Patents by Inventor Nariaki Muto

Nariaki Muto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5851712
    Abstract: An electrophotosensitive material of the present invention is formed by providing a photosensitive layer containing a bis-azo pigment expressed in formula (1): ##STR1## wherein A.sup.1, A.sup.2, R.sup.1 and n are as defined, as a charge generating material, and a diamine compound expressed in formula (2): ##STR2## wherein R.sup.2, R.sup.3, R.sup.4, R.sup.5, R.sup.6 and R.sup.7 p and q k, l, m and o are as defined, as a charge-trasferring material, on a conductive substrate. As a charge generating material, a perylene pigment, anthanthrone pigment, X-type metal-free phthalocyanine pigment, imidazoleperylene pigment or perylene bis-azo pigment are preferable used together with the bis-azo pigment. Thus, photosensitive material is excellent in sensitivity and durability.
    Type: Grant
    Filed: June 1, 1995
    Date of Patent: December 22, 1998
    Assignee: Mita Industrial Co., Ltd.
    Inventors: Nariaki Muto, Keisuke Sumida, Hiroaki Iwasaki, Tsuneo Oki, Eiichi Miyamoto, Yasuyuki Hanatani, Hiroaki Sakai
  • Patent number: 5550290
    Abstract: The present invention relates to a benzidine derivative represented by the general formula (1): ##STR1## wherein R.sup.1 to R.sup.6, m and n are as defined in the present specification. The benzidine derivative improves durability and heat resistance of a membrane containing the same while maintaining high hole transferring capability. Therefore, an electrophotosensitive material, which comprises a photosensitive layer containing the benzidine derivative, has high sensitivity and is superior in durability and heat resistance.
    Type: Grant
    Filed: September 28, 1994
    Date of Patent: August 27, 1996
    Assignee: Mita Industrial Co. Ltd.
    Inventors: Yasufumi Mizuta, Masashi Tanaka, Nariaki Muto, Toshiyuki Fukami, Hideo Nakamori, Mikio Kakui, Sakae Saito, Hiroshi Shiomi, Keisuke Sumida, Maki Uchida
  • Patent number: 5521044
    Abstract: An electrophotosensitive material of the present invention is formed by providing a photosensitive layer containing a bis-azo pigment expressed in formula (1): ##STR1## wherein A.sup.1, A.sup.2, R.sup.1 and n are as defined, as a charge generating material, and a diamine compound expressed in formula (2): ##STR2## wherein R.sup.2, R.sup.3, R.sup.4, R.sup.5, R.sup.6 and R.sup.7 p and q k, l, m and o are as defined, as a charge-trasferring material, on a conductive substrate. As a charge generating material, a perylene pigment, anthanthrone pigment, X-type metal-free phthalocyanine pigment, imidazoleperylene pigment or perylene bis-azo pigment are preferable used together with the bis-azo pigment. Thus, photosensitive material is excellent in sensitivity and durability.
    Type: Grant
    Filed: January 22, 1993
    Date of Patent: May 28, 1996
    Assignee: Mita Industrial Co., Ltd.
    Inventors: Nariaki Muto, Keisuke Sumida, Hiroaki Iwasaki, Tsuneo Oki, Eiichi Miyamoto, Yasuyuki Hanatani, Hiroaki Sakai
  • Patent number: 5514508
    Abstract: The present invention provides an electrophotosensitive material having an improved sensitivity in comparison with a conventional one, obtained by combining a trinitrofluorenoneimine derivative represented by the formula (1): ##STR1## wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4 and R.sup.5 are the same or different and indicate a hydrogen atom, an alkyl group, an alkoxy group, an aryl group which may contain a substituent, an aralkyl group which may contain a substituent, or a halogen atom! as an electron transferring material with a prescribed electric charge generating material or hole transferring material.
    Type: Grant
    Filed: May 19, 1995
    Date of Patent: May 7, 1996
    Assignee: Mita Industrial Co., Ltd.
    Inventors: Toshiyuki Fukami, Hideo Nakamori, Hiroshi Shiomi, Hirofumi Kawaguchi, Hisakazu Uegaito, Nariaki Muto, Mikio Kakui, Keisuke Sumida, Sakae Saito, Maki Uchida
  • Patent number: 5223364
    Abstract: The electrophotographic photoconductor of the present invention includes a conductive substrate and a photosensitive layer containing perylene pigment as a charge generating material formed on the conductive substrate. The X-ray diffraction peak of the perylene pigment exhibits its peak when the value of 2.theta. is 14.degree.(.+-.0.3.degree.), and the half-width of the peak when the value of 2.theta. is 14.degree. (.+-.0.3.degree.) is 0.5 or more. This electrophotographic photoconductor has excellent qualities of low residual potential and stabilized quality.
    Type: Grant
    Filed: July 2, 1991
    Date of Patent: June 29, 1993
    Assignee: Mita Industrial Co., Ltd.
    Inventors: Tatsuo Maeda, Eiichi Miyamoto, Nariaki Muto
  • Patent number: 5153088
    Abstract: This invention provides an electrophotosensitive material comprising a conductive substrate and a photosensitive layer formed thereon, the photosensitive layer includes a perylene compound (I) and an X-type metal-free phtalocyanine as a charge-generating ingredient and a diamine derivative (II) as a charge-transferring ingredient in the binding resin. This electrophotosensitive material is especially superior in sensitivity and reproductivity. Formulas (I) and (II) are defined as follows: ##STR1## wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, R.sup.6, R.sup.7, R.sup.8, R.sup.9 l, m, n, o and p have the same meanings as defined in the text of the specification.
    Type: Grant
    Filed: February 28, 1990
    Date of Patent: October 6, 1992
    Assignee: Mita Industrial Co., Ltd.
    Inventors: Nariaki Muto, Tatsuo Maeda, Hirotsugu Nishikawa, Mikio Kakui, Keisuke Sumida, Toru Nakazawa
  • Patent number: 5087544
    Abstract: The present invention provides an electrophotosensitive material comprising a conductive substrate, and a photosensitive layer provided on the conductive substrate and containing a m-phenylenediamine compound represented by the general formula [I]: ##STR1## (wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4 and R are the same as defined before). The present electrophotosensitive material has high sensitivity and is easy to be manufactured.
    Type: Grant
    Filed: March 26, 1990
    Date of Patent: February 11, 1992
    Assignee: Mita Industrial Co., Ltd.
    Inventors: Nariaki Muto, Mikio Kakui, Keisuke Sumida, Toru Nakazawa, Kazuo Matsumoto
  • Patent number: 5059503
    Abstract: The present invention provides an electrophotosensitive material containing the diamine derivative represented by the following general formula (I) and at least one selected from the group consisting of the hydrazone compound, fluorene compound and m-phenylenediamine compound. ##STR1## wherein R.sup.5 to R.sup.9, l, m, n, o and p are as defined.
    Type: Grant
    Filed: March 29, 1990
    Date of Patent: October 22, 1991
    Assignee: Mita Industrial Co., Ltd.
    Inventors: Nariaki Muto, Tatsuo Maeda, Toshihiko Nishiguchi, Mikio Kakui, Keisuke Sumida, Toru Nakazawa