Patents by Inventor Naoto Noda

Naoto Noda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11973417
    Abstract: A voltage drop Vzs is calculated based on an output current detection value Iac and a virtual synchronous impedance Zs or a corrected virtual synchronous impedance Zs?, and a value obtained by subtracting the voltage drop Vzs from an internal induced voltage Ef is output as a grid voltage command value Vac*. Zs calculation unit 7 limits an output current phase ? so that the output current phase ? is within an effective range by a phase limiter 12a, and calculates the corrected virtual synchronous impedance Zs? based on a limited output current phase ?, the internal induced voltage Ef, a grid voltage detection value Vac and a current limit value Ilim. Accordingly, in grid interconnection power conversion device that controls a virtual synchronous generator, it is possible to continue operation while suppressing an overcurrent and possess a synchronizing power generated by action or working of a virtual synchronous impedance.
    Type: Grant
    Filed: August 6, 2020
    Date of Patent: April 30, 2024
    Assignees: TOKYO ELECTRIC POWER COMPANY HOLDINGS, INCORPORATED, MEIDENSHA CORPORATION
    Inventors: Kenichi Suzuki, Jun Takami, Ryota Samejima, Hideki Noda, Naoto Maeda, Toshiya Inoue, Kazu Shoji
  • Patent number: 11937495
    Abstract: An organic light-emitting device containing both a compound represented by the following general formula (1) and a compound represented by the following general formula (2) has a high light emission efficiency. The rings a to c each are a benzene ring that can be optionally condensed, R1 and R2 each represent a substituted or unsubstituted aryl group, etc., four of R31 to R35 each are a substituted or unsubstituted carbazol-9-yl group, but all of these four are not the same, and the remaining one is a hydrogen atom, a cyano group, etc.
    Type: Grant
    Filed: August 7, 2019
    Date of Patent: March 19, 2024
    Assignees: KYUSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATION, KWANSEI GAKUIN EDUCATIONAL FOUNDATION, KYULUX, INC.
    Inventors: Hajime Nakanotani, Takuji Hatakeyama, Yasuhiro Kondo, Yasuyuki Sasada, Motoki Yanai, Chin-Yiu Chan, Masaki Tanaka, Hiroki Noda, Chihaya Adachi, Yoshitake Suzuki, Naoto Notsuka
  • Patent number: 11897807
    Abstract: A porous glass base material manufacturing apparatus for an optical fiber includes: a liquid mass flow controller for controlling a flow rate of raw material liquid of an organic siloxane; a vaporizer for mixing raw material liquid and carrier gas to vaporize raw material liquid to form mixed gas; a raw material liquid nozzle for ejecting raw material liquid into the vaporizer; a carrier gas supply pipe for supplying carrier gas into the vaporizer; a raw material liquid pipe for introducing raw material liquid into the nozzle; a burner for combusting mixed gas with combustible gas and combustion supporting gas to produce SiO2 particles; a mixed gas pipe for supplying mixed gas to the burner; an open/close valve on a flow path of the raw material liquid pipe; and a purge gas supply pipe that joins the raw material liquid pipe between the valve and the raw material liquid nozzle.
    Type: Grant
    Filed: July 25, 2022
    Date of Patent: February 13, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Naoto Noda, Hitoshi Iinuma
  • Patent number: 11795098
    Abstract: A manufacturing method of a porous glass base material for optical fiber includes: supplying an organic siloxane raw material supplied from a raw material tank is fed to a vaporizer; mixing and vaporizing the raw material and carrier gas in the vaporizer; and externally depositing SiO2 fine particles through combustion reaction by supplying the mixed gas of raw the material and the carrier gas to the burner in the manufacturing apparatus of porous glass base material for optical fiber. Before starting to supply the raw material to a raw material gas supply pipe of the burner, the burner and the inside of a manufacturing apparatus of porous glass base material for optical fiber are pre-heated by flowing purge gas of 60° C. or higher into the raw material gas supply pipe and supplying combustible gas and combustion supporting gas to the burner.
    Type: Grant
    Filed: March 2, 2021
    Date of Patent: October 24, 2023
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Naoto Noda
  • Publication number: 20230227345
    Abstract: A method and an apparatus for producing a porous glass preform by using organosiloxane raw material is provided. The apparatus for producing the porous glass preform 12 according to the present embodiment is configured to mix organosiloxane in a liquid state being a raw material with a carrier gas in a vaporizer 6, heat this mixture to be vaporized, supply this vapor to a burner 13 as a gas raw material, and produce a porous glass preform by depositing a glass fine particle produced by combusting the gas raw material on a starting material, herein the apparatus for producing a porous glass preform includes a moisture removing apparatus 8 configured to remove moisture in the carrier gas and supply the vaporizer with the carrier gas.
    Type: Application
    Filed: March 27, 2023
    Publication date: July 20, 2023
    Inventor: Naoto NODA
  • Patent number: 11667557
    Abstract: A method and an apparatus for producing a porous glass preform by using organosiloxane raw material is provided. The apparatus for producing the porous glass preform 12 according to the present embodiment is configured to mix organosiloxane in a liquid state being a raw material with a carrier gas in a vaporizer 6, heat this mixture to be vaporized, supply this vapor to a burner 13 as a gas raw material, and produce a porous glass preform by depositing a glass fine particle produced by combusting the gas raw material on a starting material, herein the apparatus for producing a porous glass preform includes a moisture removing apparatus 8 configured to remove moisture in the carrier gas and supply the vaporizer with the carrier gas.
    Type: Grant
    Filed: December 13, 2021
    Date of Patent: June 6, 2023
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Naoto Noda
  • Publication number: 20230167004
    Abstract: The porous glass base material manufacturing apparatus releases gas of organic siloxane raw materials into the flame of a group of burners that moves relative to a starting base material along the longitudinal direction of the starting base material rotating around a rotation axis along the longitudinal direction to form soot of porous glass particles on the surface of the starting base material. The porous glass base material manufacturing apparatus is equipped with a vaporizer that vaporizes liquid raw materials containing organic siloxane in a liquid state supplied from a raw material tank to make a raw material mixed gas mixed with raw material gas and carrier gas and a raw material gas pipe that supplies the raw material mixed gas to the burner. The raw material gas pipe is insulated and kept warm by double insulation.
    Type: Application
    Filed: April 7, 2021
    Publication date: June 1, 2023
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventor: Naoto NODA
  • Publication number: 20220363582
    Abstract: A porous glass base material manufacturing apparatus for an optical fiber includes: a liquid mass flow controller for controlling a flow rate of raw material liquid of an organic siloxane; a vaporizer for mixing raw material liquid and carrier gas to vaporize raw material liquid to form mixed gas; a raw material liquid nozzle for ejecting raw material liquid into the vaporizer; a carrier gas supply pipe for supplying carrier gas into the vaporizer; a raw material liquid pipe for introducing raw material liquid into the nozzle; a burner for combusting mixed gas with combustible gas and combustion supporting gas to produce SiO2 particles; a mixed gas pipe for supplying mixed gas to the burner; an open/close valve on a flow path of the raw material liquid pipe; and a purge gas supply pipe that joins the raw material liquid pipe between the valve and the raw material liquid nozzle.
    Type: Application
    Filed: July 25, 2022
    Publication date: November 17, 2022
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Naoto NODA, Hitoshi IINUMA
  • Publication number: 20220363583
    Abstract: A manufacturing method of a porous glass base material for optical fiber includes: controlling a flow rate of a raw material liquid of an organic siloxane by a liquid mass flow controller; introducing raw material liquid to a raw material liquid nozzle of a vaporizer by a raw material liquid pipe; ejecting raw material liquid into the vaporizer; mixing raw material liquid and carrier gas to vaporize raw material liquid to form mixed gas; supplying mixed gas to a burner; combusting mixed gas together with a combustible gas and a combustion supporting gas in the burner to produce SiO2 particles; depositing SiO2 particles on a starting core base material to form the porous glass base material; and closing an open/close valve on a flow path of the raw material liquid pipe to stop supply of raw material liquid, while continuing to supply carrier gas, combustible gas, and combustion supporting gas.
    Type: Application
    Filed: July 25, 2022
    Publication date: November 17, 2022
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Naoto NODA, Hitoshi IINUMA
  • Patent number: 11482414
    Abstract: Disclosed is a method for forming Si-containing films, such as SiN film, by PEALD using trisilylamine (TSA) at ultralow temperature, such as a temperature below 250° C.
    Type: Grant
    Filed: December 18, 2019
    Date of Patent: October 25, 2022
    Assignee: L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude
    Inventors: Naoto Noda, Ivan Oshchepkov, Jean-Marc Girard
  • Patent number: 11427495
    Abstract: A manufacturing apparatus of a porous glass base material for optical fiber includes: a liquid mass flow controller for controlling a flow rate of a raw material liquid of an organic siloxane; a vaporizer for mixing the raw material liquid and a carrier gas to vaporize the raw material liquid to form a mixed gas in which a raw material gas and the carrier gas are mixed; a raw material liquid nozzle for ejecting the raw material liquid into the vaporizer; a carrier gas supply pipe for supplying the carrier gas into the vaporizer; a raw material liquid pipe for introducing the raw material liquid into the raw material liquid nozzle; a burner for combusting the mixed gas together with a combustible gas and a combustion supporting gas to produce SiO2 fine particles; a mixed gas pipe; an open/close valve; and a purge gas supply pipe.
    Type: Grant
    Filed: June 9, 2020
    Date of Patent: August 30, 2022
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Naoto Noda, Hitoshi Iinuma
  • Publication number: 20220185719
    Abstract: A method and an apparatus for producing a porous glass preform by using organosiloxane raw material is provided. The apparatus for producing the porous glass preform 12 according to the present embodiment is configured to mix organosiloxane in a liquid state being a raw material with a carrier gas in a vaporizer 6, heat this mixture to be vaporized, supply this vapor to a burner 13 as a gas raw material, and produce a porous glass preform by depositing a glass fine particle produced by combusting the gas raw material on a starting material, herein the apparatus for producing a porous glass preform includes a moisture removing apparatus 8 configured to remove moisture in the carrier gas and supply the vaporizer with the carrier gas.
    Type: Application
    Filed: December 13, 2021
    Publication date: June 16, 2022
    Inventor: Naoto NODA
  • Publication number: 20220135461
    Abstract: When organic siloxane in a liquid state is used as a raw material for glass particles, the formation of polymerized substances is suppressed when the raw material is vaporized in a vaporizer. In the manufacturing method of porous glass base material according to the present invention, the liquid organic siloxane, which is the raw material, is mixed with a carrier gas in the vaporizer, vaporized by the heat generated from the inner wall of the vaporizer heated by a heater unit, and supplied to the burner as a gas raw material. The porous glass base material is manufactured by depositing the glass particles generated by the combustion of the gas raw material on the starting material. The heating output of the heater unit is controlled so that the maximum temperature of the inner wall of the vaporizer is 230° C. or lower.
    Type: Application
    Filed: October 26, 2021
    Publication date: May 5, 2022
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventor: Naoto NODA
  • Publication number: 20210395131
    Abstract: A manufacturing method of a porous glass preform for optical fiber by depositing glass microparticles on a starting member, including supplying a vaporizer with organic silicon compound raw material in a liquid state and a carrier gas; in the vaporizer, mixing and vaporizing the organic silicon compound raw material in a liquid state and the carrier gas to convert the organic silicon compound raw material and the carrier gas into a raw material mixed gas; supplying a burner with the raw material mixed gas and a combustible gas, combusting the raw material mixed gas and the combustible gas in the burner, and ejecting SiO2 microparticles generated by the combustion from the burner; and depositing the SiO2 microparticles ejected from the burner on the starting member by repeatedly moving a single body, in which the vaporizer and the burner are synchronized, parallel to the starting member in a longitudinal direction thereof.
    Type: Application
    Filed: September 1, 2021
    Publication date: December 23, 2021
    Inventors: Naoto NODA, Hitoshi IINUMA, Dai INOUE
  • Patent number: 11155488
    Abstract: A manufacturing method of a porous glass preform for optical fiber by depositing glass microparticles on a starting member, including supplying a vaporizer with organic silicon compound raw material in a liquid state and a carrier gas; in the vaporizer, mixing and vaporizing the organic silicon compound raw material in a liquid state and the carrier gas to convert the organic silicon compound raw material and the carrier gas into a raw material mixed gas; supplying a burner with the raw material mixed gas and a combustible gas, combusting the raw material mixed gas and the combustible gas in the burner, and ejecting SiO2 microparticles generated by the combustion from the burner; and depositing the SiO2 microparticles ejected from the burner on the starting member by repeatedly moving the vaporizer and the burner together, in a synchronized manner, parallel to the starting member in a longitudinal direction thereof.
    Type: Grant
    Filed: April 1, 2019
    Date of Patent: October 26, 2021
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Naoto Noda, Hitoshi Iinuma, Dai Inoue
  • Publication number: 20210292222
    Abstract: A flow rate fluctuation of the liquid raw material of the organic siloxane supplied to the vaporizer is suppressed and a deposition density of the silica fine particles is uniformizes. The method of manufacturing the porous glass base material according to the present invention, a liquid organic siloxane raw material stored in a raw material tank of internal pressure P1 is controlled by a mass flow controller at a predetermined flow rate and pumped through pipe of internal pressure P2 to a vaporizer, the liquid raw material is vaporized in the vaporizer and supplied as a gas raw material to a burner, and the silica fine particles formed by burning the gas raw material in the burner are deposited to form a porous glass base material. The present invention is characterized by the method of manufacture described above, wherein P1?P2 is satisfied.
    Type: Application
    Filed: August 2, 2019
    Publication date: September 23, 2021
    Inventors: Naoto NODA, Dai INOUE, Hitoshi IINUMA, Hiromasa MIZUKAMI
  • Publication number: 20210284567
    Abstract: A manufacturing method of a porous glass base material for optical fiber includes: supplying an organic siloxane raw material supplied from a raw material tank is fed to a vaporizer; mixing and vaporizing the raw material and carrier gas in the vaporizer; and externally depositing SiO2 fine particles through combustion reaction by supplying the mixed gas of raw the material and the carrier gas to the burner in the manufacturing apparatus of porous glass base material for optical fiber. Before starting to supply the raw material to a raw material gas supply pipe of the burner, the burner and the inside of a manufacturing apparatus of porous glass base material for optical fiber are pre-heated by flowing purge gas of 60° C. or higher into the raw material gas supply pipe and supplying combustible gas and combustion supporting gas to the burner.
    Type: Application
    Filed: March 2, 2021
    Publication date: September 16, 2021
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventor: Naoto NODA
  • Publication number: 20200392033
    Abstract: A manufacturing apparatus of a porous glass base material for optical fiber includes: a liquid mass flow controller for controlling a flow rate of a raw material liquid of an organic siloxane; a vaporizer for mixing the raw material liquid and a carrier gas to vaporize the raw material liquid to form a mixed gas in which a raw material gas and the carrier gas are mixed; a raw material liquid nozzle for ejecting the raw material liquid into the vaporizer; a carrier gas supply pipe for supplying the carrier gas into the vaporizer; a raw material liquid pipe for introducing the raw material liquid into the raw material liquid nozzle; a burner for combusting the mixed gas together with a combustible gas and a combustion supporting gas to produce SiO2 fine particles; a mixed gas pipe; an open/close valve; and a purge gas supply pipe.
    Type: Application
    Filed: June 9, 2020
    Publication date: December 17, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Naoto NODA, Hitoshi IINUMA
  • Publication number: 20200373148
    Abstract: Disclosed is a method for forming Si-containing films, such as SiN film, by PEALD using trisilylamine (TSA) at ultralow temperature, such as a temperature below 250° C.
    Type: Application
    Filed: December 18, 2019
    Publication date: November 26, 2020
    Inventors: Naoto NODA, Ivan OSHCHEPKOV, Jean-Marc GIRARD
  • Publication number: 20190376187
    Abstract: To provide a deposition process whereby a seamless Si-containing film having a small number of voids can be formed on a substrate having a fine trench at a lower temperature. A method for forming an Si-containing film forms an Si-containing film on a substrate by a chemical vapor deposition process, wherein the chemical vapor deposition process includes a step (a) that reacts a first feed gas having one or more Si—Si bonds in a chemical vapor deposition chamber in the presence of a Lewis base catalyst.
    Type: Application
    Filed: February 13, 2018
    Publication date: December 12, 2019
    Inventors: Naoto NODA, Jean-Marc GIRARD, Ivan OSCHCHEPKOV, Guillaume DURIEUX