Abstract: A vacuum processing apparatus includes a discharge chamber with a ridge waveguide having an exhaust-side ridge electrode and a substrate-side ridge electrode between which a plasma is formed; a pair of converters, which convert high-frequency power into TE mode, which represents the basic transmission mode of rectangular waveguides, for transmission to the discharge chamber, and form a plasma between the exhaust-side ridge electrode and the substrate-side ridge electrode; a uniform heating temperature controller, which is disposed on the outer surface of the substrate-side ridge electrode and heats the electrode uniformly; and a heat-absorbing temperature control unit, which is disposed on the outer surface of the exhaust-side ridge electrode and controls thermal flux through the thickness direction of a substrate undergoing plasma processing. The substrate is disposed between the exhaust-side ridge electrode and the substrate-side ridge electrode, and subjected to plasma processing.

Abstract: A discharge electrode, a thin-film deposition apparatus, and a solar cell fabrication method, which suppress the generation of a film thickness distribution and a film quality distribution, are provided. The discharge electrode includes two lateral structures 20 that are substantially parallel to each other and extend in an X direction; and a plurality of longitudinal structures 21a that are provided between the two lateral structures, are substantially parallel to each other, and extend in a Y direction substantially orthogonal to the X direction. The longitudinal structures 21a each include an electrode main body 35 whose one end 35a is connected to one of the lateral structures 20 and whose the other end 35b is connected to the other lateral structure 20; a gas pipe 41 disposed in a gas-pipe accommodating space 36; and a porous body 40. An opening 38 opens to a substrate 8 and is covered with the porous body 40. A gas diffusion path 37 connects the gas-pipe accommodating space 36 and the opening 38.

Abstract: In a tire uniformity machine in which a tire is mounted between upper and lower spindles via upper and lower rims, a rim holding apparatus 10 is composed of a parallel spindle 1 which is in parallel with the axis of tire uniformity machine, a taper collet 2 formed with an inner hole engaging concentrically with the parallel spindle 1 at the center portion thereof and a taper surface at the outer peripheral portion thereof, a rim formed with a taper surface engaging with the taper surface of the taper collet 2 at the inner peripheral portion thereof, a rim clamping device 4 which holds the rim 3 and is mounted so that the parallel spindle 1 is capable of being moved in the axial direction, and a fixing device 5 for determining the axial position of the rim clamping device 4. Thereby, there is provided a highly accurate tire uniformity machine in which (1) the change of rim width and the fitting/removal of rim can be performed easily, and (2) the runout of rim can be decreased to 0.025 mm (standard) or less.

Abstract: In a tire uniformity machine in which a tire is mounted between upper and lower spindles via upper and lower rims, a rim holding apparatus 10 is composed of a parallel spindle 1 which is in parallel with the axis of tire uniformity machine, a taper collet 2 formed with an inner hole engaging concentrically with the parallel spindle 1 at the center portion thereof and a taper surface at the outer peripheral portion thereof, a rim formed with a taper surface engaging with the taper surface of the taper collet 2 at the inner peripheral portion thereof, a rim clamping device 4 which holds the rim 3 and is mounted so that the parallel spindle 1 is capable of being moved in the axial direction, and a fixing device 5 for determining the axial position of the rim clamping device 4. Thereby, there is provided a highly accurate tire uniformity machine in which (1) the change of rim width and the fitting/removal of rim can be performed easily, and (2) the runout of rim can be decreased to 0.025 mm (standard) or less.

Abstract: An improved automatic rim exchanger for use in a tire uniformity machine includes an upper spindle adapted to be rotated about the same axis as an axis of a tire, a fitting portion provided at the bottom of the upper spindle and associated with a chuck for detachably supporting upper rim structure of an upper rim holding member and upper rim, a lower spindle associated with a lock mechanism, which spindle is rotatably disposed on a lower spindle assembly mounted on an elevator member, has lower rim structure of a lower rim holding member and a lower rim detachably fitted therein, and is raised and lowered in the axial direction on the same axis, a jointly movable support member projecting from the lower rim means and adapted to be detachably fitted in a holding hole of the upper rim structure for supporting the upper rim structure, and a conveyor for supporting the vertically fitted upper and lower rim structure to feed and eject them.