Patents by Inventor Naoto Kawanura

Naoto Kawanura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Direct imaging polymer fluid jet orifice
    Publication number: 20020145644
    Abstract: A process for creating and an apparatus employing shaped orifices in a semiconductor substrate. A first layer of material is applied on the semiconductor substrate then a second layer of material is then applied upon the first layer of material. An orifice image is then transferred to the first layer of material and a fluid-well image is transferred to the second layer of material. That portion of the second layer of material where the orifice image is located is then developed along with that portion of the first layer of material where the fluid well is located to define an orifice in the substrate.
    Type: Application
    Filed: June 6, 2002
    Publication date: October 10, 2002
    Inventors: Chien-Hua Chen, Donald E. Wenzel, Qin Liu, Naoto Kawanura, Colby Van Vooren, Colin C. Davis, Richard W. Seaver, Carl Wu, Jeffery S. Hess