Patents by Inventor Naotaka Kubota
Naotaka Kubota has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9618786Abstract: In an electro-optical device 100, a color filter substrate 20 is provided with colored pixels, which are: a red pixel 2(R) with a colored layer 28(R) formed inside a concave portion 25(R) formed in a first surface 20s of a light-transmissive substrate 20d, a green pixel 2(G) with a colored layer 28(G) formed inside a concave portion 25(G) formed in said surface, and a blue pixel 2(B) with a colored layer 28(B) formed inside a concave portion 25(B) formed in said surface. In addition, in the substrate 20d, a non-colored pixel 2(W), at which no colored layer is provided, is provided outside the concave portion 25(R), 25(G), 25(B) at a position where the thickness of the substrate 20d is greater than that at the colored pixels.Type: GrantFiled: July 17, 2014Date of Patent: April 11, 2017Assignee: Seiko Epson CorporationInventors: Reiko Wachi, Hidetoshi Ushiyama, Naotaka Kubota
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Publication number: 20170005144Abstract: An organic EL device includes an organic light-emitting layer provided above a first substrate; a protective layer provided above the organic light-emitting layer; a color filter provided on the protective layer; and a second substrate adhered to the color filter via an adhesive, in which a colored layer includes a first colored layer, a second colored layer, and a third colored layer, the color filter includes a first region in which the first colored layer, the second colored layer, and the third colored layer are respectively arranged as single colors and a second region in which the first colored layer, the second colored layer, and the third colored layer are arranged in a layered manner, and a height difference-relieving layer is provided between the color filter and the adhesive.Type: ApplicationFiled: April 29, 2016Publication date: January 5, 2017Applicant: SEIKO EPSON CORPORATIONInventors: Suguru AKAGAWA, Narumi ISHIBASHI, Naotaka KUBOTA
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Publication number: 20160170260Abstract: In an electro-optical device 100, a color filter substrate 20 is provided with colored pixels, which are: a red pixel 2(R) with a colored layer 28(R) formed inside a concave portion 25(R) formed in a first surface 20s of a light-transmissive substrate 20d, a green pixel 2(G) with a colored layer 28(G) formed inside a concave portion 25(G) formed in said surface, and a blue pixel 2(B) with a colored layer 28(B) formed inside a concave portion 25(B) formed in said surface. In addition, in the substrate 20d, a non-colored pixel 2(W), at which no colored layer is provided, is provided outside the concave portion 25(R), 25(G), 25(B) at a position where the thickness of the substrate 20d is greater than that at the colored pixels.Type: ApplicationFiled: July 17, 2014Publication date: June 16, 2016Inventors: Reiko Wachi, Hidetoshi Ushiyama, Naotaka Kubota
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Publication number: 20150293173Abstract: Deterioration in operation performance due to a fault diagnosis is prevented. A semiconductor device 90 according to the present invention includes a plurality of CPU cores 91 to 94 each including a scan chain, and a diagnostic test circuit 95 that performs a scan test for the plurality of CPU cores 91 to 94 by using the scan chain of the CPU core. The diagnostic test circuit 95 performs a scan test for each of the plurality of CPU cores 91 to 94 in a predetermined order on a periodic basis so that execution time periods of the scan tests do not overlap each other.Type: ApplicationFiled: April 1, 2015Publication date: October 15, 2015Inventors: Yukitoshi TSUBOI, Hideo NAGANO, Hiroshi NAGAOKA, Yusuke MATSUNAGA, Yutaka IGAKU, Naotaka KUBOTA
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Publication number: 20150102376Abstract: A light-emitting device includes a light-emitting element disposed in a display region and including a first electrode, a second electrode, and a light-emitting functional layer. The light-emitting device includes a wiring formed in a periphery of the display region and that is electrically connected to the second electrode, and a filter layer having a first color filter that overlaps the light-emitting element and a first layer that overlaps the peripheral wiring. The first color filter and the first layer are formed from a first colored layer that transmits light having a first wavelength.Type: ApplicationFiled: October 8, 2014Publication date: April 16, 2015Inventors: Takashi TOYA, Takeshi KOSHIHARA, Naotaka KUBOTA, Ryoichi NOZAWA
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Patent number: 8293449Abstract: There is provided a positive type resist composition comprising (A) a resin component with only units derived from an acrylate ester in the principal chain, for which the solubility in alkali increases under the action of acid, (B) an acid generator component which generates acid on exposure, and (C) an organic solvent component, wherein the resin component (A) is a copolymer comprising (a1) a structural unit derived from an acrylate ester comprising, as an acid dissociable dissolution inhibiting group on a side chain, a polycyclic dissolution inhibiting group which is eliminated more easily than a 2-methyl-2-adamantyl group, (a2) a structural unit derived from an acrylate ester comprising a lactone containing polycyclic group on a side chain, and (a3) a structural unit derived from an acrylate ester comprising a hydroxyl group containing polycyclic group on a side chain; as well as a resist pattern formation method using such a composition.Type: GrantFiled: November 29, 2002Date of Patent: October 23, 2012Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Takeshi Iwai, Naotaka Kubota, Satoshi Fujimura, Hideo Hada
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Patent number: 7723007Abstract: The present invention provides a polymer compound which can constitute a photoresist composition which is capable of having an excellent resolution, forming a fine pattern with a good rectangularity, obtaining favorable resist characteristics even when acid strength of a acid generated from an acid generator is weak, and having favorable sensitivity; a photoresist composition including the polymer compound; and a resist pattern formation method using the photoresist composition.Type: GrantFiled: January 28, 2005Date of Patent: May 25, 2010Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Toshiyuki Ogata, Syogo Matsumaru, Yohei Kinoshita, Hideo Hada, Daiju Shiono, Hiroaki Shimizu, Naotaka Kubota
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Patent number: 7501221Abstract: There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali increases under the action of acid, (B) an acid generator component which generates acid on exposure, and (C) an organic solvent, wherein the component (A) comprises both a structural unit derived from a methacrylate ester and a structural unit derived from an acrylate ester. According to such a resist composition, a resist pattern can be formed which displays little surface roughness and line edge roughness on etching, and also offers excellent resolution and a wide depth of focus range.Type: GrantFiled: February 2, 2006Date of Patent: March 10, 2009Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Takeshi Iwai, Naotaka Kubota, Satoshi Fujimura, Miwa Miyairi, Hideo Hada
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Patent number: 7435530Abstract: A positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali increases under the action of acid, (B) an acid generator component which generates acid on exposure, and (C) an organic solvent, wherein the component (A) comprises both a structural unit derived from a methacrylate ester and a structural unit derived from an acrylate ester. According to such a resist composition, a resist pattern can be formed which displays little surface roughness and line edge roughness on etching, and also offers excellent resolution and a wide depth of focus range.Type: GrantFiled: January 9, 2007Date of Patent: October 14, 2008Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Takeshi Iwai, Naotaka Kubota, Satoshi Fujimura, Miwa Miyairi, Hideo Hada
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Publication number: 20080166655Abstract: The present invention provides a polymer compound which can constitute a photoresist composition which is capable of having an excellent resolution, forming a fine pattern with a good rectangularity, obtaining favorable resist characteristics even when acid strength of a acid generated from an acid generator is weak, and having favorable sensitivity; a photoresist composition including the polymer compound; and a resist pattern formation method using the photoresist composition.Type: ApplicationFiled: January 28, 2005Publication date: July 10, 2008Inventors: Toshiyuki Ogata, Syogo Matsumaru, Yohei Kinoshita, Hideo Hada, Daiju Shiono, Hiroaki Shimizu, Naotaka Kubota
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Patent number: 7390612Abstract: There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali increases under the action of acid, (B) an acid generator component which generates acid on exposure, and (C) an organic solvent, wherein the component (A) comprises both a structural unit derived from a methacrylate ester and a structural unit derived from an acrylate ester. According to such a resist composition, a resist pattern can be formed which displays little surface roughness and line edge roughness on etching, and also offers excellent resolution and a wide depth of focus range.Type: GrantFiled: February 2, 2006Date of Patent: June 24, 2008Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Takeshi Iwai, Naotaka Kubota, Satoshi Fujimura, Miwa Miyairi, Hideo Hada
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Patent number: 7326515Abstract: There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali increases under the action of acid, (B) an acid generator component which generates acid on exposure, and (C) an organic solvent, wherein the component (A) comprises both a structural unit derived from a methacrylate ester and a structural unit derived from an acrylate ester. According to such a resist composition, a resist pattern can be formed which displays little surface roughness and line edge roughness on etching, and also offers excellent resolution and a wide depth of focus range.Type: GrantFiled: December 7, 2004Date of Patent: February 5, 2008Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Takeshi Iwai, Naotaka Kubota, Satoshi Fujimura, Miwa Miyairi, Hideo Hada
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Patent number: 7323287Abstract: There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali increases under the action of acid, (B) an acid generator component which generates acid on exposure, and (C) an organic solvent, wherein the component (A) comprises both a structural unit derived from a methacrylate ester and a structural unit derived from an acrylate ester. According to such a resist composition, a resist pattern can be formed which displays little surface roughness and line edge roughness on etching, and also offers excellent resolution and a wide depth of focus range.Type: GrantFiled: February 2, 2006Date of Patent: January 29, 2008Assignee: Tokyo Ohka Kogyo Co., LtdInventors: Takeshi Iwai, Naotaka Kubota, Satoshi Fujimura, Miwa Miyairi, Hideo Hada
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Patent number: 7316885Abstract: There are provided a method of forming a resist pattern that enables the resist pattern to be formed with good control of the pattern size, as well as a positive resist composition used in the method, and a layered product formed using the positive resist composition. In the above method a positive resist composition comprising a resin component (A), which contains a structural unit (a1) derived from a (meth)acrylate ester represented by a general formula (I) shown below, and displays increased alkali solubility under action of acid, and an acid generator component (B) that generates acid on exposure is applied to a substrate, a prebake is conducted, the resist composition is selectively exposed, post exposure baking (PEB) is conducted, alkali developing is then used to form a resist pattern, and the pattern size of the thus produced resist pattern is then narrowed by heat treatment.Type: GrantFiled: December 1, 2003Date of Patent: January 8, 2008Assignee: Tokyo Ohka Kogyo Co., LtdInventors: Hideo Hada, Miwa Miyairi, Naotaka Kubota, Takeshi Iwai
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Patent number: 7316888Abstract: There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali increases under the action of acid, (B) an acid generator component which generates acid on exposure, and (C) an organic solvent, wherein the component (A) comprises both a structural unit derived from a methacrylate ester and a structural unit derived from an acrylate ester. According to such a resist composition, a resist pattern can be formed which displays little surface roughness and line edge roughness on etching, and also offers excellent resolution and a wide depth of focus range.Type: GrantFiled: February 2, 2006Date of Patent: January 8, 2008Assignee: Tokyo Ohka Kogyo Co., LtdInventors: Takeshi Iwai, Naotaka Kubota, Satoshi Fujimura, Miwa Miyairi, Hideo Hada
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Patent number: 7316889Abstract: There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali increases under the action of acid, (B) an acid generator component which generates acid on exposure, and (C) an organic solvent, wherein the component (A) comprises both a structural unit derived from a methacrylate ester and a structural unit derived from an acrylate ester. According to such a resist composition, a resist pattern can be formed which displays little surface roughness and line edge roughness on etching, and also offers excellent resolution and a wide depth of focus range.Type: GrantFiled: February 2, 2006Date of Patent: January 8, 2008Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Takeshi Iwai, Naotaka Kubota, Satoshi Fujimura, Miwa Miyairi, Hideo Hada
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Publication number: 20070190455Abstract: A positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali increases under the action of acid, (B) an acid generator component which generates acid on exposure, and (C) an organic solvent, wherein the component (A) comprises both a structural unit derived from a methacrylate ester and a structural unit derived from an acrylate ester. According to such a resist composition, a resist pattern can be formed which displays little surface roughness and line edge roughness on etching, and also offers excellent resolution and a wide depth of focus range.Type: ApplicationFiled: January 9, 2007Publication date: August 16, 2007Applicant: Tokyo Ohka Kogyo Co., Ltd.Inventors: Takeshi Iwai, Naotaka Kubota, Satoshi Fujimura, Miwa Miyairi, Hideo Hada
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Patent number: 7129020Abstract: Disclosed is a liquid coating composition for forming a top antireflective film that contains a polymer, the polymer containing, as a structural unit, a (meth)acrylate unit that has at least one polycyclic hydrocarbon group on its side chain and becomes more soluble to alkali by the action of an acid, the liquid coating composition comprising: (a) a water-soluble, film-forming component; (b) at least one fluorine-based compound selected from a perfluoroalkylcarboxylic acid having 4 or more carbon atoms and a perfluoroalkylsulfonic acid having 5 or more carbon atoms; and (c) a fluoroalkylsulfonic acid having 1–4 carbon atoms and/or an acidic compound consisting of a hydrocarbon having 1–4 carbon atoms in which one or more hydrogen atoms are substituted with a fluoloalkylsulfonyl group(s), with the proviso that one or more carbon atoms therein may be substituted with a nitrogen atom(s).Type: GrantFiled: May 23, 2003Date of Patent: October 31, 2006Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Kazumasa Wakiya, Naotaka Kubota, Shigeru Yokoi, Takayuki Haraguchi
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Publication number: 20060154181Abstract: There are provided a method of forming a resist pattern that enables the resist pattern to be formed with good control of the pattern size, as well as a positive resist composition used in the method, and a layered product formed using the positive resist composition. In the above method a positive resist composition comprising a resin component (A), which contains a structural unit (a1) derived from a (meth)acrylate ester represented by a general formula (I) shown below, and displays increased alkali solubility under action of acid, and an acid generator component (B) that generates acid on exposure is applied to a substrate, a prebake is conducted, the resist composition is selectively exposed, post exposure baking (PEB) is conducted, alkali developing is then used to form a resist pattern, and the pattern size of the thus produced resist pattern is then narrowed by heat treatment.Type: ApplicationFiled: December 1, 2003Publication date: July 13, 2006Inventors: Hideo Hada, Miwa Miyairi, Naotaka Kubota, Takeshi Iwai
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Patent number: 7074543Abstract: There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali increases under the action of acid, (B) an acid generator component which generates acid on exposure, and (C) an organic solvent, wherein the component (A) comprises both a structural unit derived from a methacrylate ester and a structural unit derived from an acrylate ester. According to such a resist composition, a resist pattern can be formed which displays little surface roughness and line edge roughness on etching, and also offers excellent resolution and a wide depth of focus range.Type: GrantFiled: November 29, 2002Date of Patent: July 11, 2006Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Takeshi Iwai, Naotaka Kubota, Satoshi Fujimura, Miwa Miyairi, Hideo Hada