Patents by Inventor Naoya HATAKEYAMA

Naoya HATAKEYAMA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210055653
    Abstract: Provided are an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A), in which the resin (A) includes a repeating unit having an acidic group and a repeating unit having an acid-decomposable group, a content of the repeating unit having an acidic group is 15% by mole or more with respect to all the repeating units in the resin (A), a content of the repeating unit having an acid-decomposable group is more than 20% by mole with respect to all the repeating units in the resin (A), a glass transition temperature of the resin (A) is 145° C. or lower, and the actinic ray-sensitive or radiation-sensitive resin composition is used for formation of a film having a film thickness of 2 ?m or more; and a resist film, a pattern forming method, and a method for manufacturing an electronic device, each using the actinic ray-sensitive or radiation-sensitive resin composition.
    Type: Application
    Filed: March 3, 2020
    Publication date: February 25, 2021
    Applicant: FUJIFILM Corporation
    Inventors: Tsutomu YOSHIMURA, Yasunori YONEKUTA, Naoya HATAKEYAMA, Kohei HIGASHI, Yoichi NISHIDA
  • Patent number: 10923769
    Abstract: Provided is an electrolytic solution for a non-aqueous secondary battery containing an electrolyte, an organic solvent, and a compound represented by any of General Formulae (I) to (III) and a non-aqueous secondary battery in which the electrolytic solution for a non-aqueous secondary battery is used. In the formulae, M represents a transition metal. R1, R2, and R3 represent a specific substituent. a represents an integer of 0 to 5. b represents an integer of 0 or more. c represents an integer of 0 to 5. Ar1 represents an aromatic ring. In General Formula (II), a plurality of Ar1's may be linked together. Ar2 represents a nitrogen-containing aromatic hetero ring.
    Type: Grant
    Filed: January 18, 2019
    Date of Patent: February 16, 2021
    Assignee: FUJIFILM Corporation
    Inventors: Shohei Kataoka, Naoya Hatakeyama
  • Patent number: 10863883
    Abstract: A medical system includes a treatment tool including a treatment portion, a joint portion, a flexible tube portion, and a drive unit; an endoscope device including an outer sheath that holds the treatment tool and an imaging unit that is capable of acquiring an image including at least the joint portion; and a control unit that controls an operation of the treatment tool. The control unit includes a table that has a parameter for causing the joint portion to move, a controller that issues a command for controlling the drive unit based on the parameter to the drive unit, an image processing unit that calculates at least one of a position and an orientation of the joint portion based on the image, and a compensation value calculating unit that detects displacement of the joint portion, generates a compensation value, and incorporates the compensation value into the parameter.
    Type: Grant
    Filed: August 24, 2016
    Date of Patent: December 15, 2020
    Assignee: OLYMPUS CORPORATION
    Inventors: Masatoshi Iida, Naoya Hatakeyama, Hiroshi Wakai
  • Patent number: 10859914
    Abstract: A method for producing an electronic device includes the pattern forming method, and an actinic ray-sensitive or radiation-sensitive resin composition for organic solvent development. Specifically, provided is a pattern forming method, including a film forming step of forming a film by an actinic ray-sensitive or radiation-sensitive resin composition, an exposure step of irradiating the film, and a development step of developing the film using a developer containing an organic solvent, in which the composition contains a resin containing a repeating unit having an Si atom and a repeating unit having an acid-decomposable group and a compound capable of generating an acid upon irradiation with actinic rays or radiation, the content of Si atoms in the resin is 1.0 to 30 mass %, and the content of the resin in the total solid content of the composition is 20 mass % or more.
    Type: Grant
    Filed: July 24, 2017
    Date of Patent: December 8, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Naoya Hatakeyama, Akiyoshi Goto, Michihiro Shirakawa, Keita Kato, Keiyu Ou
  • Publication number: 20200301281
    Abstract: A resist composition includes a resin (A) including at least one repeating unit selected from the group consisting of a repeating unit represented by General Formula (1) as defined herein and a repeating unit represented by General Formula (2) as defined herein, and a repeating unit having an acid-decomposable group.
    Type: Application
    Filed: June 9, 2020
    Publication date: September 24, 2020
    Applicant: FUJIFILM Corporation
    Inventors: Yasunori Yonekuta, Naoya Hatakeyama, Tsutomu Yoshimura
  • Publication number: 20200019058
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes: a resin, in which the actinic ray-sensitive or radiation-sensitive resin composition has a concentration of a solid content of 10% by mass or more, and in which the resin includes: a repeating unit A which is a repeating unit derived from a monomer allowing a homopolymer formed therefrom to have a glass transition temperature of 50° C. or lower, and a repeating unit B which is a repeating unit having an acid-decomposable group, a content of the repeating unit B is 20% by mole or less with respect to all the repeating units in the resin, and at least one of the repeating unit contained in the resin is a repeating unit having an aromatic ring.
    Type: Application
    Filed: September 23, 2019
    Publication date: January 16, 2020
    Applicant: FUJIFILM Corporation
    Inventors: Naoya HATAKEYAMA, Yasunori YONEKUTA, Tsutomu YOSHIMURA, Kohei HIGASHI, Yoichi NISHIDA
  • Patent number: 10449009
    Abstract: A medical system includes: a treatment tool including a treatment portion configured to treat a living body, a joint portion configured to move the treatment portion, a first indicator portion provided to correspond to a position of the joint portion, a sheath portion connected to the joint portion, and a driving portion connected to the sheath portion and configured to displace the joint portion; an overtube including a flexible tube portion having a distal end and a proximal end and holding the treatment tool such that the treatment portion is capable of protruding from the distal end, and a second indicator portion provided at the flexible tube portion to identify a predefined space where calibration of the treatment tool is performed; and a calibration mechanism configured to calibrate the treatment tool when the first and second indicator portions have a predetermined positional relationship.
    Type: Grant
    Filed: August 12, 2016
    Date of Patent: October 22, 2019
    Assignee: OLYMPUS CORPORATION
    Inventors: Naoya Hatakeyama, Masatoshi Iida, Hiroshi Wakai
  • Publication number: 20190274517
    Abstract: An electric endoscope control device that changes a bending angle of a bending section of an endoscope by driving a motor according to an amount of manipulation, the electric endoscope control device includes: a storage that stores, for different types of operation state, a plurality of tables that each show the relationship between the amount of manipulation and the rotation angle of the motor, the electric endoscope control device configured to: perform an operation-state determining that determines the operation state of the bending section of the endoscope; and perform a drive-signal generating that generates a drive signal for the motor on a basis of one of the tables, which are stored in the storage, depending on the determined operation state.
    Type: Application
    Filed: May 23, 2019
    Publication date: September 12, 2019
    Applicant: OLYMPUS CORPORATION
    Inventor: Naoya HATAKEYAMA
  • Publication number: 20190157720
    Abstract: Provided is an electrolytic solution for a non-aqueous secondary battery containing an electrolyte, an organic solvent, and a compound represented by any of General Formulae (I) to (III) and a non-aqueous secondary battery in which the electrolytic solution for a non-aqueous secondary battery is used. In the formulae, M represents a transition metal. R1, R2, and R3 represent a specific substituent. a represents an integer of 0 to 5. b represents an integer of 0 or more. c represents an integer of 0 to 5. Ar1 represents an aromatic ring. In General Formula (II), a plurality of Ar1's may be linked together. Ar2 represents a nitrogen-containing aromatic hetero ring.
    Type: Application
    Filed: January 18, 2019
    Publication date: May 23, 2019
    Applicant: FUJIFILM Corporation
    Inventors: Shohei KATAOKA, Naoya HATAKEYAMA
  • Publication number: 20190137875
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a resin which has a repeating unit having an alkyleneoxy chain and a repeating unit having an aromatic group, and has a concentration of the solid content of 10% by mass or more. A pattern forming method has (i) forming an actinic ray-sensitive or radiation-sensitive film having a film thickness of 1 ?m or more on a substrate with an actinic ray-sensitive or radiation-sensitive resin composition containing a resin which has a repeating unit having an alkyleneoxy chain.
    Type: Application
    Filed: December 27, 2018
    Publication date: May 9, 2019
    Applicant: FUJIFILM Corporation
    Inventors: Naoya HATAKEYAMA, Yasunori YONEKUTA, Toshiaki FUKUHARA, Takamitsu TOMIGA, Fumihiro YOSHINO
  • Publication number: 20190029762
    Abstract: A medical manipulator system includes: an elongated manipulator that has an insertion portion; a shape sensor that is provided so as to be movable along the longitudinal direction of a path in which the manipulator is to be disposed and that detects shape information of the path at respective positions; a shape estimating unit that is configured to estimate a curved shape of the manipulator on the basis of the shape information detected by the shape sensor and longitudinal-direction position information of the shape sensor in the path; and a controller that is configured to control the manipulator on a basis of the curved shape of the manipulator estimated by the shape estimating unit.
    Type: Application
    Filed: October 1, 2018
    Publication date: January 31, 2019
    Applicant: OLYMPUS CORPORATION
    Inventors: Masatoshi IIDA, Naoya HATAKEYAMA
  • Patent number: 10155316
    Abstract: A method of calibrating a manipulator including a joint portion, a drive unit that generates a driving force for driving the joint portion, and a driving force transmission member that is inserted into a tubular member and transmits the driving force generated from the drive unit to the joint portion includes: an arrangement step of arranging the manipulator in a usable state; a load-measuring step of issuing an operation command based on a predetermined calibrating drive pattern to the drive unit and measuring a load generated in the manipulator at that time; and a control parameter-setting step of setting a main-driving control parameter based on the load measured in the load-measuring step.
    Type: Grant
    Filed: August 25, 2016
    Date of Patent: December 18, 2018
    Assignee: OLYMPUS CORPORATION
    Inventors: Hiroshi Wakai, Masatoshi Iida, Naoya Hatakeyama
  • Publication number: 20180299776
    Abstract: Provided are a pattern forming method including a film forming step of forming a film using a resin composition containing a resin (A) obtained from a monomer having a silicon atom, the monomer having a turbidity of 1 ppm or less based on JIS K0101:1998 using formazin as a reference material and an integrating sphere measurement system as a measurement system, in which the pattern forming method is capable of remarkably improving scum defect performance, particularly in formation of an ultrafine pattern (for example, a line-and-space pattern having a line width of 50 nm or less, or a hole pattern having a hole diameter of 50 nm or less); and a method for manufacturing an electronic device, using the pattern forming method.
    Type: Application
    Filed: June 21, 2018
    Publication date: October 18, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Naoya HATAKEYAMA, Akiyoshi GOTO, Yasunori YONEKUTA
  • Publication number: 20180292751
    Abstract: The present invention has an object to provide an actinic ray-sensitive or radiation-sensitive resin composition having excellent collapse performance, an actinic ray-sensitive or radiation-sensitive film formed using the composition, a pattern forming method using the composition, and a method for manufacturing an electronic device, including the pattern forming method. The actinic ray-sensitive or radiation-sensitive resin composition of the present invention is an actinic ray-sensitive or radiation-sensitive resin composition containing a resin whose solubility with respect to a developer changes by the action of an acid, in which the resin includes a repeating unit derived from a monomer having at least one of a lactone structure or an amide structure, and the dissolution parameter of the monomer is 24.0 or more.
    Type: Application
    Filed: June 13, 2018
    Publication date: October 11, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Daisuke ASAKAWA, Akiyoshi GOTO, Yasunori YONEKUTA, Naoya HATAKEYAMA, Michihiro SHIRAKAWA, Keiyu OU
  • Patent number: 10085624
    Abstract: The invention has for its object to provide a manipulator and manipulator system in which a dynamic surplus is rapidly removed and a moving assembly actuates rapidly in association with the operation of an operating assembly. The manipulator 1 includes an operating assembly 2 operated by an operator, a moving assembly 3 operated by the operating assembly 2, a transmitting assembly 4 for coupling the operating assembly 2 to the moving assembly 3 to transmit driving force of the operating assembly 2 to the moving assembly 3, and a transmission compensating assembly 6 for making up for a dynamic surplus occurring in the transmitting assembly 4 in association with the operation of the operating assembly 2.
    Type: Grant
    Filed: January 26, 2016
    Date of Patent: October 2, 2018
    Assignee: OLYMPUS CORPORATION
    Inventors: Takumi Isoda, Naoya Hatakeyama, Masatoshi Iida, Sadahiro Watanabe
  • Patent number: 10085612
    Abstract: A manipulator and manipulator system in which a dynamic surplus is rapidly removed and a moving part actuates rapidly in association with the operation of an operating part. The manipulator includes an operating part operated by an operator, a moving part operated by the operating part, a transmitting part for coupling the operating part to the moving part to transmit driving force of the operating part to the moving part, a transmission compensating part for making up for a dynamic surplus occurring in the transmitting part in association with the operation of the operating part, an input part for acquiring a state of at least one of the operating, moving and transmitting part, and a control unit for controlling the transmission compensating part depending on the state acquired by the input part.
    Type: Grant
    Filed: January 26, 2016
    Date of Patent: October 2, 2018
    Assignee: OLYMPUS CORPORATION
    Inventors: Naoya Hatakeyama, Takumi Isoda, Masatoshi Iida, Sadahiro Watanabe
  • Publication number: 20180120706
    Abstract: Provided are a pattern forming method including (1) a step of forming a resist underlayer film on a substrate to be processed, (2) a step of forming a resist film on the resist underlayer film, using a resist composition containing (A) a resin having a repeating unit containing a Si atom, and (B) a compound which generates an acid upon irradiation with actinic rays or radiation, (3) a step of exposing the resist film, (4) a step of developing the exposed resist film using a developer including an organic solvent, thereby forming a negative tone resist pattern, and (5) a step of processing the resist underlayer film and the substrate to be processed, using the resist pattern as a mask, thereby forming a pattern, in which the content of the resin (A) is 20% by mass or more with respect to the total solid content of the resist composition.
    Type: Application
    Filed: December 21, 2017
    Publication date: May 3, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Michihiro SHIRAKAWA, Keiyu OU, Naoya HATAKEYAMA, Akiyoshi GOTO, Keita KATO, Takashi YAKUSHIJI, Tadashi OMATSU
  • Publication number: 20180049831
    Abstract: A medical manipulator system including: a manipulator with a flexible insertion portion, a movable part at a distal end of the insertion portion, a detachable drive unit at a proximal end of the insertion portion, and a pair of tension transmission members transmitting a driving force generated in the drive unit to move the movable part; an input unit inputting an operation command for the manipulator; and a control unit controlling the drive unit based on the input operation command, the drive unit having a displacement sensor detecting displacement direction and amount of the tension transmission members and a tension-difference sensor detecting a tension difference between the tension transmission members, the control unit has a storage unit storing characteristics of the tension transmission members and a setting unit setting a control parameter for controlling the drive unit based on the characteristics and the detected tension difference, displacement amount and direction.
    Type: Application
    Filed: October 31, 2017
    Publication date: February 22, 2018
    Applicant: OLYMPUS CORPORATION
    Inventors: Masatoshi IIDA, Naoya HATAKEYAMA
  • Patent number: 9878449
    Abstract: Provided is a manipulator system including: a manipulator that has an insertion section composed of a flexible section and a bending section and that has a bending-section drive unit for driving the bending section; an operation input unit; a flexible-section shape detecting unit and a bending-section shape detecting unit that detect curved shapes of the flexible section and the bending section, respectively; compensation-value setting units that set a compensation value on the basis of the curved shape detected by each of the shape detecting units; and a control unit that generates a curvature control signal for driving the bending-section drive unit according to an operating instruction input via the operation input unit and furthermore corrects the curvature control signal using the compensation value and transmits it to the bending-section drive unit.
    Type: Grant
    Filed: January 21, 2016
    Date of Patent: January 30, 2018
    Assignee: OLYMPUS CORPORATION
    Inventors: Hiroshi Wakai, Naoya Hatakeyama, Masatoshi Iida
  • Publication number: 20180011406
    Abstract: A pattern forming method includes: applying an actinic ray-sensitive or radiation- sensitive resin composition onto a substrate to form a resist film; forming an upper layer film on the resist film, using a composition for forming an upper layer film; exposing the resist film having the upper layer film formed thereon; and developing the exposed resist film using a developer including an organic solvent to form a pattern. The composition for forming an upper layer film contains a resin having a repeating unit (a) with a ClogP value of 2.85 or more and a compound (b) with a ClogP of 1.30 or less, and the receding contact angle of the upper layer film with water is 70 degrees or more, a resist pattern formed by the pattern forming method, and a method for manufacturing an electronic device, including the pattern forming method.
    Type: Application
    Filed: September 19, 2017
    Publication date: January 11, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Naoya HATAKEYAMA, Naoki INOUE, Naohiro TANGO, Michihiro SHIRAKAWA, Akiyoshi GOTO