Patents by Inventor Nathanael R. C. Kemeling

Nathanael R. C. Kemeling has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma pre-treating surfaces for atomic layer deposition
    Patent number: 7498242
    Abstract: Method and structures are provided for conformal lining of dual damascene structures in integrated circuits. Preferred embodiments are directed to providing conformal lining over openings formed in porous materials. Trenches are formed in, preferably, insulating layers. The layers are then adequately treated with a particular plasma process. Following this plasma treatment a self-limiting, self-saturating atomic layer deposition (ALD) reaction can occur without significantly filling the pores forming improved interconnects.
    Type: Grant
    Filed: February 21, 2006
    Date of Patent: March 3, 2009
    Assignee: ASM America, Inc.
    Inventors: Devendra Kumar, Kamal Kishore Goundar, Nathanael R. C. Kemeling, Hideaki Fukuda, Hessel Sprey, Maarten Stokhof