Patents by Inventor Naoma Ban

Naoma Ban has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210027976
    Abstract: The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.
    Type: Application
    Filed: October 1, 2020
    Publication date: January 28, 2021
    Inventors: Akira IKEGAMI, Yuta KAWAMOTO, Naomasa SUZUKI, Manabu YANO, Yasushi EBIZUKA, Naoma BAN
  • Patent number: 10832886
    Abstract: The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.
    Type: Grant
    Filed: March 4, 2019
    Date of Patent: November 10, 2020
    Assignee: Hitachi High-Tech Corporation
    Inventors: Akira Ikegami, Yuta Kawamoto, Naomasa Suzuki, Manabu Yano, Yasushi Ebizuka, Naoma Ban
  • Publication number: 20190393014
    Abstract: The objective of the present invention is to provide a charged-particle beam device capable of moving a field-of-view to an exact position even when moving the field-of-view above an actual sample. In order to attain this objective, a charged-particle beam device is proposed comprising an objective lens whereby a charged-particle beam is focused and irradiated onto a sample: a field-of-view moving deflector for deflecting the charged-particle beam; and a stage onto which the sample is placed.
    Type: Application
    Filed: January 12, 2017
    Publication date: December 26, 2019
    Inventors: Yuta KAWAMOTO, Akira IKEGAMI, Yasushi EBIZUKA, Naoma BAN
  • Publication number: 20190287754
    Abstract: The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.
    Type: Application
    Filed: March 4, 2019
    Publication date: September 19, 2019
    Inventors: Akira IKEGAMI, Yuta KAWAMOTO, Naomasa SUZUKI, Manabu YANO, Yasushi EBIZUKA, Naoma BAN
  • Patent number: 9177757
    Abstract: The present invention relates to a defect inspection apparatus based on the fact that contrasts of a grain and a void of a semiconductor copper interconnect in a scanning electron microscope are changed depending on electron beam irradiation accelerating voltages. A charged particle beam apparatus of the present invention irradiates the same portion of a specimen with electron beams at a plurality of accelerating voltages, and differentiates a grain (65, 66) from a void (67) on the basis of a contrast change amount of the same portion in a plurality of images (61, 62) acquired so as to respectively correspond to the plurality of accelerating voltages. Consequently, it is possible to automatically detect a grain and a void in a differentiation manner at a high speed without destructing a specimen.
    Type: Grant
    Filed: June 21, 2013
    Date of Patent: November 3, 2015
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Naoma Ban, Kenji Obara, Takehiro Hirai
  • Patent number: 9136189
    Abstract: A surface observation apparatus is achieved, which enables even a beginner to easily select an optimal evaluation indicator for each of various patterns to be evaluated without a trial and error approach. A plurality of images to be evaluated are input from an image processing unit (114) to an evaluation image input unit (113a) (in step 901). The input images to be evaluated are displayed on a display (115). A user rearranges the images in accordance with an evaluation criterion of the user while referencing the display (115), and defines an evaluation criterion (in step 902). Evaluation values are calculated for the input images (to be evaluated) using a plurality of evaluation indicators (in step 903). The evaluation values for each of the evaluation indicators are compared with the evaluation criterion defined by the user, and correlation coefficients are then calculated (in step 904).
    Type: Grant
    Filed: May 25, 2010
    Date of Patent: September 15, 2015
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Takehiro Hirai, Kenji Obara, Naoma Ban
  • Publication number: 20150170875
    Abstract: The present invention relates to a defect inspection apparatus based on the fact that contrasts of a grain and a void of a semiconductor copper interconnect in a scanning electron microscope are changed depending on electron beam irradiation accelerating voltages. A charged particle beam apparatus of the present invention irradiates the same portion of a specimen with electron beams at a plurality of accelerating voltages, and differentiates a grain (65, 66) from a void (67) on the basis of a contrast change amount of the same portion in a plurality of images (61, 62) acquired so as to respectively correspond to the plurality of accelerating voltages. Consequently, it is possible to automatically detect a grain and a void in a differentiation manner at a high speed without destructing a specimen.
    Type: Application
    Filed: June 21, 2013
    Publication date: June 18, 2015
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Naoma Ban, Kenji Obara, Takehiro Hirai
  • Patent number: 8878925
    Abstract: With respect to a charged particle beam device, the step size of focal point measure for executing autofocusing is optimized to a value that is optimal with respect to the spread of an approximation curve for a focal point measure distribution. The step size of focal point measure for executing autofocusing is corrected using an image feature obtained based on a layout image derived from an image obtained at a first magnification or from design data. Autofocusing is executed based on the obtained step size to carry out observation, measurement, or to image the sample under inspection.
    Type: Grant
    Filed: November 8, 2010
    Date of Patent: November 4, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Naoma Ban, Kenji Obara
  • Patent number: 8519334
    Abstract: The present invention provides a contact hole observation technology for avoiding a situation in which it is difficult to observe a contact hole as a nonuniform charge is formed in the contact hole due to a tilted electron beam during a process for forming a preliminary charge on a sample. The present invention also provides a scanning electron microscope based on such a contact hole observation technology. During a preliminary charge process, an electron beam is allowed to become incident in a plurality of directions to perform a precharge, thereby reducing a region within the contact hole that is not irradiated with the electron beam. This reduces the number of secondary electrons that become lost on the wall surface of the contact hole, thereby making it possible to acquire information about the bottom of the contact hole.
    Type: Grant
    Filed: April 20, 2011
    Date of Patent: August 27, 2013
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Satoshi Tadaka, Naomasa Suzuki, Naoma Ban, Tatsuichi Kato
  • Publication number: 20130037716
    Abstract: The present invention provides a contact hole observation technology for avoiding a situation in which it is difficult to observe a contact hole as a nonuniform charge is formed in the contact hole due to a tilted electron beam during a process for forming a preliminary charge on a sample. The present invention also provides a scanning electron microscope based on such a contact hole observation technology. During a preliminary charge process, an electron beam is allowed to become incident in a plurality of directions to perform a precharge, thereby reducing a region within the contact hole that is not irradiated with the electron beam. This reduces the number of secondary electrons that become lost on the wall surface of the contact hole, thereby making it possible to acquire information about the bottom of the contact hole.
    Type: Application
    Filed: April 20, 2011
    Publication date: February 14, 2013
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Satoshi Tadaka, Naomasa Suzuki, Naoma Ban, Tatsuichi Kato
  • Publication number: 20120300056
    Abstract: With respect to a charged particle beam device, the step size of focal point measure for executing autofocusing is optimized to a value that is optimal with respect to the spread of an approximation curve for a focal point measure distribution. The step size of focal point measure for executing autofocusing is corrected using an image feature obtained based on a layout image derived from an image obtained at a first magnification or from design data. Autofocusing is executed based on the obtained step size to carry out observation, measurement, or to image the sample under inspection.
    Type: Application
    Filed: November 8, 2010
    Publication date: November 29, 2012
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Naoma Ban, Kenji Obara
  • Patent number: 8125647
    Abstract: An object of this invention is to provide a charged particle beam apparatus that can easily evaluate the stability of a position that is irradiated with a charged particle beam. To achieve the above object, this invention includes a detector that scans a charged particle beam and detects secondary particles that originate from a substrate, and an image processer that displays an image of the substrate on a display based on the secondary particles that are detected by the detector. The image processer is configured to display on the display any two or more members of the group consisting of a scanning image produced by the charged particle beam of the substrate, a wave in time domain showing fluctuations of the irradiation position of the charged particle beam on the substrate, and a power spectrum of the wave in time domain.
    Type: Grant
    Filed: February 17, 2009
    Date of Patent: February 28, 2012
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Hiroshi Tsuji, Naoma Ban
  • Publication number: 20120044262
    Abstract: A surface observation apparatus is achieved, which enables even a beginner to easily select an optimal evaluation indicator for each of various patterns to be evaluated without a trial and error approach. A plurality of images to be evaluated are input from an image processing unit (114) to an evaluation image input unit (113a) (in step 901). The input images to be evaluated are displayed on a display (115). A user rearranges the images in accordance with an evaluation criterion of the user while referencing the display (115), and defines an evaluation criterion (in step 902). Evaluation values are calculated for the input images (to be evaluated) using a plurality of evaluation indicators (in step 903). The evaluation values for each of the evaluation indicators are compared with the evaluation criterion defined by the user, and correlation coefficients are then calculated (in step 904).
    Type: Application
    Filed: May 25, 2010
    Publication date: February 23, 2012
    Inventors: Takehiro Hirai, Kenji Obara, Naoma Ban
  • Patent number: 8013299
    Abstract: A defect review method and a defect review device using an electron microscope, reduce the number of user processes necessary to set automatic focal adjustment of an electron beam to provide easier sample observation. The review method comprises the steps of: performing focal adjustment for a plurality of coordinate positions pre-registered on the coordinate on an object under observation; creating a criterion for focal adjustment based on a focal position at each of the plurality of coordinate positions; setting a focal probe range based on a deviation between the criterion and the focal position; and determining an automatic focal adjustment range for defect detection on the object under observation based on the set focal probe range.
    Type: Grant
    Filed: February 5, 2009
    Date of Patent: September 6, 2011
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Kenji Obara, Takehiro Hirai, Kohei Yamaguchi, Naoma Ban
  • Publication number: 20090225326
    Abstract: An object of this invention is to provide a charged particle beam apparatus that can easily evaluate the stability of a position that is irradiated with a charged particle beam. To achieve the above object, this invention includes a detector that scans a charged particle beam and detects secondary particles that originate from a substrate, and an image processer that displays an image of the substrate on a display based on the secondary particles that are detected by the detector. The image processer is configured to display on the display any two or more members of the group consisting of a scanning image produced by the charged particle beam of the substrate, a wave in time domain showing fluctuations of the irradiation position of the charged particle beam on the substrate, and a power spectrum of the wave in time domain.
    Type: Application
    Filed: February 17, 2009
    Publication date: September 10, 2009
    Inventors: Hiroshi Tsuji, Naoma Ban
  • Publication number: 20090206259
    Abstract: A defect review method and a defect review device using an electron microscope, reduce the number of user processes necessary to set automatic focal adjustment of an electron beam to provide easier sample observation. The review method comprises the steps of: performing focal adjustment for a plurality of coordinate positions pre-registered on the coordinate on an object under observation; creating a criterion for focal adjustment based on a focal position at each of the plurality of coordinate positions; setting a focal probe range based on a deviation between the criterion and the focal position; and determining an automatic focal adjustment range for defect detection on the object under observation based on the set focal probe range.
    Type: Application
    Filed: February 5, 2009
    Publication date: August 20, 2009
    Inventors: Kenji Obara, Takehiro Hirai, Kohei Yamaguchi, Naoma Ban
  • Publication number: 20080263028
    Abstract: An object of the present invention is to provide a report search method, and a reviewing apparatus by which a measure against abnormalities such as a defect of a sample may be quickly obtained by searching desired information in a report recording past information. In order to achieve the above object, the present invention has a configuration in which an image of a defective appearance and supplementary information on the image are memorized as a report file as one unit in a database for an observation result of the defective appearance of a sample in a manufacturing process, the supplementary information is searched as a search target among a plurality of report files memorized in the database by use of a search condition set from among the supplementary information, when a new defective appearance is generated, and the searched supplementary information and an image related with the supplementary information are output.
    Type: Application
    Filed: January 3, 2008
    Publication date: October 23, 2008
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Takehiro Hirai, Kazuo Aoki, Naoma Ban