Patents by Inventor Naoko NAKATA
Naoko NAKATA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10706885Abstract: The same digital data is recorded with highly integrated manner on a plurality of media able to durably hold information over long-term. A minute graphic pattern indicating data bit information is drawn on a resist layer formed on a quartz glass substrate by exposing a beam and developed so as to prepare a master medium (M1), which comprises the quartz glass substrate having a minute recess and protrusion structure formed by etching where the remaining resist are used as a mask (FIG. (a)). The recess and protrusion structure recorded on the master medium (M1) is shaped and transferred onto a flexible recording medium (G2) on which a UV curable resin layer (61) is formed, whereby an intermediate medium (M2) is prepared (FIGS. (b)-(d)).Type: GrantFiled: September 9, 2016Date of Patent: July 7, 2020Assignee: DAI NIPPON PRINTING CO., LTD.Inventors: Yuki Aritsuka, Naoko Nakata, Hirokazu Oda
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Patent number: 10380470Abstract: A data storage medium includes a convexoconcave structure formed in a storage area which is set on a first surface of a quartz glass substrate. The storage area includes a plurality of unit storage areas which are arrayed at least in one direction, and non-data storage areas which are disposed between the unit storage areas, which are adjacent to each other. The convexoconcave structure includes unit data patterns, address patterns and boundary patterns. The unit data patterns are formed in the plurality of unit storage areas respectively in the array sequence of the unit storage areas, and the address patterns are formed in the non-data storage areas so as to correspond to each of the unit storage areas in which the unit data patterns are formed respectively.Type: GrantFiled: September 16, 2016Date of Patent: August 13, 2019Assignee: DAI NIPPON PRINTING CO., LTD.Inventors: Naoko Nakata, Hirokazu Oda, Yuki Aritsuka
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Patent number: 10300639Abstract: An imprint method includes, in the peeling step of peeling a mold off the material layer to be transferred, a region-of-contact recognition operation of recognizing and determining a region of contact of the mold with the material layer to be transferred, a center-of-gravity locating operation of determining a center of gravity of a morphology of the thus recognized region of contact on the basis of that morphology, and a peeling operation of determining a point of force for applying peeling force to the mold or the imprinting substrate in relation to the center of gravity determined by the center-of-gravity locating operation, thereby acting the peeling force on the point of force.Type: GrantFiled: March 8, 2016Date of Patent: May 28, 2019Assignee: DAI NIPPON PRINTING CO., LTD.Inventors: Yuki Aritsuka, Naoko Nakata
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Publication number: 20190147206Abstract: The invention makes it possible to perform highly integrated recording of information and read out the information in a universal method while maintaining long-term durability. Digital data (D) to be stored is divided by a prescribed bit length u to create a plurality of unit data (U1 to U4). The bits constituting the unit data (U1) are arranged in a two-dimensional matrix to create a unit bit matrix (B(U1)), which is converted to a geometrical pattern to thereby create a unit bit graphic pattern (P(U1)). Further, alignment marks (Q) are arranged at four corners to create a unit recording graphic pattern (R(U1)). A drawing pattern (P(E)) is created as an assembly of the unit recording graphic patterns (R(U1) to R(U4)), and is provided to an electron beam lithography system as drawing data (E) whereby a pattern is drawn in a resist layer on a glass substrate.Type: ApplicationFiled: September 15, 2015Publication date: May 16, 2019Applicant: DAI NIPPON PRINTING CO., LTD.Inventors: Naoko NAKATA, Yuki ARITSUKA
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Patent number: 10265724Abstract: An imprint mold has a base, an uneven structure area set on a surface of the base, a measurement area set in the uneven structure area, and a measurement mark structure positioned in the measurement area, the measurement mark structure having a plurality of pattern sets each having a line/space shape. With this, a deformation occurring in a resin layer at the time of release of the resin layer from the mold is prevented, and a measurement mark can be formed with high accuracy.Type: GrantFiled: October 22, 2014Date of Patent: April 23, 2019Assignee: DAI NIPPON PRINTING CO., LTD.Inventors: Naoko Nakata, Kouji Yoshida, Naoshi Kawamata, Takaharu Nagai, Koji Ichimura
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Publication number: 20180293477Abstract: A data storage medium includes a convexoconcave structure formed in a storage area which is set on a first surface of a quartz glass substrate. The storage area includes a plurality of unit storage areas which are arrayed at least in one direction, and non-data storage areas which are disposed between the unit storage areas, which are adjacent to each other. The convexoconcave structure includes unit data patterns, address patterns and boundary patterns. The unit data patterns are formed in the plurality of unit storage areas respectively in the array sequence of the unit storage areas, and the address patterns are formed in the non-data storage areas so as to correspond to each of the unit storage areas in which the unit data patterns are formed respectively.Type: ApplicationFiled: September 16, 2016Publication date: October 11, 2018Applicant: DAI NIPPON PRINTING CO., LTD.Inventors: Naoko NAKATA, Hirokazu ODA, Yuki ARITSUKA
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Patent number: 10088617Abstract: A configuration including a main pattern region and a measurement pattern region which are set on one surface of a substrate having flexibility, wherein the measurement pattern region has at least a region disposed inside the contour line of the main pattern region, a main pattern, in which a plurality of line-shaped main convex patterns are arrayed with desired intervals, is disposed in the main pattern region, a measurement pattern, in which a plurality of line-shaped unit convex patterns are arrayed with desired intervals, is disposed in the measurement pattern region, and the line direction of the main pattern and the line direction of the measurement pattern are the same.Type: GrantFiled: July 30, 2015Date of Patent: October 2, 2018Assignee: DAI NIPPON PRINTING CO., LTD.Inventors: Yasuhiro Ookawa, Keita Iimura, Naoko Nakata
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Publication number: 20180268858Abstract: The same digital data is recorded with highly integrated manner on a plurality of media able to durably hold information over long-term. A minute graphic pattern indicating data bit information is drawn on a resist layer formed on a quartz glass substrate by exposing a beam and developed so as to prepare a master medium (M1), which comprises the quartz glass substrate having a minute recess and protrusion structure formed by etching where the remaining resist are used as a mask (FIG. (a)). The recess and protrusion structure recorded on the master medium (M1) is shaped and transferred onto a flexible recording medium (G2) on which a UV curable resin layer (61) is formed, whereby an intermediate medium (M2) is prepared (FIGS. (b)-(d)).Type: ApplicationFiled: September 9, 2016Publication date: September 20, 2018Applicant: DAI NIPPON PRINTING CO., LTD.Inventors: Yuki ARITSUKA, Naoko NAKATA, Hirokazu ODA
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Publication number: 20170227696Abstract: A configuration including a main pattern region and a measurement pattern region which are set on one surface of a substrate having flexibility, wherein the measurement pattern region has at least a region disposed inside the contour line of the main pattern region, a main pattern, in which a plurality of line-shaped main convex patterns are arrayed with desired intervals, is disposed in the main pattern region, a measurement pattern, in which a plurality of line-shaped unit convex patterns are arrayed with desired intervals, is disposed in the measurement pattern region, and the line direction of the main pattern and the line direction of the measurement pattern are the same.Type: ApplicationFiled: July 30, 2015Publication date: August 10, 2017Applicant: DAI NIPPON PRINTING CO., LTD.Inventors: Yasuhiro OOKAWA, Keita IIMURA, Naoko NAKATA
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Publication number: 20170106408Abstract: An imprint mold has a base 2, an uneven structure area A set on a surface 2a of the base 2, a measurement area 6 set in the uneven structure area A, and a measurement mark structure 7 positioned in the measurement area 6, the measurement mark structure 7 having a plurality of pattern sets 7a each having a line/space shape. With this, a deformation occurring in a resin layer at the time of release of the resin layer from the mold is prevented, and a measurement mark can be formed with high accuracy.Type: ApplicationFiled: October 22, 2014Publication date: April 20, 2017Applicant: DAI NIPPON PRINTING CO., LTD.Inventors: Naoko NAKATA, Kouji YOSHIDA, Naoshi KAWAMATA, Takaharu NAGAI, Koji ICHIMURA
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Publication number: 20160185019Abstract: An imprint method includes, in the peeling step of peeling a mold off the material layer to be transferred, a region-of-contact recognition operation of recognizing and determining a region of contact of the mold with the material layer to be transferred, a center-of-gravity locating operation of determining a center of gravity of a morphology of the thus recognized region of contact on the basis of that morphology, and a peeling operation of determining a point of force for applying peeling force to the mold or the imprinting substrate in relation to the center of gravity determined by the center-of-gravity locating operation, thereby acting the peeling force on the point of force.Type: ApplicationFiled: March 8, 2016Publication date: June 30, 2016Applicant: DAI NIPPON PRINTING CO., LTD.Inventors: Yuki ARITSUKA, Naoko NAKATA
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Patent number: 9316904Abstract: An imprint method includes, in the peeling step of peeling a mold off the material layer to be transferred, a region-of-contact recognition operation of recognizing and determining a region of contact of the mold with the material layer to be transferred, a center-of-gravity locating operation of determining a center of gravity of a morphology of the thus recognized region of contact on the basis of that morphology, and a peeling operation of determining a point of force for applying peeling force to the mold or the imprinting substrate in relation to the center of gravity determined by the center-of-gravity locating operation, thereby acting the peeling force on the point of force.Type: GrantFiled: March 19, 2012Date of Patent: April 19, 2016Assignee: DAI NIPPON PRINTING CO., LTD.Inventors: Yuki Aritsuka, Naoko Nakata
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Publication number: 20160091788Abstract: An imprint mold that has, in a pattern region on a principal surface of a base material, a main pattern with an uneven structure and a dummy pattern with an uneven structure for assisting transfer of the main pattern, wherein at least one end portion of a concave structure or a convex structure of the dummy pattern reaches an outermost periphery of the pattern region, and a closed region that is surrounded with one or more concave structures or convex structures of the dummy pattern does not exist in the pattern region when the imprint mold is planarly viewed.Type: ApplicationFiled: April 16, 2014Publication date: March 31, 2016Applicant: DAI NIPPON PRINTING CO., LTD.Inventors: Yuki ARITSUKA, Naoko NAKATA
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Publication number: 20120251725Abstract: An imprint method includes, in the peeling step of peeling a mold off the material layer to be transferred, a region-of-contact recognition operation of recognizing and determining a region of contact of the mold with the material layer to be transferred, a center-of-gravity locating operation of determining a center of gravity of a morphology of the thus recognized region of contact on the basis of that morphology, and a peeling operation of determining a point of force for applying peeling force to the mold or the imprinting substrate in relation to the center of gravity determined by the center-of-gravity locating operation, thereby acting the peeling force on the point of force.Type: ApplicationFiled: March 19, 2012Publication date: October 4, 2012Applicant: DAI NIPPON PRINTING CO., LTD.Inventors: Yuki ARITSUKA, Naoko NAKATA