Patents by Inventor Nasim Eibagi

Nasim Eibagi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Self-limiting cyclic etch method for carbon-based films
    Patent number: 11037798
    Abstract: Embodiments of the disclosure describe a cyclic etch method for carbon-based films. According to one embodiment, the method includes providing a substrate containing the carbon-based film, exposing the carbon-based film to an oxidizing plasma thereby forming an oxidized layer on the carbon-based film, thereafter, exposing the oxidized layer to a non-oxidizing inert gas plasma thereby removing the oxidized layer and forming a carbonized surface layer on the carbon-based film, and repeating the exposing steps at least once.
    Type: Grant
    Filed: November 8, 2017
    Date of Patent: June 15, 2021
    Assignee: Tokyo Electron Limited
    Inventors: Barton G. Lane, Nasim Eibagi, Alok Ranjan, Peter L. G. Ventzek
  • SELF-LIMITING CYCLIC ETCH METHOD FOR CARBON-BASED FILMS
    Publication number: 20180130669
    Abstract: Embodiments of the disclosure describe a cyclic etch method for carbon-based films. According to one embodiment, the method includes providing a substrate containing the carbon-based film, exposing the carbon-based film to an oxidizing plasma thereby forming an oxidized layer on the carbon-based film, thereafter, exposing the oxidized layer to a non-oxidizing inert gas plasma thereby removing the oxidized layer and forming a carbonized surface layer on the carbon-based film, and repeating the exposing steps at least once.
    Type: Application
    Filed: November 8, 2017
    Publication date: May 10, 2018
    Applicant: Tokyo Electron Limited
    Inventors: Barton G. Lane, Nasim Eibagi, Alok Ranjan, Peter L. G. Ventzek