Abstract: Chlorosilanes of the general formula HnSiCl4-n and/or HmCl6-mSi2, where n=1-4 and m=0-4, are produced in a fluidized bed reactor by reaction of a hydrogen chloride-containing reaction gas with a silicon contact mass granulation mixture composed of a coarse grain fraction and a fine grain fraction, wherein the average particle size of the fine grain fraction d50,fine is smaller than the average particle size of the coarse grain fraction d50,coarse.

Abstract: Organochlorosilanes are produced by reacting, in a fluidized bed reactor, a chloromethane-containing reactant gas with a particulate contact mass containing silicon and a catalyst, wherein the organochlorosilanes have the general formula (CH3)nHSiCl4-n-m where n=1 to 3 and m=0 or 1, wherein the process is characterized by three dimensions indices K1-K3, which are respectively associated with the reactor, the contact mass, and the reaction conditions, and which are maintained within specified bounds.

Abstract: Chlorosilanes are produced in exalted yield in a fluidized bed process when the reactor hydraulic diameter, Sauter particle diameter, and superficial gas velocity are used to define a parameter space as a function of Reynolds number and Archimedes number.

Abstract: Organochlorosilanes are produced by reacting, in a fluidized bed reactor, a chloromethane-containing reactant gas with a particulate contact mass containing silicon and a catalyst, wherein the organochlorosilanes have the general formula (CH3)nHSiCl4-n-m where n=1 to 3 and m=0 or 1, wherein the process is characterized by three dimensions indices K1-K3, which are respectively associated with the reactor, the contact mass, and the reaction conditions, and which are maintained within specified bounds.

Abstract: A process for producing methylchlorosilanes of general formula 1, (CH3)nHmSiCl4-n-m, in which n represents values from 1 to 3 and m represents values of 0 or 1 in a fluidized bed reactor is provided. A chloromethane-containing reaction gas is reacted with a particulate contact mass containing silicon in the presence of copper catalyst. An operating granulation contains at least 1% by mass of silicon-containing particles S described by a structural parameter S. S has a value of at least 0 and is calculated according to equation (1), S = ( ? s - 0.70 ) · ? SD ? F , wherein ?S is symmetry-weighted sphericity factor, ?SD is poured density [g/cm3], and ?F is average particle solids density [g/cm3].

Abstract: Chlorosilanes of the general formula HnSiCl4-n and/or HmCl6-mSi2, where n=1-4 and m=0-4, are produced in a fluidized bed reactor by reaction of a hydrogen chloride-containing reaction gas with a silicon contact mass granulation mixture composed of a coarse grain fraction and a fine grain fraction, wherein the average particle size of the fine grain fraction d50,fine is smaller than the average particle size of the coarse grain fraction d50,coarse.

Abstract: Chlorosilanes are produced in exalted yield in a fluidized bed process when the reactor hydraulic diameter, Sauter particle diameter, and superficial gas velocity are used to define a parameter space as a function of Reynolds number and Archimedes number.

Abstract: A process for producing organochlorosilanes in a fluidized bed reaction comprises reacting haloorganic reaction gas with a catalytic composition comprising silicon, copper catalysts and promoters, in a fluidized bed reactor, wherein the hydraulic diameter of the fluidized bed reactor dhyd, the superficial gas velocity in the fluidized bed reactor uL and the particle Sauter diameter of the catalytic composition d32 are selected such that, in a Cartesian coordination system in which Ar is plotted against Re, points on the surface are formed wherein the surface is limited by equations 1 and 2 Ar=2·10?5·Re2+0.08*Re?120??Equation 1: Ar=2·10?5·Re2?1.07*Re+14100??Equation 2: wherein the lower limit Ar=0.5 and the upper limit Ar=3000. The invention also relates to a method for selecting reaction parameters for producing organochlorosilanes.

Abstract: A process for producing organochlorosilanes in a fluidized bed reaction comprises reacting haloorganic reaction gas with a catalytic composition comprising silicon, copper catalysts and promoters, in a fluidized bed reactor, wherein the hydraulic diameter of the fluidized bed reactor dhyd, the superficial gas velocity in the fluidized bed reactor uL and the particle Sauter diameter of the catalytic composition d32 are selected such that, in a Cartesian coordination system in which Ar is plotted against Re, points on the surface are formed wherein the surface is limited by equations 1 and 2 Ar=2·10?5·Re2+0.08*Re?120 ??Equation 1 Ar=2·10?5·Re2?1.07*Re+14100 ??Equation 2 wherein the lower limit Ar=0.5 and the upper limit Ar=3000. The invention also relates to a method for selecting reaction parameters for producing organochlorosilanes.

Abstract: The composition of a gas or gas stream containing AlCl3 in a chemical reactor is measured by removing AlCl3 from the gas and analyzing the gas by gas chromatography or spectroscopy. Chlorosilanes may be prepared in a fluidized bed reactor having a reactor height H0, in which supplied HCl reacts with silicon, wherein a temperature profile in the fluidized bed reactor is greater than S1(H/H0)=(a1?b1)*(1/(1+exp(?c1((H/H0)?d1))))+b1 and less than S2(H/H0)=(a2?b2)*(1/(1+exp(?c2((H/H0)?d2))))+b2, where a1=100° C., a2=300° C., b1=300° C., b2=400° C., c1=50, c2=20, d1=0.2, and d2=0.8.

Abstract: Methylchlorosilanes are synthesized by an at least two stage reaction in which contact composition from a first fluidized bed reactor is fed to a second fluidized bed reactor.

Abstract: The composition of a gas or gas stream containing AlCl3 in a chemical reactor is measured by removing AlCl3 from the gas and analyzing the gas by gas chromatography or spectroscopy. Chlorosilanes may be prepared in a fluidized bed reactor having a reactor height H0, in which supplied HCl reacts with silicon, wherein a temperature profile in the fluidized bed reactor is greater than S1(H/H0)=(a1?b1)*(1/(1+exp(?c1((H/H0)?d1))))+b1 and less than S2(H/H0)=(a2?b2)*(1/(1+exp(?c2((H/H0)?d2))))+b2, where a1=100° C., a2=300° C., b1=300° C., b2=400° C., c1=50, c2=20, d1=0.2, and d2=0.8.