-layer film including magnetic layers with an etching gas containing oxygen atoms is formed by sputtering, the Ar gas pressure is set to be 0.1 Pa to 0.4 Pa.
    Type: Application
    Filed: June 21, 2010
    Publication date: December 9, 2010
    Applicant: CANON ANELVA CORPORATION
    Inventors: Tomoaki Osada, Naoko Matsui, Yoshimitsu Kodaira, Koji Tsunekawa
  • Publication number: 20100135034
    Abstract: The invention provides an electronic component mounting module capable of increasing the adhesion between the board and the heat radiating member, improving the thermal conductivity, and effectively radiating heat generated from the LEDs being an electronic component. The LEDs are mounted on the surface of the ceramics board, and the rear surface 1b side of the board is disposed at the heat radiating member. A metallic fine particle layer having high thermal conductivity and flexibility is made to intervene between the board and the heat radiating member.
    Type: Application
    Filed: November 25, 2009
    Publication date: June 3, 2010
    Inventors: Tsuyoshi OYAIZU, Seiko Kawashima, Haruki Takei, Naoko Matsui
  • Publication number: 20100103680
    Abstract: A light-emitting module includes a substrate, a wiring pattern, and a light-emitting device that generates heat. The substrate includes a metal base and an insulating base that is stacked on the metal base and has a mount surface on the opposite side of the metal base. The insulating base has a plurality of insulating layers stacked on one another. The wiring pattern is provided on the mount surface of the substrate. The light-emitting device is mounted on the mount surface of the substrate and is electrically connected to the wiring pattern.
    Type: Application
    Filed: October 27, 2009
    Publication date: April 29, 2010
    Applicant: TOSHIBA LIGHTING & TECHNOLOGY CORPORATION
    Inventors: Tsuyoshi OYAIZU, Seiko Kawashima, Haruki Takei, Naoko Matsui
  • Publication number: 20080277377
    Abstract: The object of the present invention is to provide a masking material for dry etching, which is suitable for fine processing of a magnetic film as thin as a few nm such as NiFe or CoFe constituting a TMR film and capable of simplifying the process for producing a TMR element and reducing production costs related to facilities and materials. This object was solved by a masking material for dry etching of a magnetic material by using a mixed gas of carbon monoxide and a nitrogenous compound as etching gas, which comprises a metal (tantalum, tungsten, zirconium or hafnium) with a melting or boiling point increasing upon conversion thereof into a nitride or carbide.
    Type: Application
    Filed: July 16, 2008
    Publication date: November 13, 2008
    Inventors: Isao Nakatani, Kimiko Mashimo, Naoko Matsui
  • Publication number: 20070119811
    Abstract: The object of the present invention is to provide a masking material for dry etching, which is suitable for fine processing of a magnetic film as thin as a few nm such as NiFe or CoFe constituting a TMR film and capable of simplifying the process for producing a TMR element and reducing production costs related to facilities and materials. This object was solved by a masking material for dry etching of a magnetic material by using a mixed gas of carbon monoxide and a nitrogenous compound as etching gas, which comprises a metal (tantalum, tungsten, zirconium or hafnium) with a melting or boiling point increasing upon conversion thereof into a nitride or carbide.
    Type: Application
    Filed: November 20, 2006
    Publication date: May 31, 2007
    Inventors: Isao Nakatani, Kimiko Mashimo, Naoko Matsui
  • Publication number: 20020038681
    Abstract: The object of the present invention is to provide a masking material for dry etching, which is suitable for fine processing of a magnetic film as thin as a few nm such as NiFe or CoFe constituting a TMR film and capable of simplifying the process for producing a TMR element and reducing production costs related to facilities and materials. This object was solved by a masking material for dry etching of a magnetic material by using a mixed gas of carbon monoxide and a nitrogenous compound as etching gas, which comprises a metal (tantalum, tungsten, zirconium or hafnium) with a melting or boiling point increasing upon conversion thereof into a nitride or carbide.
    Type: Application
    Filed: July 24, 2001
    Publication date: April 4, 2002
    Inventors: Isao Nakatani, Kimiko Mashimo, Naoko Matsui