Patents by Inventor Naoyuki Echigo

Naoyuki Echigo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7348555
    Abstract: An electron beam irradiation apparatus includes a turn-transfer mechanism; a turn irradiation chamber; an electron beam irradiation section; a replacement room configured to bring a target into and out of the turn irradiation chamber; an outer irradiation target holding table configured to form a part of the replacement room, and including an X-ray shielding mechanism, an airtightness maintaining mechanism, a target holding mechanism; an inner irradiation target holding table configured to form a part of the replacement room, and including an X-ray shielding mechanism, an airtightness maintaining mechanism, and a target holding mechanism, the inner irradiation target holding table being supported by the turn-transfer mechanism; a turning mechanism configured to drive the turn-transfer mechanism; and an elevator mechanism configured to move the turn-transfer mechanism, which supports the inner irradiation target holding table, up and down.
    Type: Grant
    Filed: January 4, 2005
    Date of Patent: March 25, 2008
    Assignee: TDK Corporation
    Inventors: Mamoru Usami, Kazushi Tanaka, Yukio Kaneko, Naoyuki Echigo, Hiroshi Tominaga, Akihiko Kizaki, Kunihiko Ozaki
  • Patent number: 7282726
    Abstract: An electron beam irradiation apparatus includes a turn-transfer mechanism; a turn-transfer chamber; an electron beam irradiation section; a replacement room configured to bring a target into and out of the turn-transfer chamber; an outer irradiation target holding table configured to form a part of the replacement room, and including an X-ray shielding mechanism, an airtightness maintaining mechanism, and a target holding mechanism; an inner irradiation target holding table, configured to form a part of the replacement room, and including an X-ray shielding mechanism, an airtightness maintaining mechanism, and a target holding mechanism, the inner irradiation target holding table being supported by the turn-transfer mechanism; a turning mechanism configured to turn the turn-transfer mechanism and an elevator mechanism configured to move the turn-transfer mechanism up and down; and a rotation mechanism disposed at the electron beam irradiation section and configured to rotate the target.
    Type: Grant
    Filed: January 4, 2005
    Date of Patent: October 16, 2007
    Assignee: TDK Corporation
    Inventors: Mamoru Usami, Kazushi Tanaka, Yukio Kaneko, Naoyuki Echigo, Akihiko Kizaki, Hiroshi Tominaga, Kunihiko Ozaki
  • Publication number: 20060163499
    Abstract: An electron beam irradiation apparatus includes an electron beam emission section having an electron beam irradiating tube that emits an electron beam; an electron beam irradiation section for irradiating the emitted electron beam to a target; a transfer mechanism for transferring the target to the electron beam irradiation section; a rotation mechanism for rotating the target on its own axis when irradiating the electron beam; and a linear movement mechanism for generating a relative linear movement such that the electron beam irradiating tube passes right above the target, between the target and the electron beam irradiating tube, when irradiating the electron beam. The linear movement mechanism generates a relative linear movement such that the electron beam irradiating tube goes from an end portion of the target toward the center of the target and turns back before the center of the electron beam emitting portion of the electron beam irradiating tube reaches the center of the target.
    Type: Application
    Filed: January 24, 2006
    Publication date: July 27, 2006
    Applicants: Toyo Ink Manufacturing Co., Ltd., TDK Corporation
    Inventors: Naoyuki Echigo, Yo Marui, Yoshihiro Fuse, Mamoru Usami, Kazushi Tanaka, Minao Himeno, Yukio Kaneko
  • Publication number: 20050180877
    Abstract: An electron beam irradiation apparatus includes a turn-transfer mechanism; a turn-transfer chamber; an electron beam irradiation section; a replacement room configured to bring a target into and out of the turn-transfer chamber; an outer irradiation target holding table configured to form a part of the replacement room, and including an X-ray shielding mechanism, an airtightness maintaining mechanism, and a target holding mechanism; an inner irradiation target holding table, configured to form a part of the replacement room, and including an X-ray shielding mechanism, an airtightness maintaining mechanism, and a target holding mechanism, the inner irradiation target holding table being supported by the turn-transfer mechanism; a turning mechanism configured to turn the turn-transfer mechanism and an elevator mechanism configured to move the turn-transfer mechanism up and down; and a rotation mechanism disposed at the electron beam irradiation section and configured to rotate the target.
    Type: Application
    Filed: January 4, 2005
    Publication date: August 18, 2005
    Applicants: Toyo Ink Mfg., Co., Ltd., TDK Corporation
    Inventors: Mamoru Usami, Kazushi Tanaka, Yukio Kaneko, Naoyuki Echigo, Akihiko Kizaki, Hiroshi Tominaga, Kunihiko Ozaki
  • Publication number: 20050173654
    Abstract: An electron beam irradiation apparatus includes a turn-transfer mechanism; a turn irradiation chamber; an electron beam irradiation section; a replacement room configured to bring a target into and out of the turn irradiation chamber; an outer irradiation target holding table configured to form a part of the replacement room, and including an X-ray shielding mechanism, an airtightness maintaining mechanism, a target holding mechanism; an inner irradiation target holding table configured to form a part of the replacement room, and including an X-ray shielding mechanism, an airtightness maintaining mechanism, and a target holding mechanism, the inner irradiation target holding table being supported by the turn-transfer mechanism; a turning mechanism configured to drive the turn-transfer mechanism; and an elevator mechanism configured to move the turn-transfer mechanism, which supports the inner irradiation target holding table, up and down.
    Type: Application
    Filed: January 4, 2005
    Publication date: August 11, 2005
    Applicants: Toyo Ink Manufacturing Co., Ltd., TDK Corporation
    Inventors: Mamoru Usami, Kazushi Tanaka, Yukio Kaneko, Naoyuki Echigo, Hiroshi Tominaga, Akihiko Kizaki, Kunihiko Ozaki
  • Patent number: 5309253
    Abstract: A picture element conversion system consists of a simple electric circuit for reducing or enlarging an image at high quality. The system includes a cumulative adding unit for cumulatively adding a multiplying factor, in synchronization with clock signals, and outputting the added data and a carry signal. A contiguous picture element output unit temporarily holds a picture element data array along one of two scanning directions and outputs at least two contiguous picture element data. A typical value calculation unit divides a section defined by the contiguous picture element data into sub-sections and obtains typical values corresponding to each sub-section from the picture element data output from the contiguous picture element output unit.
    Type: Grant
    Filed: March 29, 1991
    Date of Patent: May 3, 1994
    Assignee: Seiko Instruments Inc.
    Inventors: Toru Ariga, Naoyuki Echigo
  • Patent number: 4306170
    Abstract: An AT-cut quartz resonator is disclosed, wherein the length l, the width w and the thickness t of the quartz crystal plate are respectively chosen in the directions of an electrical axis (X-axis), an optical axis (Z'-axis) and a mechanical axis (Y'-axis), the width-to-thickness ratio w/t is chosen in the range of 2.0 to 2.8 and the length-to-thickness ratio l/t is chosen less than 25. Consequently, an AT-cut quartz resonator of miniature size having high Q-values of the major mode and excellent frequency-temperature characteristics of the vibration frequency is realized.
    Type: Grant
    Filed: August 27, 1979
    Date of Patent: December 15, 1981
    Assignee: Kabushiki Kaisha Daini Seikosha
    Inventors: Shunichi Motte, Naoyuki Echigo, Shiro Yamashita, Tsuneo Kuwabara, Kunihiro Takahashi
  • Patent number: 4247797
    Abstract: A rectangular AT-cut quartz resonator comprising a quartz crystal plate rotated about 35.degree. around the X-axis, has dimensional ratios w/t and l/t respectively in the range of 3.1 to 3.7 and 14.5 to 16.2, where the length l, width w and thickness t are respectively along the X-axis, Z-axis, and Y-axis.
    Type: Grant
    Filed: April 25, 1979
    Date of Patent: January 27, 1981
    Assignee: Kabushiki Kaisha Daini Seikosha
    Inventors: Naoyuki Echigo, Shiro Yamashita, Tsuneo Kuwabara, Kunihiro Takahashi, Shunichi Motte