Abstract: A failure determining apparatus for a gas-insulated electrical appliance where the appliance is a cylindrical metal container with a charged conductor, insulating gas, and a plurality of insulating spaces inside for supporting the conductor and partitioning the container. The failure determining apparatus has a high-speed developing sensor which detects a high-speed phenomenon caused by a failure within the gas sections; a first failure determining circuit which determines the presence of a failure from an output of the high-speed developing sensor; a low-speed developing sensor which detects a low-speed phenomenon caused by a failure within the gas sections; a second failure determining circuit which determines the presence of a failure from an output of the low-speed developing sensor; and an arithmetic control circuit which identifies a gas section of the metal container in which a failure occurs from an output of the first and second failure determining circuits.

Abstract: A failure determining apparatus of a gas-insulated electrical appliance determining a failure, having a cylindrical metal container, a charged conductor housed in the metal container filled with an insulating gas, and a plurality of insulating spaces insulation-supporting the charged conductor from the metal container and partitioning the interior of the metal container into gas sections, comprising a high-speed developing sensor which detects a high-speed phenomenon caused by a failure such as a ground-fault or a short-circuit within the gas sections; a first failure determining circuit which determines the presence of a failure from an output of the high-speed developing sensor; a low-speed developing sensor which detects a low-speed phenomenon caused by a failure such as a ground-fault or a short-circuit within the gas sections; a second failure determining circuit which determines the presence of a failure from an output of the low-speed developing sensor; and an arithmetic control circuit which identifie

Abstract: A thin film forming apparatus which utilizes cluster ion beam deposition to form thin films on a substrate. In one embodiment, the electrons which ionize the vapor clusters are generated by a cathode which is located inside the corresponding anode. The cathode serves not only as a source of electrodes but also as a means for heating the crucible containing the substance to be deposited. In another embodiment, an electron emitter located at a position remote from the vapor flow in the apparatus is utilized as the source of electrons to form the ionized clusters.