Patents by Inventor Naruaki Iida
Naruaki Iida has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11978655Abstract: A substrate transfer mechanism includes: an arm base main body provided with a first driver; a lift configured to move up and down the arm base main body; a first arm extending transversely from a lower side of the arm base main body, and having a tip end that pivots around a vertical axis with respect to the arm base main body by the first driver; a second arm extending transversely from an upper side of the tip end of the first arm, and having a tip end that pivots around a vertical axis with respect to the first arm along with the pivoting of the first arm; and a substrate holder provided on an upper side of the tip end of the second arm, and configured to rotate around a vertical axis with respect to the second arm.Type: GrantFiled: May 24, 2023Date of Patent: May 7, 2024Assignee: TOKYO ELECTRON LIMITEDInventors: Kousei Ide, Naruaki Iida
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Publication number: 20230347369Abstract: An apparatus includes substrate holders each configured to hold a substrate, a first nozzle provided for each substrate holder and for discharging a first processing liquid to the substrate at a first position, a second nozzle provided to be shared by the substrate holders and for discharging a second processing liquid to the substrate at a second position, a third nozzle provided for each substrate holder and for discharging a third processing liquid to the substrate at a third position while the first and second processing liquids are not supplied to the substrate, first to third standby parts for respectively allowing the first to third nozzles to wait outside a substrate holding region, a turning mechanism for turning the first nozzle between the first standby part and the first position, and a linear motion mechanism for linearly moving the third nozzle between the third standby part and the third position.Type: ApplicationFiled: July 5, 2023Publication date: November 2, 2023Inventors: Hideki KAJIWARA, Yuya YONEMITSU, Shinichiro YAMANAKA, Shinichi MIZUSHINO, Naruaki IIDA, Kohei KAWAKAMI, Tohru AZUMA
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Publication number: 20230298927Abstract: A substrate transfer mechanism includes: an arm base main body provided with a first driver; a lift configured to move up and down the arm base main body; a first arm extending transversely from a lower side of the arm base main body, and having a tip end that pivots around a vertical axis with respect to the arm base main body by the first driver; a second arm extending transversely from an upper side of the tip end of the first arm, and having a tip end that pivots around a vertical axis with respect to the first arm along with the pivoting of the first arm; and a substrate holder provided on an upper side of the tip end of the second arm, and configured to rotate around a vertical axis with respect to the second arm.Type: ApplicationFiled: May 24, 2023Publication date: September 21, 2023Inventors: Kousei IDE, Naruaki IIDA
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Patent number: 11752515Abstract: An apparatus includes substrate holders each configured to hold a substrate, a first nozzle provided for each substrate holder and for discharging a first processing liquid to the substrate at a first position, a second nozzle provided to be shared by the substrate holders and for discharging a second processing liquid to the substrate at a second position, a third nozzle provided for each substrate holder and for discharging a third processing liquid to the substrate at a third position while the first and second processing liquids are not supplied to the substrate, first to third standby parts for respectively allowing the first to third nozzles to wait outside a substrate holding region, a turning mechanism for turning the first nozzle between the first standby part and the first position, and a linear motion mechanism for linearly moving the third nozzle between the third standby part and the third position.Type: GrantFiled: June 10, 2020Date of Patent: September 12, 2023Assignee: TOKYO ELECTRON LIMITEDInventors: Hideki Kajiwara, Yuya Yonemitsu, Shinichiro Yamanaka, Shinichi Mizushino, Naruaki Iida, Kohei Kawakami, Tohru Azuma
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Patent number: 11705359Abstract: A substrate transfer mechanism for transferring a substrate to each of a plurality of stacked processing modules that process the substrate includes an arm base provided with a first driver, a lift configured to move up and down the arm base, a first arm extending transversely from a lower side of the arm base, and having a tip end that pivots around a vertical axis with respect to the arm base by the first driver, a second arm extending transversely from an upper side of the tip end of the first arm, and having a tip end that pivots around a vertical axis with respect to the first arm along with the pivoting of the first arm, and a substrate holder provided on an upper side of the tip end of the second arm, and configured to rotate around a vertical axis with respect to the second arm.Type: GrantFiled: February 24, 2022Date of Patent: July 18, 2023Assignee: TOKYO ELECTRON LIMITEDInventors: Kousei Ide, Naruaki Iida
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Publication number: 20230106927Abstract: A substrate processing apparatus includes: a carrier block including carrier placement parts and configured to load/unload a substrate into/from a carrier; a processing block provided on one side of the carrier block to process the substrate; first and second carrier placement parts of the carrier placement parts and provided side by side in a front-rear direction in a plan view; substrate placement parts provided to be arranged step by step vertically on one side of a substrate transfer region formed between the first and second carrier placement parts; a first substrate transfer mechanism provided in the substrate transfer region to deliver the substrate between the carrier of the first carrier placement part and a first substrate placement part of the substrate placement parts; and a second substrate transfer mechanism for moving upward and downward so as to deliver the substrate between first and second substrate placement parts.Type: ApplicationFiled: September 30, 2022Publication date: April 6, 2023Inventors: Tsuyoshi WATANABE, Masashi TSUCHIYAMA, Naruaki IIDA, Suguru ENOKIDA, Kousei IDE
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Publication number: 20230056038Abstract: A substrate processing apparatus includes: a loading/unloading block; a processing station provided on one of left and right sides of the loading/unloading block; a relay block provided on one of left and right sides of the processing station; processing blocks provided side by side in a left-right direction to form the processing station, each of the processing blocks including a processing module configured to perform a process on the substrate and a main transfer mechanism configured to deliver the substrate to the processing module; and bypass transfer mechanisms provided separately from the main transfer mechanism and provided respectively for the processing blocks arranged side by side in the left-right direction to transfer the substrate between left and right blocks, wherein bypass transfer paths for the substrate transferred by the plurality of bypass transfer mechanisms have heights different from each other, and partially overlap each other in a plan view.Type: ApplicationFiled: August 17, 2022Publication date: February 23, 2023Inventors: Kousei IDE, Naruaki IIDA, Kazuya MATSUSHITA
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Publication number: 20230021035Abstract: A linearly moving mechanism includes an internal moving body provided within a case body and configured to be moved in a linear direction, the internal moving body being configured to move an external moving body connected to a connection member protruded from the case body through an opening formed at the case body; a seal belt extending in the linear direction and provided within the case body to close the opening, a first surface side of both end portions of the seal belt in a widthwise direction thereof facing an edge portion of the opening while being spaced apart therefrom; and a deformation suppressing member provided to face a second surface side of the both end portions to suppress deformation of the seal belt, the seal belt being connected to the internal moving body to be moved along with a movement of the internal moving body.Type: ApplicationFiled: December 7, 2020Publication date: January 19, 2023Inventors: Masami Akimoto, Naruaki Iida, Tsunenaga Nakashima, Keisuke Sasaki, Takahiro Yasutake, Kazuya Matsushita, Kousei Ide, Masato Ozeki
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Publication number: 20220270912Abstract: A substrate transfer mechanism for transferring a substrate to each of a plurality of stacked processing modules that process the substrate includes: an arm base provided with a first driver; a lift configured to move up and down the arm base; a first arm extending transversely from a lower side of the arm base, and having a tip end that pivots around a vertical axis with respect to the arm base by the first driver; a second arm extending transversely from an upper side of the tip end of the first arm, and having a tip end that pivots around a vertical axis with respect to the first arm along with the pivoting of the first arm; and a substrate holder provided on an upper side of the tip end of the second arm, and configured to rotate around a vertical axis with respect to the second arm.Type: ApplicationFiled: February 24, 2022Publication date: August 25, 2022Inventors: Kousei IDE, Naruaki IIDA
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Publication number: 20200391238Abstract: An apparatus includes substrate holders each configured to hold a substrate, a first nozzle provided for each substrate holder and for discharging a first processing liquid to the substrate at a first position, a second nozzle provided to be shared by the substrate holders and for discharging a second processing liquid to the substrate at a second position, a third nozzle provided for each substrate holder and for discharging a third processing liquid to the substrate at a third position while the first and second processing liquids are not supplied to the substrate, first to third standby parts for respectively allowing the first to third nozzles to wait outside a substrate holding region, a turning mechanism for turning the first nozzle between the first standby part and the first position, and a linear motion mechanism for linearly moving the third nozzle between the third standby part and the third position.Type: ApplicationFiled: June 10, 2020Publication date: December 17, 2020Inventors: Hideki KAJIWARA, Yuya YONEMITSU, Shinichiro YAMANAKA, Shinichi MIZUSHINO, Naruaki IIDA, Kohei KAWAKAMI, Tohru AZUMA
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Patent number: 10795265Abstract: There is provided a substrate processing apparatus including: a light radiator configured to radiate a light for processing into an irradiation area which is smaller than a processing target area of a surface of a substrate; a driver configured to move the irradiation area in two directions that cross each other in a plane along the surface of the substrate; and a controller configured to control the driver to move an irradiation position in two directions according to a movement pattern which has been set to radiate the light to an entire area of the processing target area.Type: GrantFiled: July 24, 2019Date of Patent: October 6, 2020Assignee: TOKYO ELECTRON LIMITEDInventors: Norihisa Koga, Yoshitaka Konishi, Naruaki Iida, Yuzo Ohishi, Kazuhiro Takeshita
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Publication number: 20200041913Abstract: There is provided a substrate processing apparatus including: a light radiator configured to radiate a light for processing into an irradiation area which is smaller than a processing target area of a surface of a substrate; a driver configured to move the irradiation area in two directions that cross each other in a plane along the surface of the substrate; and a controller configured to control the driver to move an irradiation position in two directions according to a movement pattern which has been set to radiate the light to an entire area of the processing target area.Type: ApplicationFiled: July 24, 2019Publication date: February 6, 2020Inventors: Norihisa KOGA, Yoshitaka KONISHI, Naruaki IIDA, Yuzo OHISHI, Kazuhiro TAKESHITA
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Patent number: 10042356Abstract: A substrate processing apparatus includes: first and second places in which a substrate can be placed; a substrate transfer device having a substrate holder that holds the substrate to transfer the substrate between the first and second places; and a substrate position measuring unit that detects a position of the substrate held by the substrate holder. The substrate position measuring unit, disposed independently of the substrate transfer device, is arranged at a position where the substrate held by the substrate holder of the substrate transfer device can be placed.Type: GrantFiled: February 18, 2015Date of Patent: August 7, 2018Assignee: Tokyo Electron LimitedInventors: Naruaki Iida, Katsuhiro Morikawa
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Patent number: 9818654Abstract: An apparatus includes: measurement flow passage portions as part of a respective plurality of supply paths of fluids to be supplied to a substrate, the measurement flow passage portions constituting measurement regions for measurement of foreign matter in the fluids, and being disposed so as to form a row with each other; a light irradiating unit configured to form an optical path in one of the flow passage portions, the light irradiating unit being shared by the plurality of flow passage portions; a moving mechanism configured to move the light irradiating unit relatively along a direction of arrangement of the flow passage portions to form the optical path within the flow passage portion selected among the plurality of flow passage portions; a light receiving unit including a light receiving element, the light receiving element receiving light transmitted by the flow passage portion; and a detecting unit configured to detect foreign matter in the fluid on a basis of a signal output from the light receivingType: GrantFiled: June 2, 2016Date of Patent: November 14, 2017Assignee: Tokyo Electron LimitedInventors: Masato Hayashi, Kohei Noguchi, Kenji Iizuka, Naruaki Iida
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Publication number: 20160358829Abstract: An apparatus includes: measurement flow passage portions as part of a respective plurality of supply paths of fluids to be supplied to a substrate, the measurement flow passage portions constituting measurement regions for measurement of foreign matter in the fluids, and being disposed so as to form a row with each other; a light irradiating unit configured to form an optical path in one of the flow passage portions, the light irradiating unit being shared by the plurality of flow passage portions; a moving mechanism configured to move the light irradiating unit relatively along a direction of arrangement of the flow passage portions to form the optical path within the flow passage portion selected among the plurality of flow passage portions; a light receiving unit including a light receiving element, the light receiving element receiving light transmitted by the flow passage portion; and a detecting unit configured to detect foreign matter in the fluid on a basis of a signal output from the light receivingType: ApplicationFiled: June 2, 2016Publication date: December 8, 2016Applicant: Tokyo Electron LimitedInventors: Masato HAYASHI, Kohei NOGUCHI, Kenji IIZUKA, Naruaki IIDA
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Patent number: 9299599Abstract: A substrate holder positioning method, capable of positioning a substrate holder without using any positioning jig, includes: measuring a first position of a substrate held on a substrate holder included in a substrate carrying mechanism; carrying the substrate held on the substrate holder to a substrate rotating unit for holding and rotating the substrate; turning the substrate held by the substrate rotating unit through a predetermined angle by the substrate rotating unit; transferring the substrate turned by the substrate rotating unit from the substrate rotating unit to the substrate holder; measuring a second position of the substrate transferred from the substrate rotating unit to the substrate holder; determining the position of the center of rotation of the substrate rotating unit on the basis of the first and the second position; and positioning the substrate holder on the basis of the position of the center of rotation.Type: GrantFiled: April 9, 2014Date of Patent: March 29, 2016Assignee: Tokyo Electron LimitedInventors: Yuichi Douki, Tokutarou Hayashi, Naruaki Iida, Suguru Enokida
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Patent number: 9214370Abstract: A substrate transfer device that transfers a substrate by allowing a substrate opening formed on a front surface of a substrate transfer vessel to face an opening formed on a partition wall from one side of the partition wall and separating a cover body of the substrate transfer vessel from the other side of the partition wall includes a door configured to open and close the opening from the other side of the partition wall; a reciprocating unit configured to straightly move the door back and forth between a first position where the opening is closed and a second position away from the first position toward the other side of the partition wall; and a rotating unit configured to rotate the door around a rotation axis in a straightly moving direction of the door between the second position and a third position deviated from a region facing the opening.Type: GrantFiled: April 10, 2013Date of Patent: December 15, 2015Assignee: TOKYO ELECTRON LIMITEDInventors: Naruaki Iida, Akihiro Teramoto
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Publication number: 20150235888Abstract: A substrate processing apparatus includes: first and second places in which a substrate can be placed; a substrate transfer device having a substrate holder that holds the substrate to transfer the substrate between the first and second places; and a substrate position measuring unit that detects a position of the substrate held by the substrate holder. The substrate position measuring unit, disposed independently of the substrate transfer device, is arranged at a position where the substrate held by the substrate holder of the substrate transfer device can be placed.Type: ApplicationFiled: February 18, 2015Publication date: August 20, 2015Inventors: Naruaki IIDA, Katsuhiro MORIKAWA
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Patent number: 9082800Abstract: A substrate treatment system comprise a treatment station having a plurality of treatment units provided at multiple tiers in an up-down direction, a cassette mounting table on which a cassette housing a plurality of wafers W is mounted, and a wafer transfer mechanism arranged between the treatment station and the cassette mounting table, wherein a delivery block in which a plurality of delivery units are provided at multiple tiers is provided between the treatment station and the wafer transfer mechanism, the delivery units temporarily housing a wafer to be transferred between the cassette mounting table and the treatment station and a wafer to be transferred between the tiers of the treatment units. The wafer transfer mechanism includes a first transfer arm that transfers a wafer between the cassette mounting table and the delivery block, and a second transfer arm that transfers a wafer between the tiers of the delivery units.Type: GrantFiled: September 20, 2012Date of Patent: July 14, 2015Assignee: Tokyo Electron LimitedInventors: Suguru Enokida, Masahiro Nakaharada, Hidekazu Kiyama, Naruaki Iida, Akira Miyata
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Patent number: 8985929Abstract: A substrate processing apparatus includes: a carrier block including first and second carrier placement units spaced apart in a right and left direction; a processing block having a layered structure in which a plurality of layered parts are vertically arranged, the layered parts each including a substrate transport mechanism for transporting a substrate and a processing module for processing a substrate; a tower unit including plural substrate placement units located at height positions where a substrate is transferred by the substrate transport mechanism of the layered part corresponding to the substrate placement unit; a first substrate transfer mechanism configured to transfer a substrate between the carrier on the first carrier placement unit and the substrate placement unit of the tower unit; and a second substrate transfer mechanism configured to transfer a substrate between the carrier on the second substrate placement unit and the substrate placement unit of the tower unit.Type: GrantFiled: September 12, 2012Date of Patent: March 24, 2015Assignee: Tokyo Electron LimitedInventors: Suguru Enokida, Masahiro Nakaharada, Akira Miyata, Hidekazu Kiyama, Naruaki Iida