Patents by Inventor Naomi Kawahara

Naomi Kawahara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Formyl group-containing porous support, adsorbent using same, method for producing same, and method for producing the adsorbent
    Patent number: 9932415
    Abstract: The present invention relates to a method for producing a formyl group-containing porous base matrix, comprising the steps of introducing a spacer in a formyl group-containing porous particle; and then oxidizing the spacer with periodic acid and/or a periodate, to transform the part of the spacer into a formyl group; wherein the formyl group content in the porous particle after introduction of the spacer is not more than 3 ?mol per 1 mL of the porous particle. Also, the present invention relates to a method for producing an adsorbent, comprising the step of immobilizing an amino group-containing ligand on the formyl group-containing porous base matrix. According to the present invention, a formyl-group containing porous base matrix and an adsorbent produced from the porous base matrix of which adsorption amount is high and which is has high strength and of which ligand is difficult to be leaked are provided.
    Type: Grant
    Filed: August 21, 2015
    Date of Patent: April 3, 2018
    Assignees: KANEKA CORPORATION, JNC CORPORATION
    Inventors: Yoshikazu Kawai, Hiroaki Kawasaki, Naomi Kawahara
  • FORMYL GROUP-CONTAINING POROUS SUPPORT, ADSORBENT USING SAME, METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING THE ADSORBENT
    Publication number: 20150361185
    Abstract: The present invention relates to a method for producing a formyl group-containing porous base matrix, comprising the steps of introducing a spacer in a formyl group-containing porous particle; and then oxidizing the spacer with periodic acid and/or a periodate, to transform the part of the spacer into a formyl group; wherein the formyl group content in the porous particle after introduction of the spacer is not more than 3 ?mol per 1 mL of the porous particle. Also, the present invention relates to a method for producing an adsorbent, comprising the step of immobilizing an amino group-containing ligand on the formyl group-containing porous base matrix. According to the present invention, a formyl-group containing porous base matrix and an adsorbent produced from the porous base matrix of which adsorption amount is high and which is has high strength and of which ligand is difficult to be leaked are provided.
    Type: Application
    Filed: August 21, 2015
    Publication date: December 17, 2015
    Applicants: KANEKA CORPORATION, JNC CORPORATION
    Inventors: Yoshikazu KAWAI, Hiroaki KAWASAKI, Naomi KAWAHARA
  • Formyl group-containing porous support, adsorbent using same, method for producing same, and method for producing the adsorbent
    Patent number: 9149794
    Abstract: The present invention relates to a method for producing a formyl group-containing porous base matrix, comprising the steps of introducing a spacer in a formyl group-containing porous particle; and then oxidizing the spacer with periodic acid and/or a periodate, to transform the part of the spacer into a formyl group; wherein the formyl group content in the porous particle after introduction of the spacer is not more than 3 ?mol per 1 mL of the porous particle. Also, the present invention relates to a method for producing an adsorbent, comprising the step of immobilizing an amino group-containing ligand on the formyl group-containing porous base matrix. According to the present invention, a formyl-group containing porous base matrix and an adsorbent produced from the porous base matrix of which adsorption amount is high and which is has high strength and of which ligand is difficult to be leaked are provided.
    Type: Grant
    Filed: December 3, 2009
    Date of Patent: October 6, 2015
    Assignees: KANEKA CORPORATION, JNC Corporation
    Inventors: Yoshikazu Kawai, Hiroaki Kawasaki, Naomi Kawahara
  • Porous base matrix having formyl group, adsorbent using the porous base matrix, method for production of the porous base matrix, and method for production of the adsorbent
    Patent number: 8828905
    Abstract: The present invention relates to a porous base matrix having formyl group, which base matrix has a structure represented by the formula (2) as a spacer, which structure is obtained by cleaving a group represented by the formula (1): wherein, R1 represents a group forming a five-membered ring or a six-membered ring with —CH(OH)—CH(OH)—; a method for producing the porous base matrix; and an adsorbent obtained by binding a ligand on the porous base matrix. By the present invention, a high-intensity base matrix for an adsorbent and an adsorbent are provided. The amount of a ligand leaked from the adsorbend is small.
    Type: Grant
    Filed: May 30, 2008
    Date of Patent: September 9, 2014
    Assignee: Kaneka Corporation
    Inventors: Yoshikazu Kawai, Naomi Kawahara
  • Formyl Group-Containing Porous Support, Adsorbent Using Same, Method For Producing Same, and Method For Producing The Adsorbent
    Publication number: 20120108794
    Abstract: The present invention relates to a method for producing a formyl group-containing porous base matrix, comprising the steps of introducing a spacer in a formyl group-containing porous particle; and then oxidizing the spacer with periodic acid and/or a periodate, to transform the part of the spacer into a formyl group; wherein the formyl group content in the porous particle after introduction of the spacer is not more than 3 ?mol per 1 mL of the porous particle. Also, the present invention relates to a method for producing an adsorbent, comprising the step of immobilizing an amino group-containing ligand on the formyl group-containing porous base matrix. According to the present invention, a formyl-group containing porous base matrix and an adsorbent produced from the porous base matrix of which adsorption amount is high and which is has high strength and of which ligand is difficult to be leaked are provided.
    Type: Application
    Filed: December 3, 2009
    Publication date: May 3, 2012
    Applicants: JNC CORPORATION, KANEKA CORPORATION
    Inventors: Yoshikazu Kawai, Hiroaki Kawasaki, Naomi Kawahara
  • POROUS BASE MATRIX HAVING FORMYL GROUP, ADSORBENT USING THE POROUS BASE MATRIX, METHOD FOR PRODUCTION OF THE POROUS BASE MATRIX, AND METHOD FOR PRODUCTION OF THE ADSORBENT
    Publication number: 20100184957
    Abstract: The present invention relates to a porous base matrix having formyl group, which base matrix has a structure represented by the formula (2) as a spacer, which structure is obtained by cleaving a group represented by the formula (1): wherein, R1 represents a group forming a five-membered ring or a six-membered ring with —CH(OH)—CH(OH)—; a method for producing the porous base matrix; and an adsorbent obtained by binding a ligand on the porous base matrix. By the present invention, a high-intensity base matrix for an adsorbent and an adsorbent are provided. The amount of a ligand leaked from the adsorbend is small.
    Type: Application
    Filed: May 30, 2008
    Publication date: July 22, 2010
    Inventors: Yoshikazu Kawai, Naomi Kawahara