Abstract: A method of inhibiting the formation and deposition of scale forming moieties in aqueous systems by adding water-soluble or water-dispersible polymers is disclosed. The method comprises adding to an aqueous system a polymer having repeat units characterized by the Formula I: Wherein E is the repeat unit remaining after polymerization of an ethylenically unsaturated compound; preferably, a carboxylic acid, sulfonic acid, phosphonic acid, or amide form thereof or mixtures thereof. R1 is H or lower (C1-C4)alkyl. G is —CH2— or —CHCH3—; R2 is &Parenopenst;CH2—CH2—O&Parenclosest;n or &Parenopenst;CH2—CHCH3—O&Parenclosest;n where n ranges from about 1 to 100, preferably about 1 to 20. X is an anionic radical selected from the group consisting of SO3, PO3, or COO; Z is H or hydrogens or any water soluble cationic moiety which counterbalances the valence of the anionic radical X, including but not limited to Na, K, Ca, or NH4.

Abstract: A building material is composed of a co- or ter-polymer of (i) a material selected from carboxylic acid, sulfonic acid, phosphonic acid, a amide form thereof or mixtures thereof and (ii) at least one polyethylene glycol monoallyl ether sulfate and a binding material of cement or gypsum. This building material can be used throughout the construction industry in many applications because the superplasticizer provides improved fluidity and yet is economical and efficient.

Abstract: A method of inhibiting the formation and deposition of scale forming moieties in aqueous systems by adding water-soluble or water-dispersible polymers is disclosed.

Abstract: A water soluble or water dispersible polymer composition is disclosed. The polymer has the repeat units characterized by the formula I: Wherein E is the repeat unit remaining after polymerization of an ethylenically unsaturated compound; preferably, a carboxylic acid, sulfonic acid, phosphonic acid, or amide form thereof or mixtures thereof. R1 is H or lower (C1-C4) alkyl. G is —CH2— or —CHCH3—; R2 is &Parenopenst;CH2—CH2—O&Parenclosest;n or &Parenopenst;CH2—CHCH3—O&Parenclosest;n where n ranges from about 1 to 100, preferably about 1 to 20. X is an anionic radical selected from the group consisting of SO3, PO3, or COO; Z is H or hydrogens or any water soluble cationic moiety which counterbalances the valence of the anionic radical X, including but not limited to Na, K, Ca, or NH4. F, when present, is a repeat unit having the structure of formula II: wherein X and Z are the same as in Formula I. R4 is H or lower (C1-C4) alkyl.