Abstract: A flow rate verification unit that uses the pressure variation value per unit time of a pressure measurement value measured by a pressure gauge and a temperature measurement value measured by a thermometer in a state where a second shut-off valve is closed to calculate the volume between a flow-rate control valve and the second shut-off valve and verifies the flow rates of mass flow controllers one at a time, wherein a first verification side connection part attachably and detachably connected to an integrated gas unit is provided upstream from the pressure gauge and a serially connected verification gas input valve, verification side mass flow controller, and verification side flow rate control valve are provided in parallel with the second shut-off valve.

Abstract: A flow rate verification unit that uses the pressure variation value per unit time of a pressure measurement value measured by a pressure gauge and a temperature measurement value measured by a thermometer in a state where a second shut-off valve is closed to calculate the volume between a flow-rate control valve and the second shut-off valve and verifies the flow rates of mass flow controllers one at a time, wherein a first verification side connection part attachably and detachably connected to an integrated gas unit is provided upstream from the pressure gauge and a serially connected verification gas input valve, verification side mass flow controller, and verification side flow rate control valve are provided in parallel with the second shut-off valve.

Abstract: A gas flow monitoring system is provided in process gas lines each arranged to supply gas to a predetermined process chamber via a flow control device, the system being configured to measure lowering or rising of gas pressure before and after the flow control device to monitor a flow rate of the flow control device. The system includes a first flow monitoring unit placed upstream of the flow control device in a selected one of the process gas lines, a second flow monitoring unit placed in a discharge passage upstream of the process chamber, and a controller that constantly monitors the flow rate of the flow control device with the first flow monitoring unit and, when the first flow monitoring unit detects the flow-rate abnormality two or more times, commands the second flow monitoring unit to re-verify whether flow-rate abnormality is present or not in the flow control device.

Abstract: A gas flow monitoring system is provided in process gas lines each arranged to supply gas to a predetermined process chamber via a flow control device, the system being configured to measure lowering or rising of gas pressure before and after the flow control device to monitor a flow rate of the flow control device. The system includes a first flow monitoring unit placed upstream of the flow control device in a selected one of the process gas lines, a second flow monitoring unit placed in a discharge passage upstream of the process chamber, and a controller that constantly monitors the flow rate of the flow control device with the first flow monitoring unit and, when the first flow monitoring unit detects the flow-rate abnormality two or more times, commands the second flow monitoring unit to re-verify whether flow-rate abnormality is present or not in the flow control device.