Abstract: A stabilizer represented by the following formula for suppressing generation of silane from a polysilane composition: CH2?CH—R1 wherein R1 is C3-20 linear, branched or cyclic alkyl group, C2-15 linear or branched alkenyl group or C7-20 aryl group substituted with alkenyl group. A invention also relates to a method for suppressing generation of silane and a method for inactivating a polysilane, and a polysilane inactivated treatment composition.

Abstract: To provide an amorphous silicon forming composition, which has high affinity with a substrate. An amorphous silicon forming composition comprising a polysilane having an amino group; and a solvent.

Abstract: To provide an amorphous silicon forming composition, which has high affinity with a substrate, is excellent in filling properties, and is capable of forming a thick film. [Means for Solution] An amorphous silicon forming composition comprising: (a) a block copolymer comprising a linear and/or cyclic block A having a polysilane skeleton comprising 5 or more silicon and a block B having a polysilazane skeleton comprising 20 or more silicon, wherein at least one silicon in the block A and at least one silicon in the block B are connected by a single bond and/or a crosslinking group comprising silicon, and (b) a solvent.

Abstract: The present invention provides a method for producing a novel amorphous silicon sacrifice film and an amorphous silicon forming composition capable of filling trenches having a high aspect ratio to form an amorphous silicon sacrifice film that is excellent in affinity with a substrate. A method for producing an amorphous silicon sacrifice film, comprising (i) polymerizing a cyclic polysilane comprising 5 or more silicon or a composition comprising the cyclic polysilane by light irradiation and/or heating to form a polymer having a polysilane skeleton, (ii) applying an amorphous silicon forming composition comprising said polymer having a polysilane skeleton, polysilazane and a solvent above a substrate to form a coating film, and (iii) heating the coating film in a non-oxidizing atmosphere.

Abstract: To provide a siloxazane compound capable of shortening the time of a siliceous film producing process and a composition comprising the same. A siloxazane compound having a specific structure, wherein the ratio of the number of O atoms to the total number of O atoms and N atoms is 5% or more and 25% or less, and in the spectrum of the siloxazane compound obtained by 29Si-NMR in accordance with the inverse gate decoupling method, the ratio of the area of the peak detected in ?75 ppm to ?90 ppm is 4.0% or less to the area of the peak detected in ?25 ppm to ?55 ppm; and a composition comprising the same.

Abstract: To provide a siloxazane compound capable of shortening the time of a siliceous film producing process and a composition comprising the same. A siloxazane compound having a specific structure, wherein the ratio of the number of O atoms to the total number of O atoms and N atoms is 5% or more and 25% or less, and in the spectrum of the siloxazane compound obtained by 29Si-NMR in accordance with the inverse gate decoupling method, the ratio of the area of the peak detected in ?75 ppm to ?90 ppm is 4.0% or less to the area of the peak detected in ?25 ppm to ?55 ppm; and a composition comprising the same.

Abstract: [Problem] To provide a method for forming an isolation structure having a low shrinkage percentage and a low tensile stress. [Means for Solving] A first polysilazane composition containing a porogen is cast on the surface of a substrate to form a coat, and then the coat is fired to form a porous siliceous film having a refractive index of 1.3 or less. Thereafter, the surface of the porous siliceous film is soaked with a second polysilazane composition, and then fired to form an isolation structure of a siliceous film having a refractive index of 1.4 or more.

Abstract: [Problem] To provide a method for forming an isolation structure having a low shrinkage percentage and a low tensile stress. [Means for Solving] A first polysilazane composition containing a porogen is cast on the surface of a substrate to form a coat, and then the coat is fired to form a porous siliceous film having a refractive index of 1.3 or less. Thereafter, the surface of the porous siliceous film is soaked with a second polysilazane composition, and then fired to form an isolation structure of a siliceous film having a refractive index of 1.4 or more.