Patents by Inventor Naoto Miki

Naoto Miki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9335168
    Abstract: A surveying instrument which comprises a rotation unit 7 adapted to direct a distance measuring optical axis to an object to be measured and the rotary drive unit 5 rotates the rotation unit, comprising a rotary motor for rotating an output shaft 6 and a clutch unit for connecting or disconnecting the rotary motor and the output shaft, wherein the rotary motor and the clutch unit are arranged in a series along the output shaft, and the output shaft is fixed to the rotation unit.
    Type: Grant
    Filed: January 6, 2014
    Date of Patent: May 10, 2016
    Assignee: Kabushiki Kaisha TOPCON
    Inventors: Jun-ichi Kodaira, Naoto Miki
  • Publication number: 20140196293
    Abstract: A surveying instrument which comprises a rotation unit 7 adapted to direct a distance measuring optical axis to an object to be measured and the rotary drive unit 5 rotates the rotation unit, comprising a rotary motor for rotating an output shaft 6 and a clutch unit for connecting or disconnecting the rotary motor and the output shaft, wherein the rotary motor and the clutch unit are arranged in a series along the output shaft, and the output shaft is fixed to the rotation unit.
    Type: Application
    Filed: January 6, 2014
    Publication date: July 17, 2014
    Applicant: Kabushiki Kaisha TOPCON
    Inventors: Jun-ichi Kodaira, Naoto Miki
  • Patent number: 8179522
    Abstract: A distance measuring device measures a distance from a phase difference of beaten down processing signals even when fluctuations occur in a frequency of an oscillator. The distance measuring device includes a laser unit, a dividing device, a reference light receiving unit, and a measuring light receiving unit. The distance measuring device further includes an oscillator, a first mixer, a second mixer, a fourth filter, a fifth filter, a third mixer, a sixth filter, a second filter, a phase difference measuring unit, and a distance measuring unit. The phase difference measuring unit measures a phase difference of the two beat signals extracted by the sixth filter and the second filter. The distance measuring unit measures a distance based on the phase difference measured by the phase difference measuring unit.
    Type: Grant
    Filed: September 1, 2011
    Date of Patent: May 15, 2012
    Assignee: Kabushiki Kaisha Topcon
    Inventors: Isao Minegishi, Masahiro Ohishi, Naoto Miki, Yuichi Yoshimura
  • Publication number: 20120033197
    Abstract: A distance measuring device measures a distance from a phase difference of beaten down processing signals even when fluctuations occur in a frequency of an oscillator. The distance measuring device includes a laser unit, a dividing device, a reference light receiving unit, and a measuring light receiving unit. The distance measuring device further includes an oscillator, a first mixer, a second mixer, a fourth filter, a fifth filter, a third mixer, a sixth filter, a second filter, a phase difference measuring unit, and a distance measuring unit. The phase difference measuring unit measures a phase difference of the two beat signals extracted by the sixth filter and the second filter. The distance measuring unit measures a distance based on the phase difference measured by the phase difference measuring unit.
    Type: Application
    Filed: September 1, 2011
    Publication date: February 9, 2012
    Inventors: Isao Minegishi, Masahiro Ohishi, Naoto Miki, Yuichi Yoshimura
  • Patent number: 7474388
    Abstract: The present invention provides a distance measuring device, which comprises a light projecting unit for projecting a distance measuring light (22) to an object to be measured, a reference reflection unit (55) provided relatively movable and arranged at a known position so as to traverse the projected distance measuring light, a photodetection unit (7) for receiving a reflection light from the object to be measured as a reflected distance measuring light (22?) and a reflection light from said reference reflection unit as an internal reference light (22?), and a control arithmetic unit (15) for calculating a distance to the object to be measured based on a photodetection signal relating to the reflected distance measuring light and based on a photodetection signal relating to the internal reference light.
    Type: Grant
    Filed: May 10, 2006
    Date of Patent: January 6, 2009
    Assignee: Kabushiki Kaisha TOPCON
    Inventors: Fumio Ohtomo, Naoto Miki
  • Patent number: 7330308
    Abstract: An alignment method of micro-alignment members includes a first step for moving a reticle, which is movably disposed between a first position and a second position, to face a first microscope in the first position, and for aligning a center of the reticle with an optical axis of the first microscope while observing the reticle by the first microscope, a second step for moving the reticle to the second position to face a second microscope in the second position, and for aligning the center of the reticle with an optical axis of the second microscope while observing the reticle by the second microscope, a third step for disposing a first micro-alignment member such that a center of the first micro-alignment member aligns with the optical axis of the second microscope, and a fourth step for disposing a second micro-alignment member instead of the reticle to face the first micro-alignment member.
    Type: Grant
    Filed: March 8, 2005
    Date of Patent: February 12, 2008
    Assignee: Kabushiki Kaisha TOPCON
    Inventors: Noriyasu Kiryu, Naoto Miki
  • Publication number: 20070263202
    Abstract: The present invention provides a distance measuring device, which comprises a light projecting unit for projecting a distance measuring light (22) to an object to be measured, a reference reflection unit (55) provided relatively movable and arranged at a known position so as to traverse the projected distance measuring light, a photodetection unit (7) for receiving a reflection light from the object to be measured as a reflected distance measuring light (22?) and a reflection light from said reference reflection unit as an internal reference light (22?), and a control arithmetic unit (15) for calculating a distance to the object to be measured based on a photodetection signal relating to the reflected distance measuring light and based on a photodetection signal relating to the internal reference light.
    Type: Application
    Filed: May 10, 2006
    Publication date: November 15, 2007
    Inventors: Fumio Ohtomo, Naoto Miki
  • Patent number: 7064820
    Abstract: A surface inspection method in a surface inspection system which comprises a photodetection unit and a photodetection polarizing angle changing means, comprising the step of receiving a scattered reflection light from a substrate surface where standard particles are coated by changing a photodetection polarizing angle by the photodetection polarizing angle changing means, and the step of performing surface inspection by setting the photodetection polarizing angle to a condition where an S/N ratio of photodetection output is at the highest.
    Type: Grant
    Filed: March 21, 2003
    Date of Patent: June 20, 2006
    Assignee: Kabushiki Kaisha TOPCON
    Inventors: Hisashi Isozaki, Michihiro Yamazaki, Hiroshi Yoshikawa, Naoto Miki, Hiroyuki Maekawa, Naohiro Takahashi
  • Publication number: 20050200981
    Abstract: An alignment method of micro-alignment members includes a first step for moving a reticle, which is movably disposed between a first position and a second position, to face a first microscope in the first position, and for aligning a center of the reticle with an optical axis of the first microscope while observing the reticle by the first microscope, a second step for moving the reticle to the second position to face a second microscope in the second position, and for aligning the center of the reticle with an optical axis of the second microscope while observing the reticle by the second microscope, a third step for disposing a first micro-alignment member such that a center of the first micro-alignment member aligns with the optical axis of the second microscope, and a fourth step for disposing a second micro-alignment member instead of the reticle to face the first micro-alignment member.
    Type: Application
    Filed: March 8, 2005
    Publication date: September 15, 2005
    Applicant: Kabushiki Kaisha TOPCON
    Inventors: Noriyasu Kiryu, Naoto Miki
  • Publication number: 20030184744
    Abstract: A surface inspection method in a surface inspection system which comprises a photodetection unit and a photodetection polarizing angle changing means, comprising the step of receiving a scattered reflection light from a substrate surface where standard particles are coated by changing a photodetection polarizing angle by the photodetection polarizing angle changing means, and the step of performing surface inspection by setting the photodetection polarizing angle to a condition where an S/N ratio of photodetection output is at the highest.
    Type: Application
    Filed: March 21, 2003
    Publication date: October 2, 2003
    Inventors: Hisashi Isozaki, Michihiro Yamazaki, Hiroshi Yoshikawa, Naoto Miki, Hiroyuki Maekawa, Naohiro Takahashi
  • Patent number: 6104481
    Abstract: A wafer surface inspection apparatus comprises a light source, an optical system for focusing the light beams from the light source onto the wafer surface, a scanning means for scanning the focused point over a predetermined range on the wafer surface, a photo detector including an photoelectric converter for sensing scattered light from the focused point, and a signal detector for detecting signals from the photo detector, in which the light source is a light source for emitting two different wavelengths, the optical system is adapted to focus the light beams of the two wavelengths on one and the same point on the wafer surface, and the photo detector is adapted to sense the two wavelengths separately, and further comprises a discriminating portion for discriminating between a foreign matter or a scratch on the wafer surface and a recess in a spot form existing on the wafer surface by utilizing outputs from the signal detector.
    Type: Grant
    Filed: November 2, 1998
    Date of Patent: August 15, 2000
    Assignee: Kabushiki Kaisha Topcon
    Inventors: Akihiko Sekine, Yoichiro Iwa, Hiroaki Soma, Naoto Miki, Hisashi Isozaki, Hisakazu Yoshino