Patents by Inventor Naoyuki KOISO

Naoyuki KOISO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10988494
    Abstract: To provide europium complexes having high photostability.
    Type: Grant
    Filed: November 27, 2018
    Date of Patent: April 27, 2021
    Assignees: TOSOH CORPORATION, SAGAMI CHEMICAL RESEARCH INSTITUTE
    Inventors: Keisuke Araki, Hiroya Honda, Naoyuki Koiso, Ryo Nakagame, Fumiaki Yoshitomi, Kohei Iwanaga, Taishi Furukawa
  • Publication number: 20200354389
    Abstract: To provide europium complexes having high photostability.
    Type: Application
    Filed: November 27, 2018
    Publication date: November 12, 2020
    Inventors: Keisuke ARAKI, Hiroya HONDA, Naoyuki KOISO, Ryo NAKAGAME, Fumiaki YOSHITOMI, Kohei IWANAGA, Taishi FURUKAWA
  • Patent number: 10336782
    Abstract: Provided is a cobalt complex which is useful for the production of a cobalt-containing thin film under conditions where no oxidizing gas is used. A cobalt complex represented by general formula (1) (wherein R1 represents a silyloxy group represented by general formula (2) (wherein R6, R7 and R8 independently represent an alkyl group having 1 to 6 carbon atoms); R2 represents a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a silyloxy group represented by general formula (2); R3, R4 and R5 independently represent a hydrogen atom or an alkyl group having 1 to 6 carbon atoms; and L represents a diene having 4 to 10 carbon atoms) is used.
    Type: Grant
    Filed: December 12, 2016
    Date of Patent: July 2, 2019
    Assignee: SAGAMI CHEMICAL RESEARCH INSTITUTE
    Inventors: Naoyuki Koiso, Yuki Yamamoto, Hiroyuki Oike, Teppei Hayakawa, Taishi Furukawa, Ken-ichi Tada
  • Publication number: 20180362568
    Abstract: Provided is a cobalt complex which is useful for the production of a cobalt-containing thin film under conditions where no oxidizing gas is used. A cobalt complex represented by general formula (1) (wherein R1 represents a silyloxy group represented by general formula (2) (wherein R6, R7 and R8 independently represent an alkyl group having 1 to 6 carbon atoms); R2 represents a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a silyloxy group represented by general formula (2); R3, R4 and R5 independently represent a hydrogen atom or an alkyl group having 1 to 6 carbon atoms; and L represents a diene having 4 to 10 carbon atoms) is used.
    Type: Application
    Filed: December 12, 2016
    Publication date: December 20, 2018
    Inventors: Naoyuki KOISO, Yuki YAMAMOTO, Hiroyuki OIKE, Teppei HAYAKAWA, Taishi FURUKAWA, Ken-ichi TADA