Patents by Inventor Natascia DE LEO

Natascia DE LEO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11592289
    Abstract: A reference-standard device (20) for calibration of measurements of length, comprising a substrate (10) that includes a surface (10a) having at least one calibration pattern (11). According to the invention, this pattern comprises a plurality of nanometric structures (14), said nanometric structures (14) having one and the same section in the plane of said surface and having the same nanometric dimensions, in particular less than 50 nm, said nanometric structures (14) being arranged at a distance from one another by a constant pitch of nanometric length, in particular less than 50 nm, in at least one direction, said nanometric structures (14) being arranged within spatial regions (12) delimited in one or more directions in the plane of the substrate (10), said nanometric structures (14) being obtained via application to said substrate (10) of a process of nanostructuring (100) by means of a mask of block copolymers in order to make calibrations of measurements of length of the order of nanometres.
    Type: Grant
    Filed: May 19, 2017
    Date of Patent: February 28, 2023
    Assignee: Istituto Nazionale di Ricerca Metrologica
    Inventors: Luca Boarino, Federico Ferrarese Lupi, Giulia Aprile, Natascia De Leo, Michele Perego, Michele Laus, Giampaolo Zuccheri, Gabriele Seguini
  • Publication number: 20200318957
    Abstract: A reference-standard device (20) for calibration of measurements of length, comprising a substrate (10) that includes a surface (10a) having at least one calibration pattern (11). According to the invention, this pattern comprises a plurality of nanometric structures (14), said nanometric structures (14) having one and the same section in the plane of said surface and having the same nanometric dimensions, in particular less than 50 nm, said nanometric structures (14) being arranged at a distance from one another by a constant pitch of nanometric length, in particular less than 50 nm, in at least one direction, said nanometric structures (14) being arranged within spatial regions (12) delimited in one or more directions in the plane of the substrate (10), said nanometric structures (14) being obtained via application to said substrate (10) of a process of nanostructuring (100) by means of a mask of block copolymers in order to make calibrations of measurements of length of the order of nanometres.
    Type: Application
    Filed: May 19, 2017
    Publication date: October 8, 2020
    Inventors: Luca BOARINO, Federico FERRARESE LUPI, Giulia APRILE, Natascia DE LEO, Michele PEREGO, Michele LAUS, Giampaolo ZUCCHERI, Gabriele SEGUINI