Patents by Inventor Naoto Kondo

Naoto Kondo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7405781
    Abstract: A substrate for use in a liquid crystal display, including an insulating substrate cooperating with an oppositely arranged opposite substrate to hold a liquid crystal. A plurality of pixel regions are arranged on the insulating substrate in a matrix form, in each of which a switching element is formed. At least one resin color filter layer is formed on the pixel regions to cover the switching element. Additionally, at least one layer of the resin color filter layers of the plural colors has a cruciform-shaped pattern protruding to cover the switching elements of neighboring pixels when viewed in a direction of a normal of a substrate surface.
    Type: Grant
    Filed: February 9, 2006
    Date of Patent: July 29, 2008
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Atuyuki Hoshino, Shiro Hirota, Naoto Kondo, Tetsuya Fujikawa, Masahiro Kihara, Katsunori Misaki, Seiji Doi, Tomoshige Oda, Akira Komorita, Akihiro Matsui, Manabu Sawasaki, Masahiro Ikeda, Takashi Takagi, Tomonori Tanose, Takuya Saguchi, Hidetoshi Sukenori, Hiroyasu Inoue
  • Patent number: 7351504
    Abstract: In a quadrangular photomask blank substrate with a length on each side of at least 6 inches, which has a pair of strip-like regions that extend from 2 to 10 mm inside each of a pair of opposing sides along an outer periphery of a substrate top surface, with a 2 mm edge portion excluded at each end, each strip-like region is inclined downward toward the outer periphery of the substrate, and a difference between maximum and minimum values for height from a least squares plane for the strip-like region to the strip-like region is at most 0.5 ?m. The substrate exhibits a good surface flatness at the time of wafer exposure.
    Type: Grant
    Filed: July 23, 2004
    Date of Patent: April 1, 2008
    Assignees: Shin-Etsu Chemical Co., Ltd., Kabushiki Kaisha Toshiba, Nikon Corporation
    Inventors: Masayuki Nakatsu, Tsuneo Numanami, Masayuki Mogi, Masamitsu Itoh, Tsuneyuki Hagiwara, Naoto Kondo
  • Patent number: 7344808
    Abstract: A photomask blank substrate is made by polishing a starting substrate to a specific flatness in a principal surface region on a top surface of the substrate so as to form a polished intermediate product, then additionally polishing the intermediate product. Substrates made in this way exhibit a good surface flatness at the time of wafer exposure. When a photomask fabricated from a blank obtained from such a substrate is held on the mask stage of a wafer exposure system with a vacuum chuck, the substrate surface undergoes minimal warping, enabling exposure patterns of small geometry to be written onto wafers to good position and linewidth accuracies.
    Type: Grant
    Filed: July 23, 2004
    Date of Patent: March 18, 2008
    Assignees: Shin-Etsu Chemical Co., Ltd., Nikon Corporation
    Inventors: Tsuneo Numanami, Masayuki Nakatsu, Masayuki Mogi, Tsuneyuki Hagiwara, Naoto Kondo
  • Publication number: 20080055171
    Abstract: A complex antenna device includes: an antenna base having a main surface and first and second ends opposed to each other; a bar antenna including a metal body and disposed upright on a side of the first end of the antenna base; at least one planar antenna mounted on the main surface of the antenna base between the first and second ends of the antenna base; a metallic member provided on a side of the second end of the antenna base so as to substantially remove physical influence of the bar antenna on the planar antenna.
    Type: Application
    Filed: July 27, 2007
    Publication date: March 6, 2008
    Inventors: Junichi NORO, Hisashi Takisawa, Naoto Kondo, Yuichi Saito, Toshiaki Aizawa
  • Patent number: 7329475
    Abstract: Provided that a pair of strip-like regions extend from 2 mm to 10 mm inside each of a pair of opposing sides along an outer periphery of a top surface of a substrate on which a mask pattern is to be formed, with a 2 mm edge portion excluded at each end in a lengthwise direction thereof, the height from a least squares plane for the strip-like regions on the substrate top surface to the strip-like regions is measured at intervals of 0.05-0.35 mm in horizontal and vertical directions, and a substrate in which the difference between the maximum and minimum values for the height among all the measurement points is ?o? ?o?? ???? 0.5 ?m is selected.
    Type: Grant
    Filed: July 23, 2004
    Date of Patent: February 12, 2008
    Assignees: Shin-Estu Chemical Co., Ltd., Kabushiki Kaisha Toshiba, Nikon Corporation
    Inventors: Masayuki Nakatsu, Tsuneo Numanami, Masayuki Mogi, Masamitsu Itoh, Tsuneyuki Hagiwara, Naoto Kondo
  • Publication number: 20080030715
    Abstract: An aerial image of a measurement mark (PM) arranged on a measurement mask (Rm) is conformed to a center in an X-axis direction of a slit (122) arranged on a Z tilt stage (38). While illuminating the measurement mark with an illumination light (IL), a slit plate (190) on which the slit (122) is formed is continuously moved in a Z-axis direction, and based on position information of the slit (122) obtained during the movement and a photoelectric conversion signal outputted from an optical sensor (24) that receives the illumination light (IL) from the measurement mark (PM) via a projection optical system (PL) and the slit (122), a best focus position is detected. Thus, the best focus position of the projection optical system can be measured in a short period of time.
    Type: Application
    Filed: June 21, 2005
    Publication date: February 7, 2008
    Applicant: Nikon Corporation
    Inventors: Naoto Kondo, Tsuneyuki Hagiwara
  • Patent number: 7145619
    Abstract: It is an object of the invention to provide a substrate for a liquid crystal display, a liquid crystal display having the same, and a method of manufacturing the same which make it possible to provide a display having high luminance and preferable display characteristics to be used in display sections of information apparatuses and the like. Each pixel is defined by gate bus lines extending in the horizontal direction and drain bus lines extending in the vertical direction. TFTs are formed in the vicinity of intersections between the bus lines, and resin overlap sections for shielding the TFTs from light are formed above the same. No black matrix is formed on a common electrode substrate which is provided in a face-to-face relationship with a TFT substrate, and the bus lines and the resin overlap sections formed on the TFT substrate function as a black matrix.
    Type: Grant
    Filed: June 10, 2002
    Date of Patent: December 5, 2006
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Manabu Sawasaki, Naoto Kondo, Tetsuya Fujikawa, Takashi Takagi, Tomonori Tanose, Tomoshige Oda, Akira Komorita, Katsunori Misaki, Shiro Hirota
  • Publication number: 20060146243
    Abstract: A liquid crystal display device according to the present invention is constituted of a TFT substrate and an opposing substrate which are arranged so as to be opposite to each other with a liquid crystal layer interposed therebetween. In addition, in the liquid crystal layer, formed is a polymer into which a polymer component added to liquid crystal is polymerized, and which determines directions in which liquid crystal molecules tilt when voltage is applied. In the TFT substrate, formed are a sub picture element electrode directly connected to a TFT and a sub picture element electrode connected to the TFT through capacitive coupling. In each of these sub picture element electrodes, formed are slits extending in directions respectively at angles of 45 degrees, 135 degrees, 225 degrees and 315 degrees to the X axis.
    Type: Application
    Filed: April 12, 2005
    Publication date: July 6, 2006
    Inventors: Yohei Nakanishi, Kunihiro Tashiro, Katsufumi Ohmuro, Kazutaka Hanaoka, Jin Hirosawa, Norio Sugiura, Kengo Kanii, Shota Makimoto, Naoto Kondo, Isao Tsushima, Tomonori Tanose, Takashi Takagi, Tetsuya Fujikawa
  • Patent number: 7070888
    Abstract: A photomask blank substrate is selected for use in a process where at least a masking film or a phase shift film is deposited on a top surface of a photomask blank substrate to form a photomask blank, the deposited film is patterned to form a photomask, and the photomask is mounted in an exposure tool. The substrate is selected by simulating a change in shape in the top surface of the substrate, from prior to film deposition thereon to when the photomask is mounted in the exposure tool; determining the shape of the substrate top surface prior to the change that will impart to the top surface a flat shape when the photomask is mounted in the exposure tool; and selecting, as an acceptable substrate, a substrate having this top surface shape. The selected substrate has an optimized top surface shape that improves productivity in photomask fabrication.
    Type: Grant
    Filed: July 23, 2004
    Date of Patent: July 4, 2006
    Assignees: Shin-Etsu Chemical Co., Ltd., Nikon Corporation
    Inventors: Masayuki Nakatsu, Tsuneo Numanami, Masayuki Mogi, Tsuneyuki Hagiwara, Naoto Kondo
  • Publication number: 20060125994
    Abstract: The invention relates to a substrate for use in a liquid crystal display of a CF-on-TFT structure in which a color filter is formed on the side of an array substrate in which a switching element is formed, and has an object to provide a substrate for use in a liquid crystal display, which enables simplification of a manufacturing process typified by a photolithography process and has high reliability. The substrate for use in the liquid crystal display is constructed to include external connection terminals which include first terminal electrodes electrically connected to gate bus lines led out from a plurality of pixel regions arranged on a glass substrate in a matrix form, second terminal electrodes formed of forming material of a pixel electrode and directly on the glass substrate, and electrode coupling regions for electrically connecting the first and the second terminal electrodes, and which electrically connect an external circuit and the gate bus lines.
    Type: Application
    Filed: February 9, 2006
    Publication date: June 15, 2006
    Inventors: Atuyuki Hoshino, Shiro Hirota, Naoto Kondo, Tetsuya Fujikawa, Masahiro Kihara, Katsunori Misaki, Seiji Doi, Tomoshige Oda, Akira Komorita, Akihiro Matsui, Manabu Sawasaki, Masahiro Ikeda, Takashi Takagi, Tomonori Tanose, Takuya Saguchi, Hidetoshi Sukenori, Hiroyasu Inoue
  • Publication number: 20060125993
    Abstract: The invention relates to a substrate for use in a liquid crystal display of a CF-on-TFT structure in which a color filter is formed on the side of an array substrate in which a switching element is formed, and has an object to provide a substrate for use in a liquid crystal display, which enables simplification of a manufacturing process typified by a photolithography process and has high reliability. The substrate for use in the liquid crystal display is constructed to include external connection terminals which include first terminal electrodes electrically connected to gate bus lines led out from a plurality of pixel regions arranged on a glass substrate in a matrix form, second terminal electrodes formed of forming material of a pixel electrode and directly on the glass substrate, and electrode coupling regions for electrically connecting the first and the second terminal electrodes, and which electrically connect an external circuit and the gate bus lines.
    Type: Application
    Filed: February 9, 2006
    Publication date: June 15, 2006
    Inventors: Atuyuki Hoshino, Shiro Hirota, Naoto Kondo, Tetsuya Fujikawa, Masahiro Kihara, Katsunori Misaki, Seiji Doi, Tomoshige Oda, Akira Komorita, Akihiro Matsui, Manabu Sawasaki, Masahiro Ikeda, Takashi Takagi, Tomonori Tanose, Takuya Saguchi, Hidetoshi Sukenori, Hiroyasu Inoue
  • Patent number: 7050137
    Abstract: The invention relates to a substrate for use in a liquid crystal display of a CF-on-TFT structure in which a color filter is formed on the side of an array substrate in which a switching element is formed, and has an object to provide a substrate for use in a liquid crystal display, which enables simplification of a manufacturing process typified by a photolithography process and has high reliability. The substrate for use in the liquid crystal display is constructed to include external connection terminals which include first terminal electrodes electrically connected to gate bus lines led out from a plurality of pixel regions arranged on a glass substrate in a matrix form, second terminal electrodes formed of forming material of a pixel electrode and directly on the glass substrate, and electrode coupling regions for electrically connecting the first and the second terminal electrodes, and which electrically connect an external circuit and the gate bus lines.
    Type: Grant
    Filed: September 27, 2002
    Date of Patent: May 23, 2006
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Atuyuki Hoshino, Shiro Hirota, Naoto Kondo, Tetsuya Fujikawa, Masahiro Kihara, Katsunori Misaki, Seiji Doi, Tomoshige Oda, Akira Komorita, Akihiro Matsui, Manabu Sawasaki, Masahiro Ikeda, Takashi Takagi, Tomonori Tanose, Takuya Saguchi, Hidetoshi Sukenori, Hiroyasu Inoue
  • Publication number: 20060097970
    Abstract: Fine electrode patterns pattern-formed in the shape of fine teeth of a comb bilaterally symmetrical with respect to band-shaped portions are formed at even intervals in a pixel electrode, and band-shaped dielectric layers are pattern-formed at even intervals to cover the fine electrode patterns in a display pixel. By the existence of the dielectric layer and the fine electrode pattern complementing this, a portion formed with these layer and fine electrode pattern is a high threshold voltage region, and relatively, a low threshold voltage region where the dielectric layer does not exist is formed. By the aforementioned construction, it becomes possible to improve a delay in response speed at low gray levels and increase the speed of halftone response, whereby a very reliable image display having moving image performance almost equal to that of a CRT is realized.
    Type: Application
    Filed: October 15, 2005
    Publication date: May 11, 2006
    Applicants: Fujitsu Display Technologies Corporation, SHARP KABUSHIKI KAISHA
    Inventors: Arihiro Takeda, Shingo Kataoka, Kimiaki Nakamura, Hideaki Tsuda, Takahiro Sasaki, Kazuya Ueda, Masahiro Ikeda, Katsunori Misaki, Naoto Kondo, Akira Komorita
  • Publication number: 20050019676
    Abstract: Provided that a pair of strip-like regions extend from 2 mm to 10 mm inside each of a pair of opposing sides along an outer periphery of a top surface of a substrate on which a mask pattern is to be formed, with a 2 mm edge portion excluded at each end in a lengthwise direction thereof, the height from a least squares plane for the strip-like regions on the substrate top surface to the strip-like regions is measured at intervals of 0.05-0.35 mm in horizontal and vertical directions, and a substrate in which the difference between the maximum and minimum values for the height among all the measurement points is ?o? ?o?? ???? 0.5 ?m is selected.
    Type: Application
    Filed: July 23, 2004
    Publication date: January 27, 2005
    Inventors: Masayuki Nakatsu, Tsuneo Numanami, Masayuki Mogi, Masamitsu Itoh, Tsuneyuki Hagiwara, Naoto Kondo
  • Publication number: 20050019678
    Abstract: A photomask blank substrate is selected for use in a process where at least a masking film or a phase shift film is deposited on a top surface of a photomask blank substrate to form a photomask blank, the deposited film is patterned to form a photomask, and the photomask is mounted in an exposure tool. The substrate is selected by simulating a change in shape in the top surface of the substrate, from prior to film deposition thereon to when the photomask is mounted in the exposure tool; determining the shape of the substrate top surface prior to the change that will impart to the top surface a flat shape when the photomask is mounted in the exposure tool; and selecting, as an acceptable substrate, a substrate having this top surface shape. The selected substrate has an optimized top surface shape that improves productivity in photomask fabrication.
    Type: Application
    Filed: July 23, 2004
    Publication date: January 27, 2005
    Inventors: Masayuki Nakatsu, Tsuneo Numanami, Masayuki Mogi, Tsuneyuki Hagiwara, Naoto Kondo
  • Publication number: 20050019677
    Abstract: In a quadrangular photomask blank substrate with a length on each side of at least 6 inches, which has a pair of strip-like regions that extend from 2 to 10 mm inside each of a pair of opposing sides along an outer periphery of a substrate top surface, with a 2 mm edge portion excluded at each end, each strip-like region is inclined downward toward the outer periphery of the substrate, and a difference between maximum and minimum values for height from a least squares plane for the strip-like region to the strip-like region is at most 0.5 ?m. The substrate exhibits a good surface flatness at the time of wafer exposure.
    Type: Application
    Filed: July 23, 2004
    Publication date: January 27, 2005
    Inventors: Masayuki Nakatsu, Tsuneo Numanami, Masayuki Mogi, Masamitsu Itoh, Tsuneyuki Hagiwara, Naoto Kondo
  • Publication number: 20050020083
    Abstract: A photomask blank substrate is made by polishing a starting substrate to a specific flatness in a principal surface region on a top surface of the substrate so as to form a polished intermediate product, then additionally polishing the intermediate product. Substrates made in this way exhibit a good surface flatness at the time of wafer exposure. When a photomask fabricated from a blank obtained from such a substrate is held on the mask stage of a wafer exposure system with a vacuum chuck, the substrate surface undergoes minimal warping, enabling exposure patterns of small geometry to be written onto wafers to good position and linewidth accuracies.
    Type: Application
    Filed: July 23, 2004
    Publication date: January 27, 2005
    Inventors: Tsuneo Numanami, Masayuki Nakatsu, Masayuki Mogi, Tsuneyuki Hagiwara, Naoto Kondo
  • Publication number: 20030063249
    Abstract: The invention relates to a substrate for use in a liquid crystal display of a CF-on-TFT structure in which a color filter is formed on the side of an array substrate in which a switching element is formed, and has an object to provide a substrate for use in a liquid crystal display, which enables simplification of a manufacturing process typified by a photolithography process and has high reliability. The substrate for use in the liquid crystal display is constructed to include external connection terminals which include first terminal electrodes electrically connected to gate bus lines led out from a plurality of pixel regions arranged on a glass substrate in a matrix form, second terminal electrodes formed of forming material of a pixel electrode and directly on the glass substrate, and electrode coupling regions for electrically connecting the first and the second terminal electrodes, and which electrically connect an external circuit and the gate bus lines.
    Type: Application
    Filed: September 27, 2002
    Publication date: April 3, 2003
    Applicant: FUJITSU DISPLAY TECHNOLOGIES CORPORATION
    Inventors: Atuyuki Hoshino, Shiro Hirota, Naoto Kondo, Tetsuya Fujikawa, Masahiro Kihara, Katsunori Misaki, Seiji Doi, Tomoshige Oda, Akira Komorita, Akihiro Matsui, Manabu Sawasaki, Masahiro Ikeda, Takashi Takagi, Tomonori Tanose, Takuya Saguchi, Hidetoshi Sukenori, Hiroyasu Inoue
  • Publication number: 20030058374
    Abstract: Fine electrode patterns pattern-formed in the shape of fine teeth of a comb bilaterally symmetrical with respect to band-shaped portions are formed at even intervals in a pixel electrode, and band-shaped dielectric layers are pattern-formed at even intervals to cover the fine electrode patterns in a display pixel. By the existence of the dielectric layer and the fine electrode pattern complementing this, a portion formed with these layer and fine electrode pattern is a high threshold voltage region, and relatively, a low threshold voltage region where the dielectric layer does not exist is formed. By the aforementioned construction, it becomes possible to improve a delay in response speed at low gray levels and increase the speed of halftone response, whereby a very reliable image display having moving image performance almost equal to that of a CRT is realized.
    Type: Application
    Filed: September 5, 2002
    Publication date: March 27, 2003
    Applicant: Fujitsu Display Technologies Corporation
    Inventors: Arihiro Takeda, Shingo Kataoka, Kimiaki Nakamura, Hideaki Tsuda, Takahiro Sasaki, Kazuya Ueda, Masahiro Ikeda, Katsunori Misaki, Naoto Kondo, Akira Komorita
  • Publication number: 20030043326
    Abstract: It is an object of the invention to provide a substrate for a liquid crystal display, a liquid crystal display having the same, and a method of manufacturing the same which make it possible to provide a display having high luminance and preferable display characteristics to be used in display sections of information apparatuses and the like. Each pixel is defined by gate bus lines extending in the horizontal direction and drain bus lines extending in the vertical direction. TFTs are formed in the vicinity of intersections between the bus lines, and resin overlap sections for shielding the TFTs from light are formed above the same. No black matrix is formed on a common electrode substrate which is provided in a face-to-face relationship with a TFT substrate, and the bus lines and the resin overlap sections formed on the TFT substrate function as a black matrix.
    Type: Application
    Filed: June 10, 2002
    Publication date: March 6, 2003
    Applicant: FUJITSU LIMITED
    Inventors: Manabu Sawasaki, Yuichi Inoue, Masakazu Shibasaki, Naoto Kondo, Tetsuya Fujikawa, Takashi Takagi, Tomonori Tanose, Tomoshige Oda, Akira Komorita, Katsunori Misaki, Shiro Hirota