Patents by Inventor Naoya SHIMOJU

Naoya SHIMOJU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11441053
    Abstract: There are provided a composition for forming an adhesive film for imprinting having excellent adhesiveness and wettability, an adhesive film, a laminate, a method for producing a cured product pattern, and a method for manufacturing a circuit substrate. A composition for forming an adhesive film for imprinting contains a resin having a polymerizable group; and a solvent, in which the resin has at least one kind of a repeating unit derived from a polymerizable compound having a C log P value less than or equal to 0, and solubility of the resin in water at 25° C. is greater than or equal to 1 mass %, provided that the C log P value is a coefficient showing affinity of an organic compound with respect to water and 1-octanol.
    Type: Grant
    Filed: August 21, 2019
    Date of Patent: September 13, 2022
    Assignee: FUJIFILM Corporation
    Inventors: Naoya Shimoju, Akinori Shibuya, Yuichiro Goto
  • Patent number: 11401361
    Abstract: The curable composition for imprinting includes: a compound represented by the following Formula (1); a radically polymerizable compound other than the compound represented by Formula (1); and a photoradical polymerization initiator, in Formula (1), R1 and R2 each independently represent a hydrogen atom or an organic group having 1 to 8 carbon atoms and may be bonded to each other to form a ring, R3 represents a monovalent organic group, and R4 and R5 each independently represent a hydrogen atom or a monovalent organic group.
    Type: Grant
    Filed: January 23, 2020
    Date of Patent: August 2, 2022
    Assignee: FUJIFILM Corporation
    Inventors: Naoya Shimoju, Akinori Shibuya, Yuichiro Goto
  • Publication number: 20220204814
    Abstract: Provided are a composition for forming an adhesive film for imprinting, including a resin having a specific aromatic ring and a polymerizable functional group in a side chain, in which the specific aromatic ring is an unsubstituted aromatic ring, or an aromatic ring having one or more substituents, in which a formula weight of each of the one or more substituents is 1000 or less, and a proportion of a polymerizable functional group including a heterocyclic ring in the polymerizable functional group is less than 3 mol %; an adhesive film to which the composition for forming an adhesive film is applied; a laminate; a method for manufacturing a laminate; a pattern producing method; and a method for manufacturing a semiconductor element.
    Type: Application
    Filed: March 17, 2022
    Publication date: June 30, 2022
    Applicant: FUJIFILM Corporation
    Inventors: Naoya SHIMOJU, Akihiro HAKAMATA
  • Patent number: 11299653
    Abstract: There are provided a composition having excellent adhesiveness and wettability, an adhesive film, a laminate, a method for producing a cured product pattern, and a method for manufacturing a circuit substrate.
    Type: Grant
    Filed: October 10, 2019
    Date of Patent: April 12, 2022
    Assignee: FUJIFILM Corporation
    Inventors: Naoya Shimoju, Akinori Shibuya, Yuichiro Goto
  • Publication number: 20220009152
    Abstract: Provided are: a composition for forming an underlayer film in an imprinting method, which includes a high-molecular-weight compound having a polymerizable functional group and a monomer having a plurality of crosslinking functional groups capable of being bonded to the polymerizable functional group, and in which a Hansen solubility parameter distance, which is a difference between a Hansen solubility parameter of the high-molecular-weight compound and a Hansen solubility parameter of the monomer, is 5.
    Type: Application
    Filed: September 24, 2021
    Publication date: January 13, 2022
    Applicant: FUJIFILM Corporation
    Inventors: Akihiro HAKAMATA, Naoya SHIMOJU, Yuichiro GOTO
  • Publication number: 20220009153
    Abstract: Provided are: a composition for forming a pattern, which contains a polymerizable compound, a photopolymerization initiator, and a sensitizer containing two or more of at least one kind of atom selected from the group consisting of a nitrogen atom and a sulfur atom, in which a length of a specific atom chain from one atom to another atom among the two or more atoms is 2 or 3 in terms of the number of atoms; a kit to which the composition for forming a pattern is applied; a cured film; a laminate; a pattern producing method; and a method for manufacturing a semiconductor element.
    Type: Application
    Filed: September 24, 2021
    Publication date: January 13, 2022
    Applicant: FUJIFILM Corporation
    Inventors: Yuichiro GOTO, Naoya SHIMOJU, Akinori SHIBUYA, Akihiro HAKAMATA
  • Publication number: 20220002450
    Abstract: Provided are: a composition for forming a pattern for imprinting, which contains a polymerizable compound, a photopolymerization initiator, and an organic halogen compound containing at least one atom selected from the group consisting of a chlorine atom, a bromine atom, and an iodine atom, in which the organic halogen compound is a compound which is stable to light of a mercury lamp, and a content of the organic halogen compound is 0.001% to 1.0% by mass with respect to a total solid content in the composition for forming a pattern; a kit including the composition for forming a pattern; a pattern producing method; a pattern; and a method for manufacturing a semiconductor element.
    Type: Application
    Filed: September 16, 2021
    Publication date: January 6, 2022
    Applicant: FUJIFILM Corporation
    Inventors: Yuichiro GOTO, Naoya SHIMOJU
  • Publication number: 20210403630
    Abstract: Provided are: a composition for forming an underlayer film for imprinting, which contains a high-molecular-weight compound having a polymerizable group, a chelating agent, and a solvent, and a method for producing the same; a kit including the composition for forming an underlayer film; a pattern producing method using the composition for forming an underlayer film; and a method for manufacturing a semiconductor element, which includes the pattern producing method as a step.
    Type: Application
    Filed: September 13, 2021
    Publication date: December 30, 2021
    Applicant: FUJIFILM Corporation
    Inventors: Akihiro HAKAMATA, Yuichiro Goto, Naoya Shimoju
  • Publication number: 20210388134
    Abstract: Provided are: a curable composition for imprinting, which contains a compound C represented by Formula (C1) and a radical polymerization initiator; a kit including the curable composition; a pattern producing method using the curable composition; and a method for manufacturing a semiconductor element, which includes the pattern producing method as a step.
    Type: Application
    Filed: August 25, 2021
    Publication date: December 16, 2021
    Applicant: FUJIFILM Corporation
    Inventors: Naoya SHIMOJU, Akinori SHIBUYA
  • Publication number: 20210232049
    Abstract: Provided are a curable composition for imprinting including a polymerizable compound, a photopolymerization initiator, and a particulate metal which has a particle diameter of 1 nm or larger, as measured by a single particle ICP-MASS method, and includes at least one kind of iron, copper, titanium, or lead, in which a content of the particulate metal is 100 ppt by mass to 30 ppb by mass with respect to a solid content of the composition; a method for producing the curable composition for imprinting; a cured product using the curable composition for imprinting; a pattern producing method; and a method for manufacturing a semiconductor element.
    Type: Application
    Filed: March 24, 2021
    Publication date: July 29, 2021
    Applicant: FUJIFILM Corporation
    Inventors: Yuichiro GOTO, Naoya SHIMOJU
  • Publication number: 20210018833
    Abstract: A curable composition for imprinting according to an embodiment of the present invention includes a monofunctional polymerizable compound having the following structure, a photopolymerization initiator, and a release agent represented by the following Formula (I) or Formula (II). The monofunctional polymerizable compound has the following structure: a linear or branched alkyl group, or an alicyclic ring, an aromatic ring, or an aromatic heterocycle that is substituted with a linear or branched alkyl group. The release agent is represented by the following Formula (I) or Formula (II). A1-(B1)x1-(D1)y1-(E1)z1-F1??Formula (I), A2-(B2)x2-(D2)y2-(E2)z2-F2??Formula (II), A1 and A2 represent a linear aliphatic hydrocarbon group having 4 to 11 carbon atoms, D1 and D2 represent an alkylene oxide structure, F1 represents a polar functional group, and F2 represents a hydrogen atom, or a linear, branched, or cyclic aliphatic hydrocarbon group having 4 to 11 carbon atoms.
    Type: Application
    Filed: September 24, 2020
    Publication date: January 21, 2021
    Applicant: FUJIFILM Corporation
    Inventors: Yuichiro GOTO, Akihiro HAKAMATA, Naoya SHIMOJU
  • Publication number: 20200373167
    Abstract: Provided is a kit including a curable composition for imprinting, and a composition for forming an underlayer film for imprinting, in which the composition for forming an underlayer film for imprinting contains a polymer having a polymerizable functional group, and a compound in which the lower one of a boiling point and a thermal decomposition temperature is 480° C. or higher and ?HSP, which is a Hansen solubility parameter distance from a component with the highest content contained in the curable composition for imprinting, is 2.5 or less. Furthermore, the present invention relates to a composition for forming an underlayer film for imprinting, a pattern forming method, and a method for manufacturing a semiconductor device, which are related to the kit.
    Type: Application
    Filed: August 13, 2020
    Publication date: November 26, 2020
    Applicant: FUJIFILM Corporation
    Inventors: Yuichiro GOTO, Naoya SHIMOJU, Akihiro Hakamata
  • Publication number: 20200363718
    Abstract: Provided is a kit including a curable composition for imprinting which contains a polymerizable compound having an aromatic ring and a composition for forming an underlayer film for imprinting which contains a polymer and a solvent, in which the polymer contains at least one kind of specific constitutional unit and has a polymerizable group, a film formed of the composition for forming an underlayer film for imprinting is a solid film at 23° C., and a portion that has a continuous partial structure containing an aromatic ring which is included in the polymerizable compound and accounts for 60% by mass or more of the polymerizable compound is common to a continuous partial structure containing an aromatic ring which is included in a substituent R in a side chain in the polymer.
    Type: Application
    Filed: August 7, 2020
    Publication date: November 19, 2020
    Applicant: FUJIFILM Corporation
    Inventors: Naoya Shimoju, Akinori Shibuya, Yuichiro Goto, Akihiro Hakamata
  • Publication number: 20200216709
    Abstract: There are provided a composition for forming an underlayer film for imprints which imparts excellent uniformity in thickness of a film to be formed, has excellent wettability with respect to a curable composition for imprints, and imparts stability in a film to be formed; a kit; a curable composition for imprints; a laminate; a method for producing a laminate; a method for producing a cured product pattern; and a method for producing a circuit board. A composition for forming an underlayer film for imprints includes a polyfunctional (meth)acrylate that includes at least one aromatic ring or aromatic heterocyclic ring and has a viscosity of 11 to 600 mPa·s at 23° C. and a molecular weight of 200 or more, and a solvent.
    Type: Application
    Filed: March 23, 2020
    Publication date: July 9, 2020
    Applicant: FUJIFILM Corporation
    Inventors: Naoya SHIMOJU, Yuichiro GOTO
  • Publication number: 20200157267
    Abstract: The curable composition for imprinting includes: a compound represented by the following Formula (1); a radically polymerizable compound other than the compound represented by Formula (1); and a photoradical polymerization initiator, in Formula (1), R1 and R2 each independently represent a hydrogen atom or an organic group having 1 to 8 carbon atoms and may be bonded to each other to form a ring, R3 represents a monovalent organic group, and R4 and R5 each independently represent a hydrogen atom or a monovalent organic group.
    Type: Application
    Filed: January 23, 2020
    Publication date: May 21, 2020
    Applicant: FUJIFILM Corporation
    Inventors: Naoya SHIMOJU, Akinori Shibuya, Yuichiro Goto
  • Publication number: 20200109305
    Abstract: Provided are: a kit of a composition for forming an underlayer film for imprints and a curable composition for imprints, which is capable of forming a uniform underlayer film, while having excellent wettability; and a laminate, a method for producing a laminate, a method for producing a cured product pattern, and a method for producing a circuit board, each of which uses the above-mentioned kit. The present invention relates to a kit including a curable composition for imprints and a composition for forming an underlayer film for imprints, in which the composition for forming an underlayer film for imprints contains a solvent in a proportion of 99.0% by mass or more; the surface tension of the curable composition for imprints and the surface tension of the non-volatile component in the composition for forming an underlayer film for imprints satisfy a predetermined relationship; and the non-volatile component has a boiling point of higher than 300° C. and is liquid at 23° C.
    Type: Application
    Filed: December 11, 2019
    Publication date: April 9, 2020
    Applicant: FUJIFILM Corporation
    Inventors: Yuichiro GOTO, Naoya SHIMOJU
  • Patent number: 10564338
    Abstract: A polarizing plate, which includes at least a polarizer layer including an iodine-dyed polyvinyl alcohol film, and the polarizing plate including a compound with a bond dissociation energy E1 of less than or equal to 90.0 kcal/mol, a peroxide radical forming energy E2 of less than or equal to 0.0 kcal/mol, and a polyiodide ion I5? forming ability in an iodide compound-containing solution of less than or equal to 1.0.
    Type: Grant
    Filed: August 24, 2015
    Date of Patent: February 18, 2020
    Assignee: FUJIFILM CORPORATION
    Inventors: Shino Ohira, Mayumi Nojiri, Naoya Shimoju, Aiko Yoshida, Nobutaka Fukagawa
  • Publication number: 20200040222
    Abstract: There are provided a composition having excellent adhesiveness and wettability, an adhesive film, a laminate, a method for producing a cured product pattern, and a method for manufacturing a circuit substrate.
    Type: Application
    Filed: October 10, 2019
    Publication date: February 6, 2020
    Applicant: FUJIFILM Corporation
    Inventors: Naoya SHIMOJU, Akinori Shibuya, Yuichiro Goto
  • Patent number: 10551739
    Abstract: Provided are a resist composition capable of forming a pattern having excellent pattern collapse performance, particularly in the formation of an ultrafine pattern (for example, a pattern with a line width 50 nm or less) using the resist composition containing a resin (A) having a repeating unit (a) having an aromatic ring group and a repeating unit (b) having a silicon atom in a side chain, as well as a resist film, a pattern forming method, and a method for manufacturing an electronic device, each using the resist composition.
    Type: Grant
    Filed: March 20, 2018
    Date of Patent: February 4, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Akira Takada, Shuji Hirano, Naoya Shimoju, Toshiya Takahashi, Hidehiro Mochizuki
  • Publication number: 20190382623
    Abstract: There are provided a composition for forming an adhesive film for imprinting having excellent adhesiveness and wettability, an adhesive film, a laminate, a method for producing a cured product pattern, and a method for manufacturing a circuit substrate. A composition for forming an adhesive film for imprinting contains a resin having a polymerizable group; and a solvent, in which the resin has at least one kind of a repeating unit derived from a polymerizable compound having a C log P value less than or equal to 0, and solubility of the resin in water at 25° C. is greater than or equal to 1 mass %, provided that the C log P value is a coefficient showing affinity of an organic compound with respect to water and 1-octanol.
    Type: Application
    Filed: August 21, 2019
    Publication date: December 19, 2019
    Applicant: FUJIFILM Corporation
    Inventors: Naoya SHIMOJU, Akinori SHIBUYA, Yuichiro GOTO