Patents by Inventor Naomitsu Takashina

Naomitsu Takashina has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4439560
    Abstract: An ambient temperature curing, two-package type coating composition consists essentially of a solution of (1) components reactive with each other to form a film upon curing at ambient temperature and (2) a solvent; said film-forming components (1) being (a) copolymer having pendant epoxy groups prepared by copolymerization of 2 to 60% by weight, on the basis of total monomer, of glycidyl acrylate or methacrylate or allylglycidyl ether with at least one other polymerizable monomer, and (b) 0.1 to 3.0 equivalents of at least one of acid phosphate esters or acid phosphite esters, and said solvent (2) being (c) at least 5% by weight, on the basis of the solvent (2), of an alcoholic solvent, and (d) at least one other organic solvent. The coating composition has a good pot life when mixed into an ultimate single mixture, and the resulting coating film has a good resistance to water.
    Type: Grant
    Filed: August 20, 1981
    Date of Patent: March 27, 1984
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Naomitsu Takashina, Masahiro Shimoi, Yoshinori Iwamoto
  • Patent number: 4329269
    Abstract: This invention relates to a one-package system cold-setting type coating composition which comprises an acrylic copolymer having carboxyl groups in its molecule or an alkyd resin, an aluminum alkoxide complex, a keto-enol tautomeric compound, a solvent and at least one alkali metal hydroxide.
    Type: Grant
    Filed: January 16, 1981
    Date of Patent: May 11, 1982
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Naomitsu Takashina, Masahiro Shimoi, Yoshinori Iwamoto
  • Patent number: 4287113
    Abstract: An ambient temperature curing coating composition having a good resistance to solvent and a good corrosion resistance is provided, and said composition comprises copolymers having pendant epoxy groups prepared by copolymerization of glycidyl acrylate or methacrylate or allyl glycidyl ether with at least one of other polymerizable monomers, 0.1 to 2 moles of phosphoric acid per one equivalent of the epoxy groups of the copolymers, and an organic solvent containing at least 5% by weight of an alcoholic solvent.
    Type: Grant
    Filed: December 12, 1979
    Date of Patent: September 1, 1981
    Assignee: Mitsubishi Gas Chemical Co., Inc.
    Inventors: Naomitsu Takashina, Masahiro Shimoi, Yoshinori Iwamoto
  • Patent number: 4058497
    Abstract: This invention relates to a one package system cold-setting type coating composition which comprises an acrylic copolymer having carboxyl groups in its molecule or an alkyd resin, an aluminum alkoxide complex and a keto-enol tautomeric compound, characterized by adding a specific nitrogen compound to the composition for preventing discoloration of a coated substance.
    Type: Grant
    Filed: September 2, 1975
    Date of Patent: November 15, 1977
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Keiun Ko, Naomitsu Takashina, Senzo Shimizu, Masuya Ikegami, Yoshinori Iwamoto
  • Patent number: 4049634
    Abstract: A resin composition curable in air comprising (A) an unsaturated oligomer having a number average molecular weight of 500 to 4,000 and containing at least two acryloyl and/or methacryloyl groups at the ends of the molecule and at least one ethylenic internal double bond in the oligomer chain and (B) an oligomer having a number average molecular weight of 500 to 4,000 which contains at least two acryloyl and/or methacryloyl groups at the ends of the molecule and at least one pendant allyloxy groups in the oligomer chain with an allyloxy equivalent of not more than 500, and is free from an ethylenic internal double bond in the oligomer chain. The composition is especially useful as a solventless coating agent.
    Type: Grant
    Filed: July 25, 1975
    Date of Patent: September 20, 1977
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Keiun Ko, Naomitsu Takashina, Shigeru Shiokawa, Rokuro Fujita
  • Patent number: 4033890
    Abstract: Novel liquid developers contain in a carrier liquid a toner produced by graft-copolymerization of an addition-polymerizable monomer represented by the formula: ##STR1## wherein R.sub.1 represents a hydrogen atom or a methyl group and R.sub.2 represents an alkyl group having 6 to 20 carbon atoms, an addition-polymerizable monomer having an alkoxysilane group or a phenoxysilane group, and carbon black. The carrier liquid has a high electric resistance and a low dielectric constant.
    Type: Grant
    Filed: February 26, 1975
    Date of Patent: July 5, 1977
    Assignees: Fuji Photo Film Co., Ltd., Mitsubishi Gas Chemical Company, Inc.
    Inventors: Yasuo Tamai, Satoru Honjo, Sadao Osawa, Masato Satomura, Chiaki Osada, Wakio Nagashima, Naomitsu Takashina
  • Patent number: 3951791
    Abstract: An aqueous dispersion of a polymer having a cationic charge on the surface of the polymer particles is used for treatment of fouled water. Said aqueous dispersion contains quaternary ammonium salt or inorganic or organic acid salt of a copolymer obtained by emulsion polymerization of, in the presence of a cationic surfactant, (a) 0.1 - 8.0% by weight based on total monomers of at least one .alpha.,.beta.-ethylenically unsaturated monomers containing basic nitrogen or at least one .alpha.,.beta.-ethylenically unsaturated monomers containing halogen and other (b) .alpha.,.beta.-ethylenically unsaturated monomers and/or (c) conjugate diene monomers, (b) and (c) being copolymerizable with said monomer (a). Said aqueous cationic dispersion is especially effective for treatment of fouled water containing anionic latexes.
    Type: Grant
    Filed: September 7, 1973
    Date of Patent: April 20, 1976
    Assignee: Mitsubishi Gas Chemical Co., Ltd.
    Inventors: Ching Yun Huang, Naomitsu Takashina, Toshiaki Nishimura