Patents by Inventor Naoya Miyashita

Naoya Miyashita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11788188
    Abstract: There is provided a technique that includes: removing a deposit adhering to an inside of a process container by supplying a cleaning gas into the process container after performing a process of forming a film on a substrate in the process container, wherein the act of removing the deposit includes sequentially and repeatedly performing: a first process of supplying the cleaning gas into the process container until a predetermined first pressure is reached in the process container; a second process of stopping the supply of the cleaning gas and exhausting the cleaning gas and a reaction product generated by the cleaning gas remaining in the process container; and a third process of cooling an exhaust pipe that connects the process container and a vacuum pump, while maintaining a pressure inside the process container at a second pressure, which is lower than the first pressure, or lower.
    Type: Grant
    Filed: August 21, 2020
    Date of Patent: October 17, 2023
    Assignee: KOKUSAI ELECTRIC CORPORATION
    Inventors: Naoya Miyashita, Koei Kuribayashi, Tomoshi Taniyama
  • Publication number: 20230313371
    Abstract: There is provided a technique that includes: removing a deposit adhering to an inside of a process container by supplying a cleaning gas into the process container after performing a process of forming a film on a substrate in the process container, wherein the act of removing the deposit includes sequentially and repeatedly performing: a first process of supplying the cleaning gas into the process container until a predetermined first pressure is reached in the process container; a second process of stopping the supply of the cleaning gas and exhausting the cleaning gas and a reaction product generated by the cleaning gas remaining in the process container; and a third process of cooling an exhaust pipe that connects the process container and a vacuum pump, while maintaining a pressure inside the process container at a second pressure, which is lower than the first pressure, or lower.
    Type: Application
    Filed: May 24, 2023
    Publication date: October 5, 2023
    Applicant: Kokusai Electric Corporation
    Inventors: Naoya MIYASHITA, Koei KURIBAYASHI, Tomoshi TANIYAMA
  • Patent number: 11104997
    Abstract: Described herein is a technique capable of substantially cancelling out a machine difference of a pressure control valve. According to one aspect of the technique of the present disclosure, there is provided a substrate processing apparatus including: a sensor detecting a valve opening degree; a first control circuit outputting a valve opening degree control signal based on a valve opening degree value detected by the sensor and a deviation between a pressure of the process chamber and a target vacuum pressure value; a second control circuit outputting an electropneumatic control signal based on the valve opening degree control signal; and a span adjustment circuit adjusting the first or second control circuit so that an upper limit value of the valve opening degree is set to a predetermined full opening degree less than a physically defined full opening degree.
    Type: Grant
    Filed: September 4, 2019
    Date of Patent: August 31, 2021
    Assignee: Kokusai Electric Corporation
    Inventors: Naoya Miyashita, Tomoshi Taniyama
  • Patent number: 10903098
    Abstract: There is provided a technique that includes a first controller configured to acquire event data generated at a time of transferring a substrate and alarm data generated at a time of occurrence of a transfer error, a recorder configured to, while recording a transfer operation of the substrate as first image data, record the transfer operation of the substrate as second image data having a higher resolution than the first image data, a second controller configured to store the first image data in a first memory based on the event data, and store the second image data in a second memory based on the alarm data, and an operating controller configured to display at least the first image data and the second image data. The second controller displays both the first image data and the second image data on a same screen.
    Type: Grant
    Filed: July 30, 2019
    Date of Patent: January 26, 2021
    Assignee: KOKUSAI ELECTRIC CORPORATION
    Inventors: Akihiko Yoneda, Kazuhide Asai, Tetsuyuki Maeda, Naoya Miyashita, Nobuyuki Miyakawa, Tadashi Okazaki, Hideo Yanase
  • Publication number: 20200407845
    Abstract: There is provided a technique that includes: removing a deposit adhering to an inside of a process container by supplying a cleaning gas into the process container after performing a process of forming a film on a substrate in the process container, wherein the act of removing the deposit includes sequentially and repeatedly performing: a first process of supplying the cleaning gas into the process container until a predetermined first pressure is reached in the process container; a second process of stopping the supply of the cleaning gas and exhausting the cleaning gas and a reaction product generated by the cleaning gas remaining in the process container; and a third process of cooling an exhaust pipe that connects the process container and a vacuum pump, while maintaining a pressure inside the process container at a second pressure, which is lower than the first pressure, or lower.
    Type: Application
    Filed: August 21, 2020
    Publication date: December 31, 2020
    Applicant: KOKUSAI ELECTRIC CORPORATION
    Inventors: Naoya MIYASHITA, Koei KURIBAYASHI, Tomoshi TANIYAMA
  • Publication number: 20200123659
    Abstract: Described herein is a technique capable of substantially cancelling out a machine difference of a pressure control valve. According to one aspect of the technique of the present disclosure, there is provided a substrate processing apparatus including: a sensor detecting a valve opening degree; a first control circuit outputting a valve opening degree control signal based on a valve opening degree value detected by the sensor and a deviation between a pressure of the process chamber and a target vacuum pressure value; a second control circuit outputting an electropneumatic control signal based on the valve opening degree control signal; and a span adjustment circuit adjusting the first or second control circuit so that an upper limit value of the valve opening degree is set to a predetermined full opening degree less than a physically defined full opening degree.
    Type: Application
    Filed: September 4, 2019
    Publication date: April 23, 2020
    Inventors: Naoya MIYASHITA, Tomoshi TANIYAMA
  • Publication number: 20200043763
    Abstract: There is provided a technique that includes a first controller configured to acquire event data generated at a time of transferring a substrate and alarm data generated at a time of occurrence of a transfer error, a recorder configured to, while recording a transfer operation of the substrate as first image data, record the transfer operation of the substrate as second image data having a higher resolution than the first image data, a second controller configured to store the first image data in a first memory based on the event data, and store the second image data in a second memory based on the alarm data, and an operating controller configured to display at least the first image data and the second image data. The second controller displays both the first image data and the second image data on a same screen.
    Type: Application
    Filed: July 30, 2019
    Publication date: February 6, 2020
    Applicant: KOKUSAI ELECTRIC CORPORATION
    Inventors: Akihiko YONEDA, Kazuhide ASAI, Tetsuyuki MAEDA, Naoya MIYASHITA, Nobuyuki MIYAKAWA, Tadashi OKAZAKI, Hideo YANASE
  • Patent number: 10340164
    Abstract: Provided is a substrate processing apparatus capable of improving the workability of measuring a temperature-flat zone in a process furnace and the reliability of a temperature-flat length of a heater. The substrate processing apparatus includes a process chamber configured to process a substrate retained in a retainer loaded therein; a temperature measuring device configured to measure an inside temperature of the process chamber; a transfer device configured to transfer the substrate at least to the retainer; and a controller configured to control the transfer device and the temperature measuring device to move the transfer device to a predetermined position before the inside temperature of the process chamber is measured and to obtain the inside temperature by the temperature measuring device while vertically moving the transfer device with the temperature measuring device attached to the transfer device when the inside temperature of the process chamber is measured.
    Type: Grant
    Filed: November 21, 2014
    Date of Patent: July 2, 2019
    Assignee: Hitachi Kokusai Electric, Inc.
    Inventors: Akihito Watanabe, Naoya Miyashita, Katsumi Takashima, Shigeru Honda
  • Publication number: 20150099235
    Abstract: Provided is a substrate processing apparatus capable of improving the workability of measuring a temperature-flat zone in a process furnace and the reliability of a temperature-flat length of a heater. The substrate processing apparatus includes a process chamber configured to process a substrate retained in a retainer loaded therein; a temperature measuring device configured to measure an inside temperature of the process chamber; a transfer device configured to transfer the substrate at least to the retainer; and a controller configured to control the transfer device and the temperature measuring device to move the transfer device to a predetermined position before the inside temperature of the process chamber is measured and to obtain the inside temperature by the temperature measuring device while vertically moving the transfer device with the temperature measuring device attached to the transfer device when the inside temperature of the process chamber is measured.
    Type: Application
    Filed: November 21, 2014
    Publication date: April 9, 2015
    Inventors: Akihito WATANABE, Naoya MIYASHITA, Katsumi TAKASHIMA, Shigeru HONDA
  • Patent number: 5924747
    Abstract: When first and second coupling pieces are tightened in the axial direction thereof by turning a screw member, the second coupling piece is prevented from being turned together with the screw member, thereby enhancing sealing property, cleanliness and workability. A thrust bearing is interposed between a pressing surface of the screw member and the second coupling piece.
    Type: Grant
    Filed: December 24, 1997
    Date of Patent: July 20, 1999
    Assignee: Sanko Kogyo Co., Ltd.
    Inventor: Naoya Miyashita
  • Patent number: 4685707
    Abstract: A superfine finish piping joint has a metal C ring disposed between a couple of joint pieces, the piping joints being capable of properly tightening the metal C ring for thereby being usuable for piping to a clean room. The superfine finish piping joint includes, besides a couple of the first and second joint pieces, a box nut, a thrust bearing disposed between a base portion of second joint piece facing to the internal end surface of an box nut, and a cup-shaped retainer serving to mount balls and rings, etc., of the thrust bearing as a whole on the second joint piece, etc., at prescribed positions.
    Type: Grant
    Filed: March 21, 1986
    Date of Patent: August 11, 1987
    Assignee: Sanko Kogyo Kabushiki Kaisha
    Inventor: Naoya Miyashita