Patents by Inventor Naoto Abe

Naoto Abe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5291023
    Abstract: A position detecting system for detecting the relative position of two objects is disclosed wherein: light is projected to the two objects so that the light from the two objects is received by a position detector; to an output signal from the detector is applied a weight coefficient corresponding to the position to determine a gravity center of the light incident; a region of the position detector is set on the basis of the determination; the gravity center of the light incident is determined again on the basis of the set region; and the relative position of the two objects is determined on the basis of the second determination.
    Type: Grant
    Filed: February 22, 1993
    Date of Patent: March 1, 1994
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masanobu Hasegawa, Minoru Yoshii, Naoto Abe
  • Patent number: 5160848
    Abstract: A device, usable with first and second opposed objects each having at least one diffraction grating, for detecting a positional relationship between those objects in a direction perpendicular to the direction in which they are opposed, is disclosed. The device includes a light source for projecting light to a diffraction grating of one of the first and second objects and a first detecting system for detecting, in a first plane, first light diffracted by diffraction gratings of the first and second objects. The position of incidence of the first light on the first plane is changeable with a change in the relative position of the first and second objects in the perpendicular direction.
    Type: Grant
    Filed: February 12, 1992
    Date of Patent: November 3, 1992
    Assignee: Canon Kabushiki Kaisha
    Inventors: Kenji Saitoh, Masakazu Matsugu, Naoto Abe
  • Patent number: 5148038
    Abstract: A device for detecting a positional relationship between opposed first and second objects.
    Type: Grant
    Filed: December 10, 1991
    Date of Patent: September 15, 1992
    Assignee: Canon Kabushiki Kaisha
    Inventors: Noriyuki Nose, Naoto Abe
  • Patent number: 5114235
    Abstract: A method of detecting relative positional deviation of first and second substrates, wherein first and second marks with optical powers are formed on the first and second substrates. A radiation beam is projected to the first substrate and, as a result, the first and second marks produce a signal beam whose position of incidence upon a predetermined plane is changeable with the relative positional deviation of the first and second substrates. A sensor is disposed adjacent to the predetermined plane and receives the signal beam to produce an output signal corresponding to the position of incidence of the signal beam upon the sensor. Here, a reference mark is provided to produce, when irradiated with a radiation beam, a reference beam so that it advances along a light path substantially the same as the light path for the signal beam to the sensor when the first and second substrates are in a predetermined positional relation.
    Type: Grant
    Filed: July 17, 1990
    Date of Patent: May 19, 1992
    Assignee: Canon Kabushiki Kaisha
    Inventors: Shigeyuki Suda, Naoto Abe
  • Patent number: 5028797
    Abstract: An alignment system for aligning a mask and a wafer into a predetermined positional relationship uses alignment marks provided on the mask and the water. In this system, light from a light source is directed to the alignment marks of the mask and the wafer and, then, the light from these alignment marks is detected by an accumulation type photoelectric converting device, for alignment of the mask and the wafer. The accumulation time of the photoelectric converting device is controlled to be sufficiently longer than or to be equal to a multiple, by an integral number, of the period of relative and natural vibration of the mask and the wafer. This makes it possible to reduce the effect of the relative vibration of the mask and the wafer upon the alignment result and, therefore, makes it possible to enhance the alignment precision.
    Type: Grant
    Filed: September 28, 1989
    Date of Patent: July 2, 1991
    Assignee: Canon Kabushiki Kaisha
    Inventors: Naoto Abe, Shigeyuki Suda, Koji Uda, Hirohisa Ohta, Noriyuki Nose
  • Patent number: 4875090
    Abstract: An information data transmission system deals with a plurality of kinds of information data different in quantity from one another and respectively corresponding to prescribed amounts of an information signal. The system has first encoding circuitry for encoding the plurality of kinds of information data and second encoding circuitry for predictively encoding the plurality of kinds of information data. The timing of the production of outputs from the first and second encoding circuits is such that, for all kinds of the plurality of information data, the quantity of information data encoded by the first encoding circuitry is equalized.
    Type: Grant
    Filed: January 16, 1987
    Date of Patent: October 17, 1989
    Assignee: Canon Kabushiki Kaisha
    Inventors: Makoto Shimokoriyama, Shinichi Yamashita, Naoto Abe, Motokazu Kashida, Masahiro Takei, Koji Takahashi
  • Patent number: 4829485
    Abstract: A method of reading signals from a plurality of charge-storage devices in a charge-storage line sensor circuit so as to cause a switching device respectively corresponding to the plurality of charge-storage devices to sequentially read the stored signals and to sequentially reset the storage devices during a line read period. Dead time intervals are provided in the line read period between successive device read periods. A resetting operation for each storage device is performed in a dead time interval after the read operation for that storage device is completed.
    Type: Grant
    Filed: July 1, 1987
    Date of Patent: May 9, 1989
    Assignee: Canon Kabushiki Kaisha
    Inventors: Katsunori Hatanaka, Naoto Abe, Eiji Sakamoto, Toshihiro Saika
  • Patent number: 4779276
    Abstract: A data transmission system operative to transmit data with a reduced low band frequency component includes facility for processing a predetermined quantity of information data, such as a code word, for generating error detecting-correcting data, and for dispersing the latter data in the former data. In one practice for effecting the dispersion, the system divides the information data and the error detecting-correcting data into respective groupings, and disperses the latter grouping into the former grouping. The resulting signal is transmitted.
    Type: Grant
    Filed: July 25, 1986
    Date of Patent: October 18, 1988
    Assignee: Canon Kabushiki Kaisha
    Inventors: Motokazu Kashida, Shinichi Yamashita, Naoto Abe, Makoto Shimokoriyama, Masahiro Takei, Koji Takahashi
  • Patent number: 4501621
    Abstract: A coating layer, such as a photosensitive selenium coating is removed from a substrate by producing cracks in the layer, introducing a volume expansive material into the cracks, and then causing the volume expansive material introduced into the cracks to expand and thereby dislodge the coating layer from the substrate.
    Type: Grant
    Filed: July 13, 1983
    Date of Patent: February 26, 1985
    Assignee: Konishiroku Photo Industry Co., Ltd.
    Inventors: Naoto Abe, Hidetoshi Akimoto, Hiroyuki Nomori
  • Patent number: 4368258
    Abstract: In the process for preparing impregnated polymer latex compositions by impregnating a hydrophobic substance in dispersed polymer particles in an aqueous polymer latex, the improvement comprises impregnating said hydrophobic substance, wherein the impregnation is effected by mixing said hydrophobic substance which is solid state, a water-miscible organic solvent and aqueous polymer latex wherein a polymer of the polymer latex is prepared from ethene monomers and containing at least one hydrophilic group.
    Type: Grant
    Filed: March 11, 1981
    Date of Patent: January 11, 1983
    Assignee: Konishiroku Photo Industry Co., Ltd.
    Inventors: Mitsuto Fujiwhara, Syunji Matsuo, Tsuneo Wada, Naoto Abe, Toyoaki Masukawa, Akio Iijima, Keiji Oishi
  • Patent number: 4328283
    Abstract: A photographic polyester support having an adjacent subbing layer which comprises a copolymer of (1) glycidyl acrylate and/or glycidyl methacrylate and (2) hydroxylalkyl acrylate with the alkyl groups of 2-4 carbon atoms and/or hydroxyalkyl methacrylate wherein 0-67 wt % of a copolymerizable vinyl monomer may be present and the method of subbing said support with an aqueous composition of the acrylate copolymer.
    Type: Grant
    Filed: November 13, 1979
    Date of Patent: May 4, 1982
    Assignee: Konishiroku Photo Industry Co., Ltd.
    Inventors: Takanori Nakadate, Naoto Abe, Kenichi Kitahara, Hironobu Nakao
  • Patent number: 4255515
    Abstract: A photographic film which comprises (A) a support, having two sides, (B) at least one light-sensitive emulsion layer on one side of said support (A), and, (C) at least one layer containing a compound represented by formula [I]and a hydrophobic polymer (first layer) and at least one layer containing an antistatic agent (second layer), said first and second layers being placed on the other side of said support (A) and said first layer being placed closer to said support (A) than said second layer: ##STR1## wherein, R.sub.1 represents a carboxylic acid residue having from 12 to 24 carbon atoms and R.sub.2, R.sub.3 and R.sub.4 represent independently hydrogen atoms or organic acid residues having from 1 to 24 carbon atoms.
    Type: Grant
    Filed: November 13, 1978
    Date of Patent: March 10, 1981
    Assignee: Konishiroku Photo Industry Co., Ltd.
    Inventors: Toshiaki Shibue, Koichi Nagayasu, Masayoshi Mayama, Masao Ishihara, Naoto Abe
  • Patent number: 4229523
    Abstract: A method of undercoating a polyester film of a light sensitive photographic material is disclosed in which one side of the film is pretreated such that the contact angle with water is below 58.degree.. Additionally, a layer of an aqueous dispersion containing no organic solvent is applied to said side of said film, said dispersion containing a copolymer containing up to 60% by weight of glycidyl methacrylate and 25-60% by weight of ethyl acrylate.
    Type: Grant
    Filed: March 30, 1979
    Date of Patent: October 21, 1980
    Assignee: Konishiroku Photo Industry Co., Ltd.
    Inventors: Hideyasu Ohta, Jun Shirasaki, Masaru Kanbe, Naoto Abe, Takahiro Uozumi, Masayoshi Mayama
  • Patent number: 4192683
    Abstract: A photographic light-sensitive material comprising a layer which contains a compound represented by the following Formula I ##STR1## wherein R.sub.1 is an alkyl group having 1 to 18 carbon atoms, R.sub.2 is a hydrogen atom or an alkyl group having 1 to 18 carbon atoms with a proviso that when R.sub.2 is a hydrogen atom, R.sub.1 is an alkyl group having 1 to 7 carbon atoms, M is a cation and n is a number of 1 to 50.
    Type: Grant
    Filed: October 18, 1977
    Date of Patent: March 11, 1980
    Assignee: Konishiroku Photo Industry Co., Ltd.
    Inventors: Eiichi Sakamoto, Masao Ishihara, Kazuo Nakazato, Hiroshi Yamada, Sadatugu Terada, Kenichi Kitahara, Naoto Abe, Mamoru Komiya, Masaru Kanbe
  • Patent number: 4128426
    Abstract: The present application is directed to a process for subbing a photographic hydrophobic film which involves subjecting at least one surface of the film to a hydrophylizing pretreatment step, coating the pretreated surface with an aqueous dispersion containing a polymer which has particular comonomers in a combined amount of more than 76%, then coating the coated surface with a liquid containing colloidal silica.
    Type: Grant
    Filed: February 25, 1977
    Date of Patent: December 5, 1978
    Assignee: Konishiroku Photo Industry Co., Ltd.
    Inventors: Hideyasu Ohta, Takahiro Uozumi, Masaru Kanbe, Naoto Abe, Jun Shirasaki, Masayoshi Mayama