Abstract: A resin molded product, a laminate, and a decorative sheet having high weatherability. A decorative sheet includes a resin molded product as a protective layer, and the resin molded product includes an ultraviolet absorber having pKa of ?5.5 or more and ?4.5 or less when irradiated with light, and a photostabilizer having pKa of 3.0 or more and 7.0 or less. The added amount of each of the ultraviolet absorber and the photostabilizer is 3.0 parts by mass or less per 100 parts by mass of the resin.

Abstract: A decorative sheet including a substrate layer, and one or more layers of at least one of a transparent resin layer and a top coat layer provided on one surface of the substrate layer, the one or more layers being provided as a front surface layer, wherein at least one layer of the transparent resin layer and the top coat layer contains a radical scavenger, and the radical scavenger is contained in a form of radical scavenger vesicles, which encapsulate the radical scavenger within an outer membrane.

Abstract: Provided is an antireflection film obtained by laminating, in succession, a transparent substrate, a first layer, and a second layer having a lower refractive index than the refractive index of the first layer. The first layer is obtained by curing a film containing an ionizing radiation-curable material, a quaternary ammonium salt material, a leveling agent, and a solvent, and has a structure wherein a middle layer, hard coating layer and recoating layer are laminated in succession from the transparent substrate side. The recoating layer does not contain a quaternary ammonium salt. The hard coating layer contains a quaternary ammonium salt, and the concentration of the quaternary ammonium salt in the hard coating layer gradually increases from the middle layer side to the recoating layer side.

Abstract: A resin molded product, a laminate, and a decorative sheet having high weatherability. A decorative sheet includes a resin molded product as a protective layer, and the resin molded product includes an ultraviolet absorber having pKa of ?5.5 or more and ?4.5 or less when irradiated with light, and a photostabilizer having pKa of 3.0 or more and 7.0 or less. The added amount of each of the ultraviolet absorber and the photostabilizer is 3.0 parts by mass or less per 100 parts by mass of the resin.

Abstract: A decorative sheet including a substrate layer, and one or more layers of at least one of a transparent resin layer and a top coat layer provided on one surface of the substrate layer, the one or more layers being provided as a front surface layer, wherein at least one layer of the transparent resin layer and the top coat layer contains a radical scavenger, and the radical scavenger is contained in a form of radical scavenger vesicles, which encapsulate the radical scavenger within an outer membrane.

Abstract: An anti-reflection film is provided having excellent optical property, excellent excoriation resistance, and antistatic function at low production costs. The anti-reflection film includes a localized layer and a low refractive index layer that are stacked in this order on at least one surface of a transparent substrate. The localized layer is stacked with an intermediate layer, a hard coat layer, an antistatic layer containing a conductive material, and a leveling layer containing a leveling material in this order, which are localized, at least from the side of the transparent substrate. The leveling material contains at least a fluorocompound or a compound which has a siloxane bond.

Abstract: An anti-reflection film with low production costs, excellent anti-reflection performance or excellent optical properties free from interference variation, high abrasion resistance, and antistatic function to prevent dust adhesion is demanded. In the present invention, the problem to be solved is to provide an anti-reflection film having low production costs, excellent optical property and excellent abrasion resistance and antistatic function. The present invention provides an anti-reflection film in which a localized layer and a low refractive index layer are laminated in this order on at least one surface of a transparent base, and the localized layer is constituted to have an intermediate layer, a hard coat layer, an antistatic layer containing a conductive material and a leveling layer containing a leveling material that are laminated as localized in order from at least the side of the transparent base.

Abstract: A photoelectrode for dye-sensitized solar cells of the present invention includes a light-transmitting substrate including a transparent electroconductive layer formed on a light-transmitting base; an adhesion layer formed on the transparent electroconductive layer, the adhesion layer being configured of an electroconductive portion formed of electroconductive particles and a coating layer formed by applying metal alkoxide thereon to cover the electroconductive particles; and a photoelectric conversion layer formed on the adhesion layer by using a photoelectric conversion material in which a sensitizing dye is supported on a functional semiconductor.

Abstract: A counter electrode for a dye sensitized solar cell (20 ) includes a conductive layer (21 ); and a contact preventing layer (23 ) which is formed of an insulating substance, and is formed on one surface of the conductive layer (21 ).

Abstract: A photoelectrode for a dye-sensitized solar cell includes, a sensitizer supported in a functional semiconductor layer of a photoelectrode structure provided with the functional semiconductor layer on a transparent conductive layer of a translucent substrate made by forming the transparent conductive layer on a plastic translucent support, in which the functional semiconductor layer includes a roll-pressed layer which is being in contact with the transparent conductive layer and roll-pressing traces extending in parallel with a roll-pressing treatment direction on a surface of the roll-pressed layer, and a surface roughness Ra in a first direction which is in parallel with the roll-pressing treatment direction is smaller than a surface roughness Ra in a second direction which is orthogonal to the first direction on a surface of the functional semiconductor layer.

Abstract: A dye-sensitized solar cell includes, a semiconductor layer holding a photosensitizing dye, an electrolyte layer and a pair of electrodes, wherein the photosensitizing dye includes a dye A having a carboxyl group or a phosphono group as a fixing group with the semiconductor layer, and a dye B having a nitrogen-containing aromatic heterocyclic compound as a fixing group with the semiconductor layer.

Abstract: Provided is an antireflection film obtained by laminating, in succession, a transparent substrate, a first layer, and a second layer having a lower refractive index than the refractive index of the first layer. The first layer is obtained by curing a film containing an ionizing radiation-curable material, a quaternary ammonium salt material, a leveling agent, and a solvent, and has a structure wherein a middle layer, hard coating layer and recoating layer are laminated in succession from the transparent substrate side. The recoating layer does not contain a quaternary ammonium salt. The hard coating layer contains a quaternary ammonium salt, and the concentration of the quaternary ammonium salt in the hard coating layer gradually increases from the middle layer side to the recoating layer side.

Abstract: The present invention provides an anti-reflection film which provides not only sufficient anti-reflection properties and antistatic properties but also excellent contrast in a bright place and excellent contrast in a dark place especially applied on a surface of a transmissive LCD. The anti-reflection film has an antistatic hard coat layer and a low refractive index layer in order on at least one surface of a transparent substrate, average luminous reflectance in the range of 0.5-1.5% on a surface of the low refractive index layer side, haze equal to or less than 0.5%, parallel light transmittance in the range of 94.0-96.5%, and an absorption loss in average luminous transmittance in the range of 0.5-3.0%.

Abstract: The present invention provides an anti-reflection film having excellent optical property, excellent excoriation resistance, and antistatic function at low production costs. The present invention includes an anti-reflection film in which a localized layer and a low refractive index layer are stacked in this order on at least one surface of a transparent substrate, the localized layer is stacked with an intermediate layer, a hard coat layer, an antistatic layer containing a conductive material, and a leveling layer containing a leveling material in this order, which are localized, at least from the side of the transparent substrate, and the leveling material contains at least a fluorocompound or a compound which has a siloxane bond.

Abstract: An anti-reflection film with low production costs, excellent anti-reflection performance or excellent optical properties free from interference variation, high abrasion resistance, and antistatic function to prevent dust adhesion is demanded. In the present invention, the problem to be solved is to provide an anti-reflection film having low production costs, excellent optical property and excellent abrasion resistance and antistatic function. The present invention provides an anti-reflection film in which a localized layer and a low refractive index layer are laminated in this order on at least one surface of a transparent base, and the localized layer is constituted to have an intermediate layer, a hard coat layer, an antistatic layer containing a conductive material and a leveling layer containing a leveling material that are laminated as localized in order from at least the side of the transparent base.

Abstract: The present invention provides an anti-reflection film which provides not only sufficient anti-reflection properties and antistatic properties but also excellent contrast in a bright place and excellent contrast in a dark place especially applied on a surface of a transmissive LCD. The anti-reflection film has an antistatic hard coat layer and a low refractive index layer in order on at least one surface of a transparent substrate, average luminous reflectance in the range of 0.5-1.5% on a surface of the low refractive index layer side, haze equal to or less than 0.5%, parallel light transmittance in the range of 94.0-96.5%, and an absorption loss in average luminous transmittance in the range of 0.5-3.0%.

Abstract: The present invention provides an antireflection film which has sufficient antireflection properties and antistatic properties, a high level of light transmittance and no interference fringe at a low cost. It is a feature of the antireflection film of the present invention that a hard coat layer and an antireflection layer is formed on a transparent substrate, a conductive polymer is included in the hard coat layer, a light reflectance on the low refractive index layer is in the range of 0.5-1.5%, a surface resistance of the low refractive index layer is less than 1×1010 [?/cm2]. In addition, it is also a feature of the antireflection film of the present invention that conductive metal oxide particles are included in the hard coat layer and a surface resistance of the low refractive index layer after the antireflection film is kept in a light resistance testing instrument employing an ultraviolet carbon arc lamp according to JIS B 7751 for 500 hours is less than (or equal to) 1×1010 [?/cm2].