Abstract: A machine tool includes a table, a tool support, a mover, a first wall, a first cover, and a first support. The table is configured to support a workpiece and configured to move in a first direction and a second direction opposite to the first direction. The tool support is configured to support a tool with which the workpiece is machined. The mover is configured to move the table in the first direction and the second direction. The first wall has a first opening and is provided on a side of the first direction with respect to the tool support. The first cover protrudes from the first wall in the first direction through the first opening. The first support supports the first cover such that the first cover is rotatable around an axis of the first support.

Abstract: A rolling bearing, a rolling device, and a method of manufacturing the rolling device are provided, by which a long life can readily be implemented by suppressing surface damage even on the use condition that the oil film formation performance of a rolling part is poor. A rolling device includes: a first rolling component made of SUJ2; and a second rolling component made of SUJ2 and configured to contact the first rolling component. A surface of a rolling part of the first rolling component is greater in arithmetic mean roughness than a surface of a rolling part of the second rolling component. The arithmetic mean roughness of the surface of the rolling part of the second rolling component is 0.07 ?m or more and 0.20 ?m or less.

Abstract: A rolling bearing, a rolling device, and a method of manufacturing the rolling device are provided, by which a long life can readily be implemented by suppressing surface damage even on the use condition that the oil film formation performance of a rolling part is poor. A rolling device includes: a first rolling component made of SUJ2; and a second rolling component made of SUJ2 and configured to contact the first rolling component. A surface of a rolling part of the first rolling component is greater in arithmetic mean roughness than a surface of a rolling part of the second rolling component. The arithmetic mean roughness of the surface of the rolling part of the second rolling component is 0.07 ?m or more and 0.20 ?m or less.

Abstract: A rolling bearing includes an inner ring, an outer ring, and rolling elements interposed between the inner ring and the outer ring. A surface layer portion, beneath a raceway surface (10a), of a base material of a raceway ring (10) which is the inner ring or the outer ring, is a wear-resistant layer (13) which has a higher hardness than a residual portion (12), beneath the surface layer portion, of the base material, and includes a minute-recess-and-projection surface. An oxide film (14) is provided which has such a film thickness (t) as to fill recesses of the minute-recess-and-projection surface of the wear-resistant layer (13), and includes recesses and projections existing along the minute-recess-and-projection surface, and the oxide film (14) coats the surface of the wear-resistant layer (13). The oxide film (14) is made from a material more fragile than the wear-resistant layer (13) of the base material.

Abstract: A rolling bearing includes an inner ring, an outer ring, and rolling elements interposed between the inner ring and the outer ring. A surface layer portion, beneath a raceway surface (10a), of a base material of a raceway ring (10) which is the inner ring or the outer ring, is a wear-resistant layer (13) which has a higher hardness than a residual portion (12), beneath the surface layer portion, of the base material, and includes a minute-recess-and-projection surface. An oxide film (14) is provided which has such a film thickness (t) as to fill recesses of the minute-recess-and-projection surface of the wear-resistant layer (13), and includes recesses and projections existing along the minute-recess-and-projection surface, and the oxide film (14) coats the surface of the wear-resistant layer (13). The oxide film (14) is made from a material more fragile than the wear-resistant layer (13) of the base material.

Abstract: A tunneling magnetic sensing element includes a laminate in which a pinned magnetic layer having a magnetization direction pinned, an insulating barrier layer, and a free magnetic layer having a magnetization direction variable with an external magnetic field are laminated in order from below. The insulating barrier layer is made of Mg—O. The free magnetic layer has a soft magnetic layer and an enhanced layer disposed between the soft magnetic layer and the insulating barrier layer to have a spin polarization ratio higher than the soft magnetic layer. An insertion magnetic layer made of one selected from Co—Fe—B, Co—B, Fe—B, and Co—Fe is inserted into the soft magnetic layer in a direction parallel to the interface of each layer constituting the laminate, and the soft magnetic layer is divided into multiple layers in a thickness direction through the insertion magnetic layer.

Abstract: A tunneling magnetic sensing element includes: a pinned magnetic layer whose direction of magnetization is pinned in one direction; an insulating barrier layer; and a free magnetic layer whose direction of magnetization changes in response to an external magnetic field. The pinned magnetic layer, the insulating barrier layer and the free magnetic layer are deposited in the named order. A first protective layer composed of a platinum-group element is disposed on the free magnetic layer, and a second protective layer composed of Ti is disposed on the first protective layer.

Abstract: A tunneling magnetic sensing element includes a laminate in which an underlayer, a seed layer, an antiferromagnetic layer, a pinned magnetic layer, an insulating barrier layer, and a free magnetic layer are laminated in order from below. The insulating barrier layer is made of Mg—O. The underlayer is made of Ti, and the seed layer is made of one selected from a group consisting of Ni—Fe—Cr and Ru.

Abstract: A tunnel magnetoresistive element includes a laminate including a pinned magnetic layer, an insulating barrier layer, and a free magnetic layer. The insulating barrier layer is composed of Ti—Mg—O or Ti—O. The free magnetic layer includes an enhancement sublayer, a first soft magnetic sublayer, a nonmagnetic metal sublayer, and a second soft magnetic sublayer. For example, the enhancement sublayer is composed of Co—Fe, the first soft magnetic sublayer and the second soft magnetic sublayer are composed of Ni—Fe, and the nonmagnetic metal sublayer is composed of Ta. The total thickness of the average thickness of the enhancement sublayer and the average thickness of the first soft magnetic sublayer is in the range of 25 to 80 angstroms. Accordingly, the tunneling magnetoresistive element can consistently have a higher rate of resistance change than before.

Abstract: A free magnetic layer has a laminated structure in which a first magnetic sublayer composed of Co—Fe or Fe and a second magnetic sublayer composed of Co—Fe—B or Fe—B are formed, in that order, on an insulating barrier layer composed of Mg—O. This effectively improves the rate of change in resistance (?R/R) compared with the related art.

Abstract: A tunneling magnetic sensing element includes a pinned magnetic layer whose magnetization direction is pinned in one direction, an insulating barrier layer disposed on the pinned magnetic layer, a free magnetic layer whose magnetization direction varies in response to an external magnetic field disposed on the insulating barrier layer, and a first protective layer composed of iridium-manganese (IrMn) disposed on the free magnetic layer. Consequently, a high rate of change in resistance is obtained and the magnetostriction of the free magnetic layer is low, compared with a tunneling magnetic sensing element which is not provided with a first protective layer.

Abstract: An underlying layer is composed of Co—Fe—B that is an amorphous magnetic material. Thus, the upper surface of the underlying layer can be taken as a lower shield layer-side reference position for obtaining a gap length (GL) between upper and lower shields, resulting in a narrower gap than before. In addition, since the underlying layer has an amorphous structure, the underlying layer does not adversely affect the crystalline orientation of individual layers to be formed thereon, and the surface of the underlying layer has good planarizability. Accordingly, PW50 (half-amplitude pulse width) and SN ratio can be improved more than before without causing a decrease in rate of change in resistance (? R/R) or the like, thereby achieving a structure suitable for increasing recording density.

Abstract: A tunnel magnetoresistive sensor includes a pinned magnetic layer, an insulating barrier layer formed of Mg—O, and a free magnetic layer. A barrier-layer-side magnetic sublayer constituting at least part of the pinned magnetic layer and being in contact with the insulating barrier layer includes a first magnetic region formed of CoFeB or FeB and a second magnetic region formed of CoFe or Fe. The second magnetic region is disposed between the first magnetic region and the insulating barrier layer.

Abstract: In a tunneling magnetoresistive element, an insulating barrier layer is made of Mg—O, and a first pinned magnetic layer has a laminated structure in which a nonmagnetic metal sublayer made of Ta is interposed between a lower ferromagnetic sublayer and an upper ferromagnetic sublayer. The nonmagnetic metal sublayer has an average thickness of about 1 ? or more and about 5 ? or less.

Abstract: A tunneling magnetic detecting element includes an insulating barrier layer having a layered structure including a Ti—O sublayer and a Ta—O sublayer. The Ta concentration in the insulating barrier layer is set to be more than 0 at % but not more than about 7 at % with respect to a total of 100 at % of Ti and Ta constituting the insulating barrier layer.

Abstract: A tunnel magnetoresistive element includes a laminate including a pinned magnetic layer, an insulating barrier layer, and a free magnetic layer. The insulating barrier layer is composed of Ti—Mg—O or Ti—O. The free magnetic layer includes an enhancement sublayer, a first soft magnetic sublayer, a nonmagnetic metal sublayer, and a second soft magnetic sublayer. For example, the enhancement sublayer is composed of Co—Fe, the first soft magnetic sublayer and the second soft magnetic sublayer are composed of Ni—Fe, and the nonmagnetic metal sublayer is composed of Ta. The total thickness of the average thickness of the enhancement sublayer and the average thickness of the first soft magnetic sublayer is in the range of 25 to 80 angstroms. Accordingly, the tunneling magnetoresistive element can consistently have a higher rate of resistance change than before.

Abstract: A tunneling magnetic sensor includes a pinned magnetic layer of which the magnetization is pinned in one direction, an insulating barrier layer, and a free magnetic layer of which the magnetization is varied by an external magnetic field, these layers being arranged in that order from the bottom. A first protective layer made of magnesium (Mg) is disposed on the free magnetic layer. The tunneling magnetic sensor has a larger change in reluctance as compared to conventional magnetic sensors including no first protective layers or including first protective layers made of Al, Ti, Cu, or an Ir—Mn alloy. The free magnetic layer has lower magnetostriction as compared to free magnetic layers included in the conventional magnetic sensors.

Abstract: A tunneling magnetic sensor includes a platinum layer between a pinned magnetic layer and an insulating barrier layer. The platinum layer can probably vary the barrier height (potential height) and barrier width (potential width) of the insulating barrier layer to reduce the absolute value of VCR, thus providing higher operating stability than known tunneling magnetic sensors. In addition, the insulating barrier layer can achieve increased flatness at its bottom interface (where the insulating barrier layer starts to be formed). The tunneling magnetic sensor can therefore provide a higher rate of resistance change (?R/R) at low RA than known tunneling magnetic sensors.

Abstract: A tunneling magnetic sensing element including an Mg—O insulating barrier which can maintain favorable soft-magnetic properties of a free magnetic layer and can have a high resistance change ratio (?R/R) compared to known tunnel magnetic sensing elements is disclosed, and a method of manufacturing such a tunneling magnetic sensing element is also disclosed. An enhance layer (second magnetic layer) composed of Co100-XFeX having a Fe composition ratio X of about 30 to 100 at % is disposed on the Mg—O insulating barrier. With this, the magnetostriction ? of the free magnetic layer can be reduced and the resistance change ratio (?R/R) can be increased.

Abstract: A tunnel-type magnetic detecting element is provided. The tunnel-type magnetic detecting element includes a first ferromagnetic layer; an insulating barrier layer; and a second ferromagnetic layer. The first ferromagnetic layer, the second ferromagnetic layer, or both have a Heusler alloy layer contacting the insulating barrier layer. Equivalent planes represented by {110} surfaces, are preferentially oriented parallel to a film surface in the Heusler alloy layer. The insulating barrier layer is formed of MgO and the equivalent crystal planes represented by the {100} surfaces or the equivalent crystal planes represented by the {110} surfaces are oriented parallel to the film surface.