Abstract: Provided are a dispersion for a silicon carbide sintered body having a small environmental load, high dispersibility, and excellent temporal stability, and a manufacturing method thereof. The dispersion is a dispersion for a silicon carbide sintered body, containing: silicon carbide particles; boron nitride particles; a resin having a hydroxyl group; and water, wherein the dispersion has a pH at 25° C. of less than or equal to 7.0, and the silicon carbide particles and the boron nitride particles have charges of the same sign. The dispersion is manufactured by a manufacturing method of a dispersion for a silicon carbide sintered body, including a mixing step of mixing a water dispersion containing silicon carbide particles, a water dispersion containing boron nitride particles, and an aqueous solution containing a resin having a hydroxyl group.

Abstract: To provide a means capable of suppressing the generation of gelation at the time of or after the addition of a silane coupling agent in the production of a cationically modified silica including modifying a silica raw material with a silane coupling agent. The present invention is a method for producing a cationically modified silica, including: mixing a silica raw material having a negative zeta potential with a silane coupling agent having an amino group or a quaternary cationic group; and reacting the silica raw material with the silane coupling agent to obtain a cationically modified silica, in which the cationically modified silica satisfies the following relational expression (1): X<Y??relational expression (1) in the relational expression (1), X is a pH value at which an isoelectric point is shown in the cationically modified silica, and Y is a pH value of the cationically modified silica.

Abstract: According to the present invention, there is provided a means for producing an aluminum hydroxide-coated SiC particle powder having a coating layer containing aluminum hydroxide on a surface of SiC particles. The present invention relates to a method for producing an aluminum hydroxide-coated SiC particle powder, which includes a coating step of maintaining a pH of a dispersion containing SiC particles, sodium aluminate, and water in a range of from 9 to 12 and forming coated particles having a coating layer containing aluminum hydroxide on a surface of the SiC particles.

Abstract: The titanium phosphate powder of the present invention includes plate-shaped crystalline particles of titanium phosphate, an average thickness of the plate-shaped crystalline particles is 0.01 ?m or more and less than 0.10 ?m, and an aspect ratio, which is a value obtained by dividing an average primary particle diameter of the plate-shaped crystalline particles by the average thickness, is 5 or more. In the method for producing a titanium phosphate powder of the present invention, a raw material containing titanium and phosphorus is caused to react by a hydrothermal synthesis method, and when the titanium phosphate powder including plate-shaped crystalline particles of titanium phosphate is produced, a mixture of titanium sulfate and phosphoric acid is used as the raw material.

Abstract: According to the present invention, there is provided a means for producing an aluminum hydroxide-coated SiC particle powder having a coating layer containing aluminum hydroxide on a surface of SiC particles. The present invention relates to a method for producing an aluminum hydroxide-coated SiC particle powder, which includes a coating step of maintaining a pH of a dispersion containing SiC particles, sodium aluminate, and water in a range of from 9 to 12 and forming coated particles having a coating layer containing aluminum hydroxide on a surface of the SiC particles.

Abstract: The present invention addresses the problem of providing a polishing method for polishing a silicon carbide substrate, which is capable of increasing the polishing speed even when using a polishing pad that usually does not lead to an increase in polishing speed. A polishing method for polishing a silicon carbide substrate, the polishing method including a primary polishing step of polishing with a polishing member A containing abrasive grains using a polishing pad, the primary polishing step being polishing performed in association with a solid-phase reaction between the abrasive grains and the silicon carbide substrate.

Abstract: To provide a means capable of suppressing the generation of gelation at the time of or after the addition of a silane coupling agent in the production of a cationically modified silica including modifying a silica raw material with a silane coupling agent. The present invention is a method for producing a cationically modified silica, including: mixing a silica raw material having a negative zeta potential with a silane coupling agent having an amino group or a quaternary cationic group; and reacting the silica raw material with the silane coupling agent to obtain a cationically modified silica, in which the cationically modified silica satisfies the following relational expression (1): X<Y relational expression??(1) in the relational expression (1), X is a pH value at which an isoelectric point is shown in the cationically modified silica, and Y is a pH value of the cationically modified silica.

Abstract: Provided is a means capable of introducing a sufficient amount of a cationic group onto the surface of silica particles even in a case where a silica raw material having a high silica concentration is used while occurrence of gelation is suppressed at the time of or after addition of a silane coupling agent in production of a cationically modified silica dispersion including modifying raw silica using a silane coupling agent. Adding a silane coupling agent having a cationic group to a silica raw material in which a zeta potential shows a negative value, and causing the silica raw material to react with the silane coupling agent to obtain a cationically modified silica.

Abstract: This invention provides a polishing composition with which high-rate polishing is possible in an application where an object formed of a hard material is polished and also a method for producing a hard material, using the polishing composition. The polishing composition provided by this invention is characterized by that an abrasive formed of titanium diboride is dispersed in a dispersing medium. The hard material production method provided by this invention comprises a step of polishing a hard material surface with the polishing composition.

Abstract: Disclosed is a filtration method that extends filter life and achieves high filtration efficiency, and also abrasive slurry produced by the method. In this filtration method, a filter is decompression-treated in a solvent-filled sealed container before liquid is filtered by the filter, after which the filter is used for filtering.

Abstract: Disclosed is a filtration method that extends filter life and achieves high filtration efficiency, and also abrasive slurry produced by the method. In this filtration method, deaired solvent is passed through a filter before a non-deaired liquid is filtered by the filter, after which the filter is used for filtering.