Abstract: The subject of the invention is a glass composition of the silica-soda-lime type, intended for the manufacture of substrates or sheets, the said glass composition having a ? coefficient of between 0.50 and 0.85 N/(mm2·° C.) and a working point of less than 1200° C.

Abstract: A process for electrochemically etching a layer with electric conduction properties, of the doped metal oxide type, on a transparent substrate of the glass type, fitted with a mask capable of being removed after etching. The process brings at least one region to be etched of the layer into contact with an electrically conducting solution, immerses an electrode in the solution and places the electrode facing and at a distance from the region, and applies an electrical voltage between the electrode and the layer to be etched. The electrode has an oblong shape such that the etching is carried out on several regions of the layer over a width of the substrate.

Abstract: The invention relates to the field of displays. One subject of the invention is a glass composition intended for the production of a substrate for a field-emission display, which has an overall light transmission factor under illuminant D65 (TLD65) that varies from 45 to 80% and is preferably equal to 72% or less, measured for a glass thickness of 2.8 mm, and a blue-gray coloration defined by the following chromatic coordinates: a*=?4 to +1, preferably ?2 to 0; and b*=?6 to +3, preferably ?2 to 0. The substrates obtained advantageously have a reflection brightness (R) of less than 10 Cd/m2.

Abstract: The subject of the invention is a glass composition of the silica-soda-lime type, intended for the manufacture of substrates or sheets, the said glass composition having a ? coefficient of between 0.50 and 0.85 N/(mm2·° C.) and a working point of less than 1200° C.

Abstract: The subject of the invention is a glass composition of the silica-soda-lime type, intended for the manufacture of substrates or sheets, the said glass composition having a ? coefficient of between 0.50 and 0.85 N/(mm2.° C.) and a working point of less than 1200° C.

Abstract: The subject of the invention is a glass composition of the silica-soda-lime type, intended for the manufacture of substrates or sheets, the said glass composition having a ? coefficient of between 0.50 and 0.85 N/(mm2.° C.) and a working point of less than 1200° C.

Abstract: A process for electrochemically etching a layer (11) with electric conduction properties, of the doped metal oxide type, on a transparent substrate (10) of the glass type, fitted with a mask capable of being removed after etching, and the process consisting in:

Abstract: The invention relates to a glass composition intended for the manufacture of thermally stable substrates or panes, which comprises the following constituents in the following proportions by weight:______________________________________ SiO.sub.2 55-70% Al.sub.2 O.sub.3 0-5% or 5-10% ZrO.sub.2 5-10% or 0-5% B.sub.2 O.sub.3 0-3% Na.sub.2 O 2-6% K.sub.2 O 5-11% MgO 0-6% CaO 2-11% SrO 4-12% BaO 0-2% ______________________________________with the following relationships:Na.sub.2 O+K.sub.2 O.gtoreq.8%MgO+CaO+SrO+BaO>10%the said composition having a strain point which is in excess of 600.degree. C.