Abstract: An analog meter reading system is applied to an analog meter provided with a scale and a pointer and reads a measured value of the analog meter. The analog meter reading system includes: a unique information acquisition unit that acquires unique information of the analog meter; an image acquisition unit that acquires an image of the analog meter for reading the measured value; a detection unit that detects a reference point on the scale and a pointer from the image; a rotation angle calculation unit that calculates a rotation angle of the pointer until a state in which the pointer points to the reference point changes to a state in which the pointer points to the measuring point based on the reference point and the pointer that are detected; and a measured value conversion unit that converts the rotation angle into the measured value using the unique information.

Abstract: A user can easily execute image processing from setting to data utilization without acquiring programming skills. An inspection setting device includes: a screen generation unit that generates a display screen displaying a palette region in which a plurality of tools including an imaging setting tool, a positioning setting tool, an inspection setting tool, and an output tool can be arranged and a work sheet region in which data related to the plurality of tools is referred to and calculated; and an input unit that receives selection of a tool arranged on the palette region and receives a setting related to input, reference, or calculation of data related to the selected tool via the work sheet region.

Abstract: A time synchronization system includes a master and slave devices connected to each other via a data bus and a signal line dedicated to transmission of a fixed-period signal. The master device transmits the fixed-period signal through the signal line regularly at a transmission period, and transmits start time information indicating a transmission start time at which transmission of the fixed-period signal is started and transmission period information indicating the transmission period for the fixed-period signal through the data bus. The slave device counts a number of times the fixed-period signal is received and calculates, as a current time in the master device, a transmission time at which the master device transmits the fixed-period signal based on the number of times the fixed-period signal is received. The slave device corrects the time to the calculated current time in the master device.

Abstract: A time synchronization system includes a master and slave devices connected to each other via a data bus and a signal line dedicated to transmission of a fixed-period signal. The master device transmits the fixed-period signal through the signal line regularly at a transmission period, and transmits start time information indicating a transmission start time at which transmission of the fixed-period signal is started and transmission period information indicating the transmission period for the fixed-period signal through the data bus. The slave device counts a number of times the fixed-period signal is received and calculates, as a current time in the master device, a transmission time at which the master device transmits the fixed-period signal based on the number of times the fixed-period signal is received. The slave device corrects the time to the calculated current time in the master device.

Abstract: A method for purifying a material, the method comprising: a step of preparing a solution comprising a solvent and at least one material selected from the group consisting of a compound represented by the following formula (1A) and a resin having a structure represented by the following formula (2A); and a step of purification in which the solution is passed through a filter: wherein, X represents an oxygen atom, a sulfur atom, a single bond, or non-crosslinked state; Ra represents a 2n-valent group having 1 to 40 carbon atoms or a single bond; each Rb independently represents one of various functional groups; each m is independently an integer of 0 to 9; n is an integer of 1 to 4; and each p is independently an integer of 0 to 2; provided that at least one Rb represents a group comprising one selected from a hydroxyl group and a thiol group, and all m cannot be 0 at the same time; wherein, X, Ra, Rb, n and p are the same as defined in the formula (1A); Rc represents a single bond or an

Abstract: A movement command to move an end effector to a plurality of predetermined positions is transmitted to a robot controller so as to change a relative position of a target, which becomes an imaging target, with respect to an imaging device. First coordinate values are acquired, the values being each of position coordinates of the end effector having moved in accordance with the movement command, and an image of the target is captured at each movement destination, to which the end effector has moved. Second coordinate values being position coordinates of the target are detected based on the image of the target captured at each movement destination, and a conversion rule between both of the coordinates is calculated based on the first coordinate values and the second coordinate values.

Abstract: There is provided an image processing apparatus, which are capable of controlling a motion of a robot with high accuracy without coding a complex robot motion control program point by point. First coordinate values being each of position coordinates of movement destinations of an end effector of a robot are acquired. Second coordinate values being position coordinates of a target are detected based on an image of the target captured at each of the movement destinations. Selections of a plurality of operations which a robot controller is made to execute are accepted out of a plurality of operations including at least an operation of moving the end effector to the first coordinate values or an operation of moving the end effector to the second coordinate values, to accept a setting of an execution sequence of the plurality of operations the selections of which have been accepted.

Abstract: The method according to the present invention is a method for purifying a compound represented by a specific formula (1) or a resin having a structure represented by a specific formula (2), the method including a step of bringing a solution (A) including an organic solvent optionally immiscible with water, and the compound or the resin into contact with an acidic aqueous solution.

Abstract: The material for forming an underlayer film for lithography of the present invention contains a compound represented by the following general formula (1). (in formula (1), each X independently represents an oxygen atom or a sulfur atom, R1 represents a single bond or a 2n-valent hydrocarbon group having 1 to 30 carbon atoms, the hydrocarbon group may have a cyclic hydrocarbon group, a double bond, a hetero atom or an aromatic group having 6 to 30 carbon atoms, and each R2 independently represents a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, or a hydroxyl group, provided that at least one R2 represents a hydroxyl group, each m is independently an integer of 1 to 4, n is an integer of 1 to 4, and p is 0 or 1.

Abstract: The material for forming an underlayer film for lithography of the present invention contains a compound having a structure represented by the following general formula (1). (in formula (1), each X independently represents an oxygen atom or a sulfur atom, R1 represents a single bond or a 2n-valent hydrocarbon group having 1 to 30 carbon atoms, the hydrocarbon group may have a cyclic hydrocarbon group, a double bond, a hetero atom or an aromatic group having 6 to 30 carbon atoms, R2 represents a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, or a hydroxyl group, m is an integer of 0 to 3, n is an integer of 1 to 4, p is 0 or 1, and q is an integer of 1 to 100.).

Abstract: The method according to the present invention is a method for purifying a compound represented by a specific formula (1) or a resin having a structure represented by a specific formula (2), the method including a step of bringing a solution (A) including an organic solvent optionally immiscible with water, and the compound or the resin into contact with an acidic aqueous solution.

Abstract: There is provided an image processing apparatus, which are capable of controlling a motion of a robot with high accuracy without coding a complex robot motion control program point by point. First coordinate values being each of position coordinates of movement destinations of an end effector of a robot are acquired. Second coordinate values being position coordinates of a target are detected based on an image of the target captured at each of the movement destinations. Selections of a plurality of operations which a robot controller is made to execute are accepted out of a plurality of operations including at least an operation of moving the end effector to the first coordinate values or an operation of moving the end effector to the second coordinate values, to accept a setting of an execution sequence of the plurality of operations the selections of which have been accepted.

Abstract: A movement command to move an end effector to a plurality of predetermined positions is transmitted to a robot controller so as to change a relative position of a target, which becomes an imaging target, with respect to an imaging device. First coordinate values are acquired, the values being each of position coordinates of the end effector having moved in accordance with the movement command, and an image of the target is captured at each movement destination, to which the end effector has moved. Second coordinate values being position coordinates of the target are detected based on the image of the target captured at each movement destination, and a conversion rule between both of the coordinates is calculated based on the first coordinate values and the second coordinate values.

Abstract: Material for forming an underlayer film for lithography, which has a high carbon concentration, a low oxygen concentration, a relatively high heat resistance and also a relatively high solvent solubility, and which can be applied to a wet process is disclosed. Material for forming an underlayer film for lithography contains a compound represented by general formula (1).

Abstract: The material for forming an underlayer film for lithography of the present invention contains a compound represented by the following general formula (1). (in formula (1), each X independently represents an oxygen atom or a sulfur atom, R1 represents a single bond or a 2n-valent hydrocarbon group having 1 to 30 carbon atoms, the hydrocarbon group may have a cyclic hydrocarbon group, a double bond, a hetero atom or an aromatic group having 6 to 30 carbon atoms, and each R2 independently represents a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, or a hydroxyl group, provided that at least one R2 represents a hydroxyl group, each m is independently an integer of 1 to 4, n is an integer of 1 to 4, and p is 0 or 1.

Abstract: The material for forming an underlayer film for lithography of the present invention contains a compound having a structure represented by the following general formula (1). (in formula (1), each X independently represents an oxygen atom or a sulfur atom, R1 represents a single bond or a 2n-valent hydrocarbon group having 1 to 30 carbon atoms, the hydrocarbon group may have a cyclic hydrocarbon group, a double bond, a hetero atom or an aromatic group having 6 to 30 carbon atoms, R2 represents a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, or a hydroxyl group, m is an integer of 0 to 3, n is an integer of 1 to 4, p is 0 or 1, and q is an integer of 1 to 100.

Abstract: Provided are a naphthalene formaldehyde resin obtained by reacting a compound (A) represented by formula (1) and formaldehyde (B) in a molar ratio, (A):(B), of 1:1 to 1:20 in the presence of an acidic catalyst, and a deacetalized naphthalene formaldehyde resin and a modified naphthalene formaldehyde resin derived therefrom.

Abstract: An epoxy resin obtained through the following steps (a) to (d): (a): a step of reacting a compound represented by formula (1) and/or (2) with formaldehyde in the presence of a catalyst to thereby provide an aromatic hydrocarbon-formaldehyde resin; (b): a step of treating the aromatic hydrocarbon-formaldehyde resin obtained in the step (a) with an acidic catalyst and water to thereby provide an acid-treated resin; (c): a step of treating the acid-treated resin obtained in the step (b) with an acidic catalyst and a compound represented by formula (3) to thereby provide a modified resin; and (d): a step of reacting the modified resin obtained in the step (c) with epihalohydrin to thereby provide an epoxy resin.

Abstract: Inputs of a plurality of images constituting a group of images of items regarded as non-defective items are previously accepted and stored, and a defect threshold for detecting a defective portion of an inspection object is set based on the plurality of stored images. A defect amount to be compared with a determination threshold for making a non-defective/defective determination on the inspection object is calculated with respect to each of the plurality of stored images based on the set defective threshold, and whether or not each of the calculated defect amounts is an outlier is tested by use of at least one of a parametric technique and a non-parametric technique. Outlier information for specifying an image whose defect amount has been tested to be the outlier is displayed and outputted.

Abstract: There is provided a novel phenolic resin which can be used as a coating agent or a resist resin for a semiconductor, which has a high carbon concentration and a low oxygen concentration in the resin, which has a relatively high heat resistance and also a relatively high solvent solubility, and which can be applied to a wet process. There are also provided a material useful for forming a novel photoresist underlayer film which has a relatively high solvent solubility, which can be applied to a wet process, and which is excellent in etching resistance as an underlayer film for a multilayer resist, an underlayer film formed using the same, and a pattern forming method using the same. A resin of the present invention is obtained by reacting a compound having a specified structure and an aldehyde having a specified structure in the presence of an acidic catalyst. In addition, a material for forming an underlayer film for lithography of the present invention includes at least the resin and an organic solvent.