Patents by Inventor Nariaki Kurabayashi

Nariaki Kurabayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6602643
    Abstract: An ultraviolet-curable resin composition comprising a phosphorus atom-containing photopolymerizable compound and a carboxyl group-containing photopolymerizable compound and exhibiting surface tension at 25° C. in the range of 30 to 50 mN/m. Preferably the composition comprises (a) a compound having one or more (meth)acryloyl groups in its molecule and a phosphorus atom, (b) a compound having at least one carboxyl group and one (meth)acryloyl group in its molecule, (c) a compound having one or more (meth)acryloyl groups in its molecule, (d) a leveling agent, and (e) a photoinitiator. The ultraviolet-curable resin composition is useful as a protective material for etching, particularly as a back-coating material in the production of a shadow mask.
    Type: Grant
    Filed: March 22, 2002
    Date of Patent: August 5, 2003
    Assignee: Taiyo Ink Manufacturing Co., Ltd.
    Inventors: Masaru Nikaidou, Sachiko Hirahara, Nariaki Kurabayashi
  • Publication number: 20020146629
    Abstract: An ultraviolet-curable resin composition comprises a phosphorus atom-containing photopolymerizable compound and a carboxyl group-containing photopolymerizable compound and exhibits the surface tension at 25° C. in the range of 30 to 50 mN/m. Preferably the composition comprises (a) a compound having one or more (meth)acryloyl groups in its molecule and a phosphorus atom, (b) a compound having at least one carboxyl group and one (meth)acryloyl group in its molecule, (c) a compound having one or more (meth)acryloyl groups in its molecule, (d) a leveling agent, and (e) a photoinitiator. The ultraviolet-curable resin composition is useful as a protective material for etching, particularly as a back-coating material in the production of a shadow mask.
    Type: Application
    Filed: March 22, 2002
    Publication date: October 10, 2002
    Inventors: Masaru Nikaidou, Sachiko Hirahara, Nariaki Kurabayashi
  • Patent number: 5753722
    Abstract: A photocurable and thermosetting matte liquid resist composition developable with an aqueous alkali solution is disclosed. The composition comprises in combination (A) a photosensitive prepolymer having a carboxyl group in combination with at least two ethylenically unsaturated bonds in the molecular unit thereof, (B) a photopolymerization initiator, (C) a diluent, (D) an epoxy compound having at least two epoxy groups in the molecular unit thereof, and further (E) a finely pulverized aluminum silicate matting agent in combination with (F) a filler precipitation preventing agent capable of effective thixotropic adjustment in the composition. The composition may further comprise (G) an epoxy resin curing agent. The composition can be advantageously used for the formation of a solder resist on a printed circuit board.
    Type: Grant
    Filed: December 10, 1996
    Date of Patent: May 19, 1998
    Assignee: Taiyo Ink Manufacturing Co., Ltd.
    Inventors: Gen Itokawa, Koji Kurihara, Nariaki Kurabayashi