Patents by Inventor Naoya Iguchi
Naoya Iguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20250008710Abstract: A vehicle display device includes: a housing; a liquid crystal display element that is housed in the housing; a mirror that is housed in the housing, and reflects display light to a windshield of a vehicle, the display light being output from the liquid crystal display element; a heat conduction member that is disposed to be in contact with either a display surface or a rear surface of the liquid crystal display element, the heat conduction member being transparent and having a plate shape; and heat radiation accelerating means, the housing includes a through-hole that the heat conduction member is insertable into, the heat conduction member pierces through the through-hole, and includes a protrusion that protrudes from the through-hole to an external space of the housing, and the heat radiation accelerating means accelerates heat radiation of the protrusion.Type: ApplicationFiled: September 13, 2024Publication date: January 2, 2025Applicant: Yazaki CorporationInventors: Tomohiro MIYAZAWA, Naoya IGUCHI
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Publication number: 20230211124Abstract: An object is to provide a catheter and a branched connector that can improve sealing properties and have high versatility. In a branched connector 40 used in a catheter 100, the branched connector 40 comprises a first end portion 44 to which a catheter main body 10 is attached and having a first hole portion 43 communicating with the catheter main body 10 being formed at the first end portion 44, and a second end portion 49 including an elastic member and having a second hole portion 48 for inserting a wire-like instrument 20 being formed in the elastic member, and the second hole portion 48 communicates with the first hole portion 43 and has a flow passage area smaller than a flow passage area of the first hole portion 43.Type: ApplicationFiled: May 20, 2021Publication date: July 6, 2023Inventors: Osamu TSUKADA, Akihiko NAKASA, Naoya IGUCHI
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METHOD FOR INSPECTING PHOTOSENSITIVE COMPOSITION AND METHOD FOR PRODUCING PHOTOSENSITIVE COMPOSITION
Publication number: 20230108447Abstract: Provided are a method for inspecting a photosensitive composition, the method being able to more accurately evaluate photosensitive compositions produced at different times and including the same materials, and a method for producing a photosensitive composition.Type: ApplicationFiled: September 27, 2022Publication date: April 6, 2023Applicant: FUJIFILM CorporationInventor: Naoya IGUCHI -
Patent number: 10388198Abstract: A vehicular display device includes an image display device, a circuit board, a casing, and fastening members. The image display device includes a plurality of boss parts having a proximal portion having a contact surface capable of being brought into contact with the circuit board on a distal end in a first direction; an insertion portion formed in a projecting manner from the distal end of the proximal portion and being capable of being inserted into a board fastening hole of the circuit board and a casing fastening hole of the casing along the first direction; and a threadedly engaging hole formed from the distal end of the insertion portion in the first direction toward the proximal portion along the first direction, the fastening members being capable of being threadedly engaged with the threadedly engaging hole.Type: GrantFiled: November 29, 2017Date of Patent: August 20, 2019Assignee: YAZAKI CORPORATIONInventors: Ryuichi Hashimoto, Harutada Hojo, Naoya Iguchi
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Patent number: 10088752Abstract: There is disclosed a method for manufacturing an organic processing fluid for patterning of a chemical amplification type resist film, comprising a step of causing a fluid containing an organic solvent to pass through a filtration device having a fluid input portion, a fluid output portion, and a filtration filter film provided in a flow path that connects the fluid input portion and the fluid output portion with each other, wherein an absolute value (|TI?To|) of a difference between a temperature (TI) of the fluid in the fluid input portion and a temperature (To) of the fluid in the fluid output portion is 3° C. or lower, a filtration speed of the fluid in the filtration device is 0.5 L/min/m2 or greater, and a filtration pressure by the fluid in the filtration device is 0.10 MPa or lower.Type: GrantFiled: October 1, 2015Date of Patent: October 2, 2018Assignee: FUJIFILM CorporationInventors: Tsukasa Yamanaka, Takashi Kawamoto, Naoya Iguchi
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Publication number: 20180218654Abstract: A vehicular display device includes an image display device, a circuit board, a casing, and fastening members. The image display device includes a plurality of boss parts having a proximal portion having a contact surface capable of being brought into contact with the circuit board on a distal end in a first direction; an insertion portion formed in a projecting manner from the distal end of the proximal portion and being capable of being inserted into a board fastening hole of the circuit board and a casing fastening hole of the casing along the first direction; and a threadedly engaging hole formed from the distal end of the insertion portion in the first direction toward the proximal portion along the first direction, the fastening members being capable of being threadedly engaged with the threadedly engaging hole.Type: ApplicationFiled: November 29, 2017Publication date: August 2, 2018Applicant: Yazaki CorporationInventors: Ryuichi HASHIMOTO, Harutada HOJO, Naoya IGUCHI
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Patent number: 9885956Abstract: A pattern forming method includes: (a) forming a first film on a substrate using an actinic ray-sensitive or radiation-sensitive resin composition (I) containing a resin of which solubility in a developer containing an organic solvent decreases due to polarity increased by an action of an acid; (b) exposing the first film; (c) developing the exposed first film using a developer containing an organic solvent to form a first negative pattern; (e) forming a second film on the substrate using an actinic ray-sensitive or radiation-sensitive resin composition (II) containing a resin of which solubility in a developer containing an organic solvent decreases due to polarity increased by an action of an acid; (f) exposing the second film; and (g) developing the exposed second film using a developer containing an organic solvent to form a second negative pattern in this order.Type: GrantFiled: January 27, 2015Date of Patent: February 6, 2018Assignee: FUJIFILM CorporationInventors: Tsukasa Yamanaka, Naoya Iguchi, Ryosuke Ueba, Kei Yamamoto
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Patent number: 9810981Abstract: A pattern formation method includes step (i) of forming a first negative type pattern on a substrate by performing step (i-1) of forming a first film on the substrate using an actinic ray-sensitive or radiation-sensitive resin composition, step (i-2) of exposing the first film and step (i-3) of developing the exposed first film in this order; step (iii) of forming a second film at least on the first negative type pattern using an actinic ray-sensitive or radiation-sensitive resin composition (2); step (v) of exposing the second film; and step (vi) of developing the exposed second film and forming a second negative type pattern at least on the first negative type pattern.Type: GrantFiled: August 5, 2016Date of Patent: November 7, 2017Assignee: FUJIFILM CorporationInventors: Ryosuke Ueba, Naoya Iguchi, Tsukasa Yamanaka, Naohiro Tango, Michihiro Shirakawa, Keita Kato
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Publication number: 20160342083Abstract: A pattern formation method includes step (i) of forming a first negative type pattern on a substrate by performing step (i-1) of forming a first film on the substrate using an actinic ray-sensitive or radiation-sensitive resin composition, step (i-2) of exposing the first film and step (i-3) of developing the exposed first film in this order; step (iii) of forming a second film at least on the first negative type pattern using an actinic ray-sensitive or radiation-sensitive resin composition (2); step (v) of exposing the second film; and step (vi) of developing the exposed second film and forming a second negative type pattern at least on the first negative type pattern.Type: ApplicationFiled: August 5, 2016Publication date: November 24, 2016Applicant: FUJIFILM CorporationInventors: Ryosuke UEBA, Naoya IGUCHI, Tsukasa YAMANAKA, Naohiro TANGO, Michihiro SHIRAKAWA, Keita KATO
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Publication number: 20160026088Abstract: There is disclosed a method for manufacturing an organic processing fluid for patterning of a chemical amplification type resist film, comprising a step of causing a fluid containing an organic solvent to pass through a filtration device having a fluid input portion, a fluid output portion, and a filtration filter film provided in a flow path that connects the fluid input portion and the fluid output portion with each other, wherein an absolute value (|TI?To|) of a difference between a temperature (TI) of the fluid in the fluid input portion and a temperature (To) of the fluid in the fluid output portion is 3° C. or lower, a filtration speed of the fluid in the filtration device is 0.5 L/min/m2 or greater, and a filtration pressure by the fluid in the filtration device is 0.10 MPa or lower.Type: ApplicationFiled: October 1, 2015Publication date: January 28, 2016Applicant: FUJIFILM CorporationInventors: Tsukasa YAMANAKA, Takashi KAWAMOTO, Naoya IGUCHI
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Publication number: 20150140482Abstract: A pattern forming method includes: (a) forming a first film on a substrate using an actinic ray-sensitive or radiation-sensitive resin composition (I) containing a resin of which solubility in a developer containing an organic solvent decreases due to polarity increased by an action of an acid; (b) exposing the first film; (c) developing the exposed first film using a developer containing an organic solvent to form a first negative pattern; (e) forming a second film on the substrate using an actinic ray-sensitive or radiation-sensitive resin composition (II) containing a resin of which solubility in a developer containing an organic solvent decreases due to polarity increased by an action of an acid; (f) exposing the second film; and (g) developing the exposed second film using a developer containing an organic solvent to form a second negative pattern in this order.Type: ApplicationFiled: January 27, 2015Publication date: May 21, 2015Applicant: FUJIFILM CORPORATIONInventors: Tsukasa YAMANAKA, Naoya IGUCHI, Ryosuke UEBA, Kei YAMAMOTO
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Patent number: 7868803Abstract: A semiconductor device comprises an overflow detection circuit (5) which compares an output of at least one integrator in a ?? modulator (13) with a predetermined value to output an overflow detection signal; an overflow frequency calculation circuit (6) which calculates an overflow frequency value that is the frequency of the output from the integrator being outside a normal range, based on the overflow detection signal, and outputs the overflow frequency value; an oscillation judgment circuit (7) which judges whether the ?? modulator (13) is in the oscillation state or not based on the overflow frequency value; and an oscillation halt circuit which suppresses oscillation of the ?? modulator (13) when the oscillation judgment circuit (7) judges that the ?? modulator is in the oscillation state; wherein it is determined whether the output of the integrator is temporarily outside the normal range due to noise or the like or the output of the integrator is outside the normal range due to oscillation, by obtainiType: GrantFiled: October 11, 2007Date of Patent: January 11, 2011Assignee: Panasonic CorporationInventors: Shiho Muraki, Naoya Iguchi, Kouichi Nagano, Kazuo Matsukawa, Masao Takayama
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Publication number: 20100085228Abstract: A semiconductor device comprises an overflow detection circuit (5) which compares an output of at least one integrator in a ?? modulator (13) with a predetermined value to output an overflow detection signal; an overflow frequency calculation circuit (6) which calculates an overflow frequency value that is the frequency of the output from the integrator being outside a normal range, based on the overflow detection signal, and outputs the overflow frequency value; an oscillation judgment circuit (7) which judges whether the ?? modulator (13) is in the oscillation state or not based on the overflow frequency value; and an oscillation halt circuit which suppresses oscillation of the ?? modulator (13) when the oscillation judgment circuit (7) judges that the ?? modulator is in the oscillation state; wherein it is determined whether the output of the integrator is temporarily outside the normal range due to noise or the like or the output of the integrator is outside the normal range due to oscillation, by obtainiType: ApplicationFiled: October 11, 2007Publication date: April 8, 2010Inventors: Shiho Muraki, Naoya Iguchi, Kouichi Nagano, Kazuo Matsukawa, Masao Takayama
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Publication number: 20050213380Abstract: In a multiple power source semiconductor integrated circuit that is manufactured using a process which generates a large leakage current, supply of power to a function block that is not being used is stopped to reduce unnecessary power consumption. A multiple power source semiconductor integrated circuit (1) includes first to fourth function blocks (11) to (14) that are supplied with power from first to fourth power supply circuits (3) to (6), respectively, and a power supply control circuit (40) that controls supply of power by the first to fourth power supply circuits (3) to (6) under the control of a microcomputer as the first function block (11). The power supply control circuit (40) halts the supply of power to the first to fourth function blocks (11) to (14) when receiving prescribed data from the first function block (11), and restarts the supply of power when receiving a first or second interrupt signal (55) or (56) from outside.Type: ApplicationFiled: April 4, 2003Publication date: September 29, 2005Inventors: Kazuya Taniguchi, Naoya Iguchi, Yasuhito Soma, Hisato Hayakawa