Patents by Inventor Natarajan Senthilkumar

Natarajan Senthilkumar has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9853221
    Abstract: The present disclosure relates to a compound including a structure of Formula (I), and the use of the compound as a dopant in an emitting layer of an organic light emitting diode. The present disclosure also relates to an emitting layer of an organic light emitting diode and an organic light emitting diode device.
    Type: Grant
    Filed: August 10, 2016
    Date of Patent: December 26, 2017
    Assignee: NATIONAL TSING HUA UNIVERSITY
    Inventors: Chien-Hong Cheng, Pachaiyappan Rajamalli, Natarajan Senthilkumar, Parthasarathy Gandeepan, Min-Hsien Chen
  • Patent number: 9850333
    Abstract: A copolymer capable of realizing a synergistic effect of matting characteristics and heat resistance properties includes two or more types of compounds including at least two unsaturated reactive groups. A thermoplastic resin composition including the copolymer is also provided.
    Type: Grant
    Filed: June 25, 2015
    Date of Patent: December 26, 2017
    Assignee: Lotte Advanced Materials Co., Ltd.
    Inventors: Joo Hyun Jang, Jae Won Heo, Il Jin Kim, Kwang Soo Park, Natarajan Senthilkumar, Tae Gon Kang, Bo Eun Kim, Jun Sung Oh
  • Publication number: 20170317292
    Abstract: The present disclosure relates to a compound including a structure of Formula (I), and the use of the compound as a dopant in an emitting layer of an organic light emitting diode. The present disclosure also relates to an emitting layer of an organic light emitting diode and an organic light emitting diode device.
    Type: Application
    Filed: August 10, 2016
    Publication date: November 2, 2017
    Inventors: Chien-Hong CHENG, Pachaiyappan RAJAMALLI, Natarajan SENTHILKUMAR, Parthasarathy GANDEEPAN, Min-Hsien CHEN
  • Patent number: 9580528
    Abstract: A method for preparing a tetrapolymer includes preparing a suspension including an aromatic vinyl-based monomer, an unsaturated nitrile-based monomer, an N-substituted maleimide-based monomer, an ?-alkyl styrene-based monomer, and an inorganic dispersing agent, and polymerizing the suspension. The method for preparing a tetrapolymer can be useful in lowering a reaction temperature using suspension polymerization, and reducing a reaction time, thereby maximizing productivity. A tetrapolymer prepared by the method is also provided.
    Type: Grant
    Filed: June 24, 2015
    Date of Patent: February 28, 2017
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Jae Won Heo, Joo Hyun Jang, Bo Eun Kim, Kwang Soo Park, Natarajan Senthilkumar, Young Sub Jin
  • Patent number: 9365671
    Abstract: Provided are a styrene-based copolymer prepared from a mixture including (A) an aromatic vinyl-based compound, (B) an unsaturated nitrile-based compound, and (C) a silicone-based compound having two or more unsaturated reactive groups to thereby be capable of implementing a uniform and excellent low gloss property with minimal or no deterioration of physical properties such as impact resistance, heat resistance, and the like, and a thermoplastic resin composition including the same.
    Type: Grant
    Filed: December 2, 2014
    Date of Patent: June 14, 2016
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Bo Eun Kim, Joo Hyun Jang, Jae Won Heo, Kwang Soo Park, Natarajan Senthilkumar, Il Jin Kim, Jun Sung Oh
  • Publication number: 20150376316
    Abstract: A method for preparing a tetrapolymer includes preparing a suspension including an aromatic vinyl-based monomer, an unsaturated nitrile-based monomer, an N-substituted maleimide-based monomer, an ?-alkyl styrene-based monomer, and an inorganic dispersing agent, and polymerizing the suspension. The method for preparing a tetrapolymer can be useful in lowering a reaction temperature using suspension polymerization, and reducing a reaction time, thereby maximizing productivity. A tetrapolymer prepared by the method is also provided.
    Type: Application
    Filed: June 24, 2015
    Publication date: December 31, 2015
    Inventors: Jae Won HEO, Joo Hyun JANG, Bo Eun KIM, Kwang Soo PARK, Natarajan SENTHILKUMAR, Young Sub JIN
  • Publication number: 20150376315
    Abstract: A copolymer capable of realizing a synergistic effect of matting characteristics and heat resistance properties includes two or more types of compounds including at least two unsaturated reactive groups. A thermoplastic resin composition including the copolymer is also provided.
    Type: Application
    Filed: June 25, 2015
    Publication date: December 31, 2015
    Inventors: Joo Hyun JANG, Jae Won HEO, Il Jin KIM, Kwang Soo PARK, Natarajan SENTHILKUMAR, Tae Gon KANG, Bo Eun KIM, Jun Sung OH
  • Publication number: 20150152205
    Abstract: Provided are a styrene-based copolymer prepared from a mixture including (A) an aromatic vinyl-based compound, (B) an unsaturated nitrile-based compound, and (C) a silicone-based compound having two or more unsaturated reactive groups to thereby be capable of implementing a uniform and excellent low gloss property with minimal or no deterioration of physical properties such as impact resistance, heat resistance, and the like, and a thermoplastic resin composition including the same.
    Type: Application
    Filed: December 2, 2014
    Publication date: June 4, 2015
    Inventors: Bo Eun KIM, Joo Hyun JANG, Jae Won HEO, Kwang Soo PARK, Natarajan SENTHILKUMAR, Il Jin KIM, Jun Sung OH
  • Publication number: 20140187688
    Abstract: A (meth)acrylic copolymer is a copolymer of a monomer mixture including a phosphorus-based (meth)acrylic monomer represented by Formula 1, and a monofunctional unsaturated monomer. The (meth)acrylic copolymer can have improved refractive index, excellent flame resistance, transparency, scratch resistance and/or environment-friendliness: wherein R1 is hydrogen or methyl, R2 is a substituted or unsubstituted C1-C20 hydrocarbon group, R3 and R4 are the same or different and are each independently a substituted or unsubstituted C6-C20 cyclic hydrocarbon group, m is an integer from 1 to 10, and n is an integer from 0 to 5.
    Type: Application
    Filed: June 27, 2013
    Publication date: July 3, 2014
    Inventors: Joo Hyun JANG, Kee Hae KWON, Bo Eun KIM, Yong Hee KANG, Ja Kwan GOO, Man Suk KIM, Il Jin KIM, Kwang Soo PARK, Natarajan Senthilkumar, Jo Won LEE