Abstract: The present disclosure relates to a system for creating parallel, near-linear features with a desired period on a surface of a workpiece, where the workpiece includes a planar substrate and a material layer formed on the planar substrate. In one embodiment the system has an etching beam generator configured to generate a processing beam, and a support structure for holding a workpiece. The workpiece is held such that an upper surface of the material layer of the workpiece is supported at an angle which is non-normal to a direction of travel of the processing beam. The angle correlates to a desired period of features to be fabricated on the upper surface of the material layer. The processing beam transforms the material layer to create generally parallel, generally linear features having the desired a period. Subsequent normal incidence etching may be used to transfer this material layer grating mask structure to the underlying substrate.

Abstract: The present disclosure relates to a method for forming a component having a birefringent characteristic. The method may involve forming a first mask using nanoparticles of metallic material on a surface of a substrate of the component, and then performing a first etching operation at a first angle relative to the surface of the substrate using the nanoparticle mask to remove material from the surface to create surface features projecting from the upper surface in accordance with the nanoparticle mask. A second mask may be formed on the upper surface of the substrate by depositing an additional quantity of metallic material at a second angle, different from the first angle, to create a plurality of regions adjacent each one of the rods where the quantity of metallic material is absent. A second etching operation is then performed at a third angle using the second mask to create a plurality of voids at each of the regions.

Abstract: The present disclosure relates to a system for producing a patterned nanostructured surface on a component from a pre-existing, nanostructured surface with a first spatial feature distribution on the component. The system makes use of a force application element configured to apply a force to the pre-existing, nanostructured surface, and a force application control subsystem. The force application control subsystem is configured to control elevational movement of the force application element along a first axis of movement into and out of contact with the pre-existing, nanostructured surface to apply a predetermined load to the pre-existing, nanostructured surface. The predetermined load is sufficient to modify the pre-existing, non-patterned nanostructured surface to create the patterned nanostructured surface.

Abstract: The present disclosure relates to an apparatus for modifying a curvature of a thin plate optic using controlled heat and densification of portions of the optic. In one embodiment the system has a support structure for supporting the optic about a perimeter thereof, a laser configured to generate a beam having a predetermined energy, and the beam being directed at one surface of the optic. The beam heats and densifies portions of the optic to create a force on the optic. The force induces a stress produces a controlled deformation of the optic. The controlled deformation at least one of modifies a curvature of, or corrects a defect in, the optic.

Abstract: A method and system is disclosed for creating an optical component having a spatially controlled refractive index and uniform anti-reflective layer. The method may involve alternately depositing and dewetting two or more thin metal material layers on the substrate to form a mask having a spatially varying nano-particle distribution, and with an increased thickness beyond what could be achieved using a single, thick layer of the same material. The substrate may then be etched, using the mask, to imprint a spatially patterned nanostructure pattern on a surface the substrate in accordance with the mask.