Abstract: The present invention provides an omnidirectional distance measuring device that covers a wide detection range and does not require adjustment of each of the detection areas of a plurality of distance measuring sensors. In the omnidirectional distance measuring device, a plurality of distance measuring sensors that measure a distance to a target are disposed radially around a central axis so as to be close to each other. The plurality of distance measuring sensors are integrally configured such that a detection center direction of each of the plurality of distance measuring sensors is inclined by a predetermined angle from a plane perpendicular to the central axis. As the distance measuring sensor, a TOF sensor that measures a distance based on a flight time of light or a stereo camera that measures a distance using parallax of a pair of cameras is used.

Abstract: A battery stand is configured to output an electric power stored in a battery to the outside when the battery is placed on a mounting part. A slit hole is formed on the top surface of the battery stand through which a slider is inserted and through which a movement range of the slider is regulated. The battery stand is linked to the movement of the slider and is equipped with a holding mechanism to secure the battery. The battery stand is equipped with a shielding member that shields the slit hole. The shielding member is attached to the slider and moves with the slider while maintaining the slit hole shielded.

Abstract: Described herein is a technique capable of preventing a susceptor made of quartz from being damaged by contacting a reflector deformed by thermal expansion. A substrate support according to the technique may include an upper susceptor made of quartz; a lower susceptor made of quartz; and a reflector reflecting heat and made of a metal in a planar shape. A lower surface of the upper susceptor is bonded with an upper surface of the lower susceptor such that the reflector is interposed therebetween, a first recess accommodating the reflector is provided at the upper surface of the lower susceptor, and a portion of the lower surface of the upper susceptor facing the first recess is roughened.

Abstract: The present invention provides an omnidirectional distance measuring device that covers a wide detection range and does not require adjustment of each of the detection areas of a plurality of distance measuring sensors. In the omnidirectional distance measuring device, a plurality of distance measuring sensors that measure a distance to a target are disposed radially around a central axis so as to be close to each other. The plurality of distance measuring sensors are integrally configured such that a detection center direction of each of the plurality of distance measuring sensors is inclined by a predetermined angle from a plane perpendicular to the central axis. As the distance measuring sensor, a TOF sensor that measures a distance based on a flight time of light or a stereo camera that measures a distance using parallax of a pair of cameras is used.

Abstract: A distance measurement apparatus 1 includes a light emitting unit 11 that irradiates a subject with a light-source light from a light source, a light receiving unit 12 that receives a reflected light from the subject, a distance calculation unit 13 that calculates a distance to the subject based on a time difference from the irradiation of the light-source light to the reception of the reflected light; and an image processing unit 20 that generates a distance image of the subject based on the calculated distance. Further, the apparatus includes a first rotation mechanism 14 that adjusts an irradiation angle of the light emitting unit and a second rotation mechanism 15 that adjusts a light receiving angle of the light receiving unit, in which the angles of the light emitting unit and the light receiving unit may be adjusted independently of each other.

Abstract: A three-dimensional distance measurement apparatus include: a plurality of light sources 11 that irradiate light onto the subject; a light emission control unit 12 that controls light emission from a plurality of light sources; a light-receiving unit 13 that detects reflection light from the subject; a distance-calculating unit 14 that calculates a distance to the subject on the basis of a transmission time of reflection light; and an image processing unit 15 that creates a distance image of the subject on the basis of calculated distance data. The plurality of irradiation areas 3 onto which light from the light sources are irradiated are arranged to partially overlap only with the neighboring ones. The light emission control unit 12 individually turns on or off the light sources 11 or individually adjusts the emitted light amounts.

Abstract: In a depth map measuring device which measures a distance up to an object body, there is provided a light source unit which emits light toward the object body, a light receiving unit which receives a reflected light from the object body, a sensor unit which includes the light source unit and the light receiving unit, and a housing which stores the sensor unit. A rotation axis is set to a direction perpendicular to a center axis of the light emitted from the light source unit. The sensor unit is held in the housing in a state of varying in angle about the rotation axis. A disk radiation fin is provided around the sensor unit other than a light emitting surface of the light source unit and a light receiving surface of the light receiving unit.

Abstract: A three-dimensional distance measurement apparatus include: a plurality of light sources 11 that irradiate light onto the subject; a light emission control unit 12 that controls light emission from a plurality of light sources; a light-receiving unit 13 that detects reflection light from the subject; a distance-calculating unit 14 that calculates a distance to the subject on the basis of a transmission time of reflection light; and an image processing unit 15 that creates a distance image of the subject on the basis of calculated distance data. The plurality of irradiation areas 3 onto which light from the light sources are irradiated are arranged to partially overlap only with the neighboring ones. The light emission control unit 12 individually turns on or off the light sources 11 or individually adjusts the emitted light amounts.

Abstract: A distance measurement apparatus 1 includes a light emitting unit 11 that irradiates a subject with a light-source light from a light source, a light receiving unit 12 that receives a reflected light from the subject, a distance calculation unit 13 that calculates a distance to the subject based on a time difference from the irradiation of the light-source light to the reception of the reflected light; and an image processing unit 20 that generates a distance image of the subject based on the calculated distance. Further, the apparatus includes a first rotation mechanism 14 that adjusts an irradiation angle of the light emitting unit and a second rotation mechanism 15 that adjusts a light receiving angle of the light receiving unit, in which the angles of the light emitting unit and the light receiving unit may be adjusted independently of each other.

Abstract: Described herein is a technique capable of preventing a susceptor made of quartz from being damaged by contacting a reflector deformed by thermal expansion. A substrate support according to the technique may include an upper susceptor made of quartz; a lower susceptor made of quartz; and a reflector reflecting heat and made of a metal in a planar shape. A lower surface of the upper susceptor is bonded with an upper surface of the lower susceptor such that the reflector is interposed therebetween, a first recess accommodating the reflector is provided at the upper surface of the lower susceptor, and a portion of the lower surface of the upper susceptor facing the first recess is roughened.

Abstract: In the present invention, a substrate is placed at a predetermined position on a substrate support even though the substrate is deviated on a substrate transfer unit. There is provided a substrate processing apparatus that includes a process chamber, a transfer chamber accommodating a substrate transfer unit, a substrate detecting unit, a memory unit configured to store a first reference position information, a second reference position information and a substrate reference position information and a controller configured to generate a detected position information representing a position of a substrate being transferred in the transfer chamber based on a detection result and to control the substrate transfer unit to place the substrate based on the detected position information, the first reference position information, the substrate reference position information and a difference between the first reference position information and the second reference position information.

Abstract: Provided are a substrate processing apparatus, a method of processing a substrate, a method of manufacturing a semiconductor device, and a non-transitory computer readable recording medium storing a program for performing the method of manufacturing the semiconductor device, that are capable of improving manufacturing throughput of the apparatus. The substrate processing apparatus includes a substrate to be processed, a transfer chamber under a vacuum atmosphere, a substrate transfer unit installed at the transfer chamber and configured to transfer the substrate, at least two process chambers installed near the transfer chamber and configured to process the substrate, at least two gate valves installed between the transfer chamber and the at least two process chambers, and a control unit configured to control the substrate transfer unit and the at least two gate valves, wherein the control unit opens and closes the at least two gate valves while the substrate transfer unit transfers the substrate.

Abstract: In the present invention, a substrate is placed at a predetermined position on a substrate support even though the substrate is deviated on a substrate transfer unit. There is provided a substrate processing apparatus that includes a process chamber, a transfer chamber accommodating a substrate transfer unit, a substrate detecting unit, a memory unit configured to store a first reference position information, a second reference position information and a substrate reference position information and a controller configured to generate a detected position information representing a position of a substrate being transferred in the transfer chamber based on a detection result and to control the substrate transfer unit to place the substrate based on the detected position information, the first reference position information, the substrate reference position information and a difference between the first reference position information and the second reference position information.

Abstract: An engaged protrusion is formed in a flat cable connected to a connector. The housing of the connector has an engaging protrusion rising in front of the position in which the engaged protruding portion is arranged when the flat cable is connected. A reinforced metal fitting has a reinforced protrusion raised along the engaging protrusion. The rear surface of the engaging protrusion is positioned to the rear of the rear surface of the reinforced protrusion. The rear surface of the reinforced protrusion is formed so as to extend upward and forward.

Abstract: Provided are a substrate processing apparatus, a method of processing a substrate, a method of manufacturing a semiconductor device, and a non-transitory computer readable recording medium storing a program for performing the method of manufacturing the semiconductor device, that are capable of improving manufacturing throughput of the apparatus. The apparatus includes a substrate to be processed, a transfer chamber under a vacuum atmosphere, a substrate transfer unit installed at the transfer chamber and configured to transfer the substrate, at least two process chambers installed near the transfer chamber and configured to process the substrate, at least two gate valves installed between the transfer chamber and the at least two process chambers, and a control unit configured to control the substrate transfer unit and the at least two gate valves, wherein the control unit opens and closes the at least two gate valves while the substrate transfer unit transfers the substrate.

Abstract: Provided is a relay connector 100 for establishing connection between motors each having a pair of motor terminals provided to a back plate, and for supplying power supplied from external terminals to the respective motor terminals. The relay connector 100 includes: a motor connecting surface 120 having a first relay terminal 140 that connects to the motor terminals of each motor; an external connector connecting surface 130 that is continuous to the motor connecting surface 120 and has in its bonding surface a second relay terminal 150 that connects to L-shaped terminals 220; and a housing 110 having the motor connecting surface 120 and the external connector connecting surface 130 in its end surfaces. The first relay terminal 140 and the second relay terminal 150 are electrically connected with each other within the housing 110.

Abstract: Provided is a relay connector 100 for establishing connection between motors each having a pair of motor terminals provided to a back plate, and for supplying power supplied from external terminals to the respective motor terminals. The relay connector 100 includes: a motor connecting surface 120 having a first relay terminal 140 that connects to the motor terminals of each motor; an external connector connecting surface 130 that is continuous to the motor connecting surface 120 and has in its bonding surface a second relay terminal 150 that connects to L-shaped terminals 220; and a housing 110 having the motor connecting surface 120 and the external connector connecting surface 130 in its end surfaces. The first relay terminal 140 and the second relay terminal 150 are electrically connected with each other within the housing 110.

Abstract: A substrate processing apparatus reduces over-heating of a substrate transfer robot and suppresses deterioration of reliability or lifespan of the substrate transfer robot. The substrate processing apparatus includes a transfer chamber having a substrate transferred thereinto under a negative pressure; a process chamber connected to the transfer chamber and configured to heat the substrate; a transfer robot installed in the transfer chamber and configured to transfer the substrate into and out of the process chamber; and a cooling unit configured to cool an inner wall of the transfer chamber.

Abstract: An engaged protrusion is formed in a flat cable connected to a connector. The housing of the connector has an engaging protrusion rising in front of the position in which the engaged protruding portion is arranged when the flat cable is connected. A reinforced metal fitting has a reinforced protrusion raised along the engaging protrusion. The rear surface of the engaging protrusion is positioned to the rear of the rear surface of the reinforced protrusion. The rear surface of the reinforced protrusion is formed so as to extend upward and forward.

Abstract: A connector comprises housing, a lever and a lock portion. The lever, attached to the housing, is configured to be rotatable between a first position, where the connector is initially fit to another is established, and a second position, where the fitting is completed. The lock portion is capable of locking the lever at the second position, is slidably attached to a body portion of the lever, and is configured to be slid between a lock position (where the lever is locked) and a lock release position (re-leased). The lever is provided with a positioning latch-portion, which is configured to latch the lock portion at the lock position and the lock release position and is pro-vided with a concaved latch-portion and a convexed latch-portion that is configured to be elastically displaced to be engaged in or disengaged from the concaved latch-portion.