Patents by Inventor Naoya Fukumoto

Naoya Fukumoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220169941
    Abstract: This fluorine-containing ether compound is a fluorine-containing ether compound represented by formula (1). R1—X—R2—CH2—R3—CH2—R4??(1) (In formula (1), R1 is an alkenyloxy group of 2 to 8 carbon atoms or an alkynyloxy group of 3 to 8 carbon atoms. R2 is represented by formula (2) shown below. In formula (2), a represents an integer of 1 to 3. X is represented by formula (3) shown below. In formula (3), b represents an integer of 1 to 5, Y is a divalent linking group that is bonded to a carbon atom in formula (2), and R represents an alkyl group of 1 to 6 carbon atoms or H. R3 represents a perfluoropolyether chain. R4 represents a terminal group containing two or three polar groups, wherein each polar group is bonded to a different carbon atom, and the carbon atoms to which the polar groups are bonded are bonded to each other via a linking group containing a carbon atom to which a polar group is not bonded.
    Type: Application
    Filed: March 12, 2020
    Publication date: June 2, 2022
    Applicant: SHOWA DENKO K.K.
    Inventors: Natsumi SHIBATA, Tsuyoshi KATO, Daisuke YAGYU, Shunya SUZUKI, Masaki NANKO, Naoya FUKUMOTO
  • Patent number: 11332686
    Abstract: A fluorine-containing ether compound represented by formula (1) shown below. R4—CH2—R3—CH2—R2—CH2—R1—CH2—R2—CH2—R3—CH2—R4??(1) (In formula (1), R1 and R3 represent different perfluoropolyether chains, R2 represents a linking group containing one or more polar groups, and R4 represents a terminal group containing two or more polar groups.
    Type: Grant
    Filed: November 24, 2017
    Date of Patent: May 17, 2022
    Assignee: SHOWA DENKO K.K.
    Inventors: Naoya Fukumoto, Yuta Yamaguchi, Naoko Ito, Katsumi Murofushi
  • Patent number: 11292979
    Abstract: A fluorine-containing ether compound represented by a formula (1) shown below. R4—CH2—R3—CH2—R2—CH2—R1—CH2—R2—CH2—R3—CH2—R5??(1) In formula (1), R1 and R3 represent the same or different perfluoropolyether chains, R2 represents a linking group containing at least one polar group, one or both of R4 and R5 represent a terminal group containing two or more polar groups, and R4 and R5 are different.
    Type: Grant
    Filed: February 20, 2017
    Date of Patent: April 5, 2022
    Assignee: SHOWA DENKO K.K.
    Inventors: Yuta Yamaguchi, Naoya Fukumoto, Naoko Ito, Hiroyuki Tomita, Ichiro Ota, Katsumi Murofushi
  • Patent number: 11279664
    Abstract: The present invention relates to a fluorine-containing ether compound represented by Formula (1), R1—R2—CH2—R3—CH2—R4??(1). (In Formula (1), R1 is an end group including an organic group having at least one double bond or triple bond, R2 is a divalent linking group bonded to R1 by etheric oxygen, R3 is a perfluoropolyether chain, R4 is an end group having two or three polar groups with each polar group being bonded to different carbon atoms, and the carbon atoms, to which the polar groups are bonded, being bonded to each other via a linking group including carbon atoms to which the polar groups are not bonded.
    Type: Grant
    Filed: January 30, 2017
    Date of Patent: March 22, 2022
    Assignee: SHOWA DENKO K.K.
    Inventors: Daisuke Yagyu, Yuta Yamaguchi, Naoya Fukumoto, Tsuyoshi Kato, Shoko Uetake, Hiroyuki Tomita, Ryuuta Miyasaka, Naoko Ito, Ichiro Ota, Katsumi Murofushi
  • Patent number: 11261394
    Abstract: A fluorine-containing ether compound represented by R1—R2—CH2—R3—CH2—R4—R5 is provided.
    Type: Grant
    Filed: August 23, 2018
    Date of Patent: March 1, 2022
    Assignee: SHOWA DENKO K.K.
    Inventors: Tsuyoshi Kato, Daisuke Yagyu, Naoya Fukumoto, Masaki Nanko, Masumi Kuritani, Katsumi Murofushi
  • Publication number: 20220049176
    Abstract: The fluorine-containing ether compound is represented by the following formula (1): R1—R2—CH2—R3—CH2—R4. In the formula (1), R1 is represented by the following formula (2), R2 is represented by the following formula (3), R3 is a perfluoropolyether chain, and R4 is an organic end group different from R1—R2— and contains two or three polar groups, wherein each polar group is bonded to a different carbon atom, and the carbon atoms to which the polar groups are bonded are bonded to one another via a linking group containing a carbon atom to which the polar group is not bonded. In the formula (2), R5 is an alkoxy group selected from the group consisting of a methoxy, an ethoxy and a propoxy group. In the formula (3), w is 2 or 3.
    Type: Application
    Filed: August 28, 2019
    Publication date: February 17, 2022
    Applicant: SHOWA DENKO K.K.
    Inventors: Daisuke YAGYU, Naoya FUKUMOTO, Tsuyoshi KATO, Katsumi MUROFUSHI
  • Publication number: 20220048882
    Abstract: The fluorine-containing ether compound is represented by the following formula (1): R1-R2—CH2—R3—CH2—R4. In the formula (1), R1 is represented by the following formula (2), R2 is represented by the following formula (3), R3 is a perfluoropolyether chain, and R4 is an organic end group different from R1-R2- and contains two or three polar groups, wherein each polar group is bonded to a different carbon atom, and the carbon atoms to which the polar groups are bonded are bonded to one another via a linking group containing a carbon atom to which the polar group is not bonded. In the formula (2), r is 1 to 3. In the formula (3), w is 2 or 3.
    Type: Application
    Filed: August 28, 2019
    Publication date: February 17, 2022
    Applicant: SHOWA DENKO K.K.
    Inventors: Daisuke YAGYU, Naoya FUKUMOTO, Tsuyoshi KATO, Katsumi MUROFUSHI
  • Publication number: 20220050125
    Abstract: This probe production method is a method of producing a probe (101) having a coating layer (104) on a surface thereof, in which the coating layer (104) is formed on a surface of a base material (103) having a sharp tip end portion (103a) using a gas phase method.
    Type: Application
    Filed: March 3, 2020
    Publication date: February 17, 2022
    Applicant: SHOWA DENKO K.K.
    Inventors: Tsuyoshi KATO, Hiroyuki TOMITA, Takuya MINAMI, Shohei NISHIZAWA, Yoshitomo SHIMAZU, Gohei KUROKAWA, Katsumi MUROFUSHI, Naoya FUKUMOTO
  • Patent number: 11225624
    Abstract: A fluorine-containing ether compound represented by Formula (1) is provided, R1—R2—CH2—R3—CH2—R4??(1) (In Formula (1), R1 is an alkyl group that may have a substituent, R2 is a divalent linking group bonded to R1 via an ethereal oxygen, R3 is a perfluoropolyether chain, and R4 is an end group which is different from R1-R2 and includes two or three polar groups, in which each of the polar groups is bonded to a different carbon atom, and the carbon atoms bonded to the polar groups are bonded to each other via a linking group containing a carbon atom not bonded to the polar groups.).
    Type: Grant
    Filed: August 7, 2018
    Date of Patent: January 18, 2022
    Assignee: SHOWA DENKO K.K.
    Inventors: Tsuyoshi Kato, Daisuke Yagyu, Naoya Fukumoto, Yuta Yamaguchi
  • Patent number: 11220649
    Abstract: A fluorine-containing ether compound represented by Formula (1) is provided; R1—R2—CH2—R3—CH2—R4—R5??(1) (In Formula (1), R1 and R5 may be the same as or different from each other and each represents an alkenyl group having 2 to 8 carbon atoms or an alkynyl group having 3 to 8 carbon atoms, R2 and R4 may be the same as or different from each other and each represents a divalent linking group having a polar group, and R3 represents a perfluoropolyether chain, with a proviso that R1 and R2 are, and R4 and R5 are divided due to the presence of an atom other than the carbon atom such as an oxygen atom).
    Type: Grant
    Filed: December 4, 2017
    Date of Patent: January 11, 2022
    Assignee: SHOWA DENKO K.K.
    Inventors: Naoya Fukumoto, Daisuke Yagyu, Yuta Yamaguchi, Shoko Uetake, Tsuyoshi Kato, Hiroyuki Tomita, Ryuuta Miyasaka, Katsumi Murofushi
  • Patent number: 11180457
    Abstract: Provided is a fluorine-containing ether compound capable of forming a lubricant layer having excellent wear resistance even when the thickness is thin, and suitable as a material of a lubricant for a magnetic recording medium. The fluorine-containing ether compound is a compound represented by the following formula (1): R1—R2—CH2—R3—CH2—R4—R5; wherein R3 is a perfluoropolyether chain; R1 is a terminal group bonded to R2; R5 is a terminal group bonded to R4; R1 is an alkenyl group or an alkynyl group; R5 is a group containing a heterocyclic ring; R2 is represented by the following formula (2); R4 is represented by the following formula (3); and a in the formula (2) and b in the formula (3) are each independently an integer of 1 to 3.
    Type: Grant
    Filed: August 28, 2018
    Date of Patent: November 23, 2021
    Assignee: SHOWA DENKO K. K.
    Inventors: Tsuyoshi Kato, Daisuke Yagyu, Naoya Fukumoto, Yuta Yamaguchi, Masumi Kuritani, Katsumi Murofushi, Masaki Nanko, Hiroyuki Tomita
  • Publication number: 20210340457
    Abstract: A fluorine-containing ether compound represented by formula (1) shown below. R4—CH2—R3—CH2—R2—CH2—R1—CH2—R2—CH2—R3—CH2—R4??(1) (In formula (1), R1 and R3 represent different perfluoropolyether chains, R2 represents a linking group containing one or more polar groups, and R4 represents a terminal group containing two or more polar groups.
    Type: Application
    Filed: November 24, 2017
    Publication date: November 4, 2021
    Applicant: SHOWA DENKO K.K.
    Inventors: Naoya FUKUMOTO, Yuta YAMAGUCHI, Naoko ITO, Katsumi MUROFUSHI
  • Publication number: 20210188766
    Abstract: Provided is a fluorine-containing ether compound that can be suitably used as a material for a lubricant for a magnetic recording medium, capable of forming a lubricant layer having excellent chemical substance resistance and wear resistance even when the thickness is small. A fluorine-containing ether compound represented by the following formula (1): R1—R2—CH2—R3—CH2—R4—R5??(1) In the formula (1), R3 is a perfluoropolyether chain. R2 and R4 are divalent linkage groups having a polar group, and may be the same or different. R1 and R5 are terminal groups bonded to R2 or R4, which may be the same or different, and at least one of R1 and R5 is an organic group having 1 to 8 carbon atoms wherein one or more hydrogen atoms of the organic group is substituted with a cyano group.
    Type: Application
    Filed: July 30, 2018
    Publication date: June 24, 2021
    Applicant: SHOWA DENKO K.K.
    Inventors: Masaki NANKO, Naoya FUKUMOTO, Daisuke YAGYU, Yuta YAMAGUCHI, Tsuyoshi KATO, Hiroyuki TOMITA, Katsumi MUROFUSHI, Shohei NISHIZAWA
  • Patent number: 11011200
    Abstract: This fluorine-containing ether compound is represented by Formula (1). R1—R2—CH2—R3—CH2—R4—R5??(1) (in Formula (1), R1 is an aryl group or an aralkyl group, R2 is a divalent linking group having 0 or 1 polar group, R3 is a perfluoropolyether chain, R4 is a divalent linking group having 2 or 3 polar groups, and R5 is an aryl group or an aralkyl group.
    Type: Grant
    Filed: July 3, 2017
    Date of Patent: May 18, 2021
    Assignee: SHOWA DENKO K.K.
    Inventors: Shoko Uetake, Naoya Fukumoto, Daisuke Yagyu, Yuta Yamaguchi, Naoko Ito, Hiroyuki Tomita, Ryuta Miyasaka, Katsumi Murofushi
  • Publication number: 20210062101
    Abstract: A fluorine-containing ether compound represented by Formula (1) is provided, R1-R2—CH2—R3—CH2—R4??(1) (In Formula (1), R1 is an alkyl group that may have a substituent, R2 is a divalent linking group bonded to R1 via an ethereal oxygen, R3 is a perfluoropolyether chain, and R4 is an end group which is different from R1-R2 and includes two or three polar groups, in which each of the polar groups is bonded to a different carbon atom, and the carbon atoms bonded to the polar groups are bonded to each other via a linking group containing a carbon atom not bonded to the polar groups.).
    Type: Application
    Filed: August 7, 2018
    Publication date: March 4, 2021
    Applicant: SHOWA DENKO K.K.
    Inventors: Tsuyoshi KATO, Daisuke YAGYU, Naoya FUKUMOTO, Yuta YAMAGUCHI
  • Publication number: 20210062102
    Abstract: A fluorine-containing ether compound represented by R1—R2—CH2—R3—CH2—R4—R5 is provided.
    Type: Application
    Filed: August 23, 2018
    Publication date: March 4, 2021
    Applicant: SHOWA DENKO K.K.
    Inventors: Tsuyoshi KATO, Daisuke YAGYU, Naoya FUKUMOTO, Masaki NANKO, Masumi KURITANI, Katsumi MUROFUSHI
  • Patent number: 10803898
    Abstract: A fluorine-containing ether compound of the present invention is represented by Formula (1). R1—CH2—R2—CH2—R3??(1) (In Formula (1), R1 is an organic end group having 3 or more carbon atoms which includes two or more polar groups with each polar group being bonded to different carbon atoms and the carbon atoms to which the polar groups are bonded being bonded to each other via a linking group including the carbon atoms which are not bonded to the polar groups, R2 includes a perfluoropolyether chain represented by Formula (3), and R3 is a hydroxyl group or R1) —(CF2)y?1—O—((CF2)yO)z—(CF2)y?1—??(3) (In Formula (3), y represents an integer of 2 to 4, and z represents an integer of 1 to 30).
    Type: Grant
    Filed: July 31, 2017
    Date of Patent: October 13, 2020
    Assignee: SHOWA DENKO K.K.
    Inventors: Naoya Fukumoto, Daisuke Yagyu, Yuta Yamaguchi, Shoko Uetake, Tsuyoshi Kato, Hiroyuki Tomita, Ryuta Miyasaka, Katsumi Murofushi
  • Publication number: 20200283392
    Abstract: Provided is a fluorine-containing ether compound capable of forming a lubricant layer having excellent wear resistance even when the thickness is thin, and suitable as a material of a lubricant for a magnetic recording medium. The fluorine-containing ether compound is a compound represented by the following formula (1): R1—R2—CH2—R3—CH2—R4—R5; wherein R3 is a perfluoropolyether chain; R1 is a terminal group bonded to R2; R5 is a terminal group bonded to R4; R1 is an alkenyl group or an alkynyl group; R5 is a group containing a heterocyclic ring; R2 is represented by the following formula (2); R4 is represented by the following formula (3); and a in the formula (2) and b in the formula (3) are each independently an integer of 1 to 3.
    Type: Application
    Filed: August 28, 2018
    Publication date: September 10, 2020
    Applicant: SHOWA DENKO K.K.
    Inventors: Tsuyoshi KATO, Daisuke YAGYU, Naoya FUKUMOTO, Yuta YAMAGUCHI, Masumi KURITANI, Katsumi MUROFUSHI, Masaki NANko, Hiroyuki TOMITA
  • Publication number: 20200263104
    Abstract: A fluorine-containing ether compound represented by a formula (1) shown below. R4—CH2—R3—CH2—R2—CH2—R1—CH2—R2—CH2—R3—CH2—R5??(1) In formula (1), R1 and R3 represent the same or different perfluoropolyether chains, R2 represents a linking group containing at least one polar group, one or both of R4 and R5 represent a terminal group containing two or more polar groups, and R4 and R5 are different.
    Type: Application
    Filed: February 20, 2017
    Publication date: August 20, 2020
    Inventors: Yuta YAMAGUCHI, Naoya FUKUMOTO, Naoko ITO, Hiroyuki TOMITA, Ichiro OTA, Katsumi MUROFUSHI
  • Publication number: 20200010619
    Abstract: A fluorine-containing ether compound of the present invention is represented by the following General Formula (1). (In the General Formula (1), X is a trivalent atom or a trivalent atom group, A is a linking group including at least one polar group, B is a linking group having a perfluoropolyether chain, and D is a polar group or a substituent having a polar group at the end.) [Chem.
    Type: Application
    Filed: February 6, 2018
    Publication date: January 9, 2020
    Applicant: SHOWA DENKO K.K.
    Inventors: Takuya MINAMI, Yoshishige OKUNO, Yuta YAMAGUCHI, Ryuuta MIYASAKA, Naoya FUKUMOTO, Hiroko HATTORI, Hiroyuki TOMITA, Michio SERI, Naoko ITO, Ichiro OTA, Katsumi MUROFUSHI