Patents by Inventor Nathan D'Astici

Nathan D'Astici has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus for exposing a substrate to plasma radicals
    Patent number: 6450116
    Abstract: An apparatus and method for exposing a substrate to plasma including a first reaction chamber adapted to generate a plasma comprising ions and radicals and a second reaction chamber coupled to the first reaction chamber and adapted to house a substrate at a sight in the second reaction chamber. The second reaction chamber is coupled to the first reaction chamber by an inlet member and radicals of the plasma flow through the inlet member into the second reaction chamber.
    Type: Grant
    Filed: November 12, 1999
    Date of Patent: September 17, 2002
    Assignee: Applied Materials, Inc.
    Inventors: David B. Noble, Ravi Jallepally, Nathan D'Astici, Gary Miner, Turgut Sahin, Guangcai Xing, Yashraj Bhatnagar
  • APPARATUS AND METHOD FOR EXPOSING A SUBSTRATE TO PLASMA RADICALS
    Publication number: 20020073925
    Abstract: An apparatus and method for exposing a substrate to plasma including a first reaction chamber adapted to generate a plasma comprising ions and radicals and a second reaction chamber coupled to the first reaction chamber and adapted to house a substrate at a sight in the second reaction chamber. The second reaction chamber is coupled to the first reaction chamber by an inlet member and radicals of the plasma flow through the inlet member into the second reaction chamber.
    Type: Application
    Filed: November 12, 1999
    Publication date: June 20, 2002
    Inventors: DAVID B. NOBLE, RAVI JALLEPALLY, NATHAN D'ASTICI, GARY MINER, TURGUT SAHIN, GUANGCAI XING, YASHRAJ BHATNAGAR