Patents by Inventor Naoma Ban
Naoma Ban has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11239042Abstract: The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.Type: GrantFiled: October 1, 2020Date of Patent: February 1, 2022Assignee: Hitachi High-Tech CorporationInventors: Akira Ikegami, Yuta Kawamoto, Naomasa Suzuki, Manabu Yano, Yasushi Ebizuka, Naoma Ban
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Patent number: 11056310Abstract: The objective of the present invention is to provide a charged-particle beam device capable of moving a field-of-view to an exact position even when moving the field-of-view above an actual sample. In order to attain this objective, a charged-particle beam device is proposed comprising an objective lens whereby a charged-particle beam is focused and irradiated onto a sample; a field-of-view moving deflector for deflecting the charged-particle beam; and a stage onto which the sample is placed.Type: GrantFiled: January 12, 2017Date of Patent: July 6, 2021Assignee: Hitachi High-Tech CorporationInventors: Yuta Kawamoto, Akira Ikegami, Yasushi Ebizuka, Naoma Ban
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Publication number: 20210027976Abstract: The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.Type: ApplicationFiled: October 1, 2020Publication date: January 28, 2021Inventors: Akira IKEGAMI, Yuta KAWAMOTO, Naomasa SUZUKI, Manabu YANO, Yasushi EBIZUKA, Naoma BAN
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Patent number: 10832886Abstract: The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.Type: GrantFiled: March 4, 2019Date of Patent: November 10, 2020Assignee: Hitachi High-Tech CorporationInventors: Akira Ikegami, Yuta Kawamoto, Naomasa Suzuki, Manabu Yano, Yasushi Ebizuka, Naoma Ban
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Publication number: 20190393014Abstract: The objective of the present invention is to provide a charged-particle beam device capable of moving a field-of-view to an exact position even when moving the field-of-view above an actual sample. In order to attain this objective, a charged-particle beam device is proposed comprising an objective lens whereby a charged-particle beam is focused and irradiated onto a sample: a field-of-view moving deflector for deflecting the charged-particle beam; and a stage onto which the sample is placed.Type: ApplicationFiled: January 12, 2017Publication date: December 26, 2019Inventors: Yuta KAWAMOTO, Akira IKEGAMI, Yasushi EBIZUKA, Naoma BAN
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Publication number: 20190287754Abstract: The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.Type: ApplicationFiled: March 4, 2019Publication date: September 19, 2019Inventors: Akira IKEGAMI, Yuta KAWAMOTO, Naomasa SUZUKI, Manabu YANO, Yasushi EBIZUKA, Naoma BAN
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Patent number: 9177757Abstract: The present invention relates to a defect inspection apparatus based on the fact that contrasts of a grain and a void of a semiconductor copper interconnect in a scanning electron microscope are changed depending on electron beam irradiation accelerating voltages. A charged particle beam apparatus of the present invention irradiates the same portion of a specimen with electron beams at a plurality of accelerating voltages, and differentiates a grain (65, 66) from a void (67) on the basis of a contrast change amount of the same portion in a plurality of images (61, 62) acquired so as to respectively correspond to the plurality of accelerating voltages. Consequently, it is possible to automatically detect a grain and a void in a differentiation manner at a high speed without destructing a specimen.Type: GrantFiled: June 21, 2013Date of Patent: November 3, 2015Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Naoma Ban, Kenji Obara, Takehiro Hirai
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Patent number: 9136189Abstract: A surface observation apparatus is achieved, which enables even a beginner to easily select an optimal evaluation indicator for each of various patterns to be evaluated without a trial and error approach. A plurality of images to be evaluated are input from an image processing unit (114) to an evaluation image input unit (113a) (in step 901). The input images to be evaluated are displayed on a display (115). A user rearranges the images in accordance with an evaluation criterion of the user while referencing the display (115), and defines an evaluation criterion (in step 902). Evaluation values are calculated for the input images (to be evaluated) using a plurality of evaluation indicators (in step 903). The evaluation values for each of the evaluation indicators are compared with the evaluation criterion defined by the user, and correlation coefficients are then calculated (in step 904).Type: GrantFiled: May 25, 2010Date of Patent: September 15, 2015Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Takehiro Hirai, Kenji Obara, Naoma Ban
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Publication number: 20150170875Abstract: The present invention relates to a defect inspection apparatus based on the fact that contrasts of a grain and a void of a semiconductor copper interconnect in a scanning electron microscope are changed depending on electron beam irradiation accelerating voltages. A charged particle beam apparatus of the present invention irradiates the same portion of a specimen with electron beams at a plurality of accelerating voltages, and differentiates a grain (65, 66) from a void (67) on the basis of a contrast change amount of the same portion in a plurality of images (61, 62) acquired so as to respectively correspond to the plurality of accelerating voltages. Consequently, it is possible to automatically detect a grain and a void in a differentiation manner at a high speed without destructing a specimen.Type: ApplicationFiled: June 21, 2013Publication date: June 18, 2015Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Naoma Ban, Kenji Obara, Takehiro Hirai
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Patent number: 8878925Abstract: With respect to a charged particle beam device, the step size of focal point measure for executing autofocusing is optimized to a value that is optimal with respect to the spread of an approximation curve for a focal point measure distribution. The step size of focal point measure for executing autofocusing is corrected using an image feature obtained based on a layout image derived from an image obtained at a first magnification or from design data. Autofocusing is executed based on the obtained step size to carry out observation, measurement, or to image the sample under inspection.Type: GrantFiled: November 8, 2010Date of Patent: November 4, 2014Assignee: Hitachi High-Technologies CorporationInventors: Naoma Ban, Kenji Obara
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Patent number: 8519334Abstract: The present invention provides a contact hole observation technology for avoiding a situation in which it is difficult to observe a contact hole as a nonuniform charge is formed in the contact hole due to a tilted electron beam during a process for forming a preliminary charge on a sample. The present invention also provides a scanning electron microscope based on such a contact hole observation technology. During a preliminary charge process, an electron beam is allowed to become incident in a plurality of directions to perform a precharge, thereby reducing a region within the contact hole that is not irradiated with the electron beam. This reduces the number of secondary electrons that become lost on the wall surface of the contact hole, thereby making it possible to acquire information about the bottom of the contact hole.Type: GrantFiled: April 20, 2011Date of Patent: August 27, 2013Assignee: Hitachi High-Technologies CorporationInventors: Satoshi Tadaka, Naomasa Suzuki, Naoma Ban, Tatsuichi Kato
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Publication number: 20130037716Abstract: The present invention provides a contact hole observation technology for avoiding a situation in which it is difficult to observe a contact hole as a nonuniform charge is formed in the contact hole due to a tilted electron beam during a process for forming a preliminary charge on a sample. The present invention also provides a scanning electron microscope based on such a contact hole observation technology. During a preliminary charge process, an electron beam is allowed to become incident in a plurality of directions to perform a precharge, thereby reducing a region within the contact hole that is not irradiated with the electron beam. This reduces the number of secondary electrons that become lost on the wall surface of the contact hole, thereby making it possible to acquire information about the bottom of the contact hole.Type: ApplicationFiled: April 20, 2011Publication date: February 14, 2013Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Satoshi Tadaka, Naomasa Suzuki, Naoma Ban, Tatsuichi Kato
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Publication number: 20120300056Abstract: With respect to a charged particle beam device, the step size of focal point measure for executing autofocusing is optimized to a value that is optimal with respect to the spread of an approximation curve for a focal point measure distribution. The step size of focal point measure for executing autofocusing is corrected using an image feature obtained based on a layout image derived from an image obtained at a first magnification or from design data. Autofocusing is executed based on the obtained step size to carry out observation, measurement, or to image the sample under inspection.Type: ApplicationFiled: November 8, 2010Publication date: November 29, 2012Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Naoma Ban, Kenji Obara
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Patent number: 8125647Abstract: An object of this invention is to provide a charged particle beam apparatus that can easily evaluate the stability of a position that is irradiated with a charged particle beam. To achieve the above object, this invention includes a detector that scans a charged particle beam and detects secondary particles that originate from a substrate, and an image processer that displays an image of the substrate on a display based on the secondary particles that are detected by the detector. The image processer is configured to display on the display any two or more members of the group consisting of a scanning image produced by the charged particle beam of the substrate, a wave in time domain showing fluctuations of the irradiation position of the charged particle beam on the substrate, and a power spectrum of the wave in time domain.Type: GrantFiled: February 17, 2009Date of Patent: February 28, 2012Assignee: Hitachi High-Technologies CorporationInventors: Hiroshi Tsuji, Naoma Ban
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Publication number: 20120044262Abstract: A surface observation apparatus is achieved, which enables even a beginner to easily select an optimal evaluation indicator for each of various patterns to be evaluated without a trial and error approach. A plurality of images to be evaluated are input from an image processing unit (114) to an evaluation image input unit (113a) (in step 901). The input images to be evaluated are displayed on a display (115). A user rearranges the images in accordance with an evaluation criterion of the user while referencing the display (115), and defines an evaluation criterion (in step 902). Evaluation values are calculated for the input images (to be evaluated) using a plurality of evaluation indicators (in step 903). The evaluation values for each of the evaluation indicators are compared with the evaluation criterion defined by the user, and correlation coefficients are then calculated (in step 904).Type: ApplicationFiled: May 25, 2010Publication date: February 23, 2012Inventors: Takehiro Hirai, Kenji Obara, Naoma Ban
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Patent number: 8013299Abstract: A defect review method and a defect review device using an electron microscope, reduce the number of user processes necessary to set automatic focal adjustment of an electron beam to provide easier sample observation. The review method comprises the steps of: performing focal adjustment for a plurality of coordinate positions pre-registered on the coordinate on an object under observation; creating a criterion for focal adjustment based on a focal position at each of the plurality of coordinate positions; setting a focal probe range based on a deviation between the criterion and the focal position; and determining an automatic focal adjustment range for defect detection on the object under observation based on the set focal probe range.Type: GrantFiled: February 5, 2009Date of Patent: September 6, 2011Assignee: Hitachi High-Technologies CorporationInventors: Kenji Obara, Takehiro Hirai, Kohei Yamaguchi, Naoma Ban
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Publication number: 20090225326Abstract: An object of this invention is to provide a charged particle beam apparatus that can easily evaluate the stability of a position that is irradiated with a charged particle beam. To achieve the above object, this invention includes a detector that scans a charged particle beam and detects secondary particles that originate from a substrate, and an image processer that displays an image of the substrate on a display based on the secondary particles that are detected by the detector. The image processer is configured to display on the display any two or more members of the group consisting of a scanning image produced by the charged particle beam of the substrate, a wave in time domain showing fluctuations of the irradiation position of the charged particle beam on the substrate, and a power spectrum of the wave in time domain.Type: ApplicationFiled: February 17, 2009Publication date: September 10, 2009Inventors: Hiroshi Tsuji, Naoma Ban
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Publication number: 20090206259Abstract: A defect review method and a defect review device using an electron microscope, reduce the number of user processes necessary to set automatic focal adjustment of an electron beam to provide easier sample observation. The review method comprises the steps of: performing focal adjustment for a plurality of coordinate positions pre-registered on the coordinate on an object under observation; creating a criterion for focal adjustment based on a focal position at each of the plurality of coordinate positions; setting a focal probe range based on a deviation between the criterion and the focal position; and determining an automatic focal adjustment range for defect detection on the object under observation based on the set focal probe range.Type: ApplicationFiled: February 5, 2009Publication date: August 20, 2009Inventors: Kenji Obara, Takehiro Hirai, Kohei Yamaguchi, Naoma Ban
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Publication number: 20080263028Abstract: An object of the present invention is to provide a report search method, and a reviewing apparatus by which a measure against abnormalities such as a defect of a sample may be quickly obtained by searching desired information in a report recording past information. In order to achieve the above object, the present invention has a configuration in which an image of a defective appearance and supplementary information on the image are memorized as a report file as one unit in a database for an observation result of the defective appearance of a sample in a manufacturing process, the supplementary information is searched as a search target among a plurality of report files memorized in the database by use of a search condition set from among the supplementary information, when a new defective appearance is generated, and the searched supplementary information and an image related with the supplementary information are output.Type: ApplicationFiled: January 3, 2008Publication date: October 23, 2008Applicant: Hitachi High-Technologies CorporationInventors: Takehiro Hirai, Kazuo Aoki, Naoma Ban