Patents by Inventor Nathaniel D. McClure

Nathaniel D. McClure has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for more uniformly spacing features in a semiconductor monolithic integrated circuit
    Patent number: 4586243
    Abstract: The unique initial masking step is used in a method of more predictably and uniformly spacing features on a surface of a semiconductor device by combinining it with two dielectric maskants. A unique semiconductor device masking is claimed in which semiconductor device features are initially spaced by means of pitch, i.e. line and a contiguous space, instead of just a line in the initial masking.
    Type: Grant
    Filed: November 19, 1984
    Date of Patent: May 6, 1986
    Assignee: General Motors Corporation
    Inventors: John R. Weaver, II, Nathaniel D. McClure
  • Method for more uniformly spacing features in a lateral bipolar transistor
    Patent number: 4544940
    Abstract: The unique initial masking step is used in a method of more predictably and uniformly spacing features on a surface of a semiconductor device by combining it with two dielectric maskants. A unique semiconductor device masking is claimed in which semiconductor device features are initially spaced by means of pitch, i.e. line and a contiguous space, instead of just a line in the initial masking.
    Type: Grant
    Filed: January 14, 1983
    Date of Patent: October 1, 1985
    Assignee: General Motors Corporation
    Inventors: John R. Weaver, II, Nathaniel D. McClure